Patents by Inventor Stéphane Danielle

Stéphane Danielle has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Use of group V metal containing precursors for a process of depositing a metal containing film
    Patent number: 8470401
    Abstract: The disclosure is directed to a process for depositing a group V metal containing film on a substrate by introducing a substrate into a reactor; preferably heating the substrate at a temperature above 150° C.; feeding a compound of the formula (Ia) or of the formula (Ib), or a mixture of said compounds thereof in the vapor phase into the reactor; optionally feeding a second compound of the formula (Ia) or of the formula (Ib), or a second mixture of said compounds thereof in vapor phase into the reactor; and thereby depositing the group V metal containing film onto said substrate.
    Type: Grant
    Filed: October 19, 2007
    Date of Patent: June 25, 2013
    Assignee: L'Air Liquide, Socété Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude
    Inventors: Nicolas Merle, Stéphane Danielle, Christian Dussarrat, Nicolas Blasco
  • GROUP V METAL CONTAINING PRECURSORS AND THEIR USE FOR METAL CONTAINING FILM DEPOSITION
    Publication number: 20100055310
    Abstract: Compound of the formula (Ia), or of the formula (Ib). These new precursors are useful for pure metal, metallic oxide, oxynitride, nitride and/or silicide film deposition to make electrodes and/or high k layers, and/or copper diffusion barrier layers, etc.
    Type: Application
    Filed: October 19, 2007
    Publication date: March 4, 2010
    Inventors: Nicolas Merle, Stéphane Danielle, Christian Dussarrat, Nicolas Blasco