Patents by Inventor Stan Janik

Stan Janik has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Systems and methods for minimizing scattered light in multi-SLM maskless lithography
    Patent number: 7859735
    Abstract: A lithography method is provided. The method includes generating a beam of radiation, patterning portions of the beam of radiation, projecting the patterned beam of radiation towards a substrate, and blocking scattered light from the beam of radiation from the substrate.
    Type: Grant
    Filed: July 9, 2009
    Date of Patent: December 28, 2010
    Assignee: ASML Holding N.V.
    Inventors: Wenceslao A. Cebuhar, Jason D. Hintersteiner, Stan Janik, Yuli Vladimirsky
  • Systems and Methods for Minimizing Scattered Light in Multi-SLM Maskless Lithography
    Publication number: 20100002221
    Abstract: A lithography method is provided. The method includes generating a beam of radiation, patterning portions of the beam of radiation, projecting the patterned beam of radiation towards a substrate, and blocking scattered light from the beam of radiation from the substrate.
    Type: Application
    Filed: July 9, 2009
    Publication date: January 7, 2010
    Applicant: ASML Holding N.V.
    Inventors: Wenceslao A. CEBUHAR, Jason D. HINTERSTEINER, Stan JANIK, Yuli VLADIMIRSKY
  • Systems and methods for minimizing scattered light in multi-SLM maskless lithography
    Patent number: 7567368
    Abstract: The present invention is directed to a lithography system in which scattered light from a pattern generator, having one or more pattern generating devices, is blocked from an object, such as a wafer or display. The system includes a pattern generator with multiple pattern generating devices, a projection system for directing light from the pattern generating device, and an aperture located at or near an object window. The aperture has a profile that matches the configuration of the pattern generating devices. A method for blocking scattered light in a lithography system using multiple pattern generating devices is also provided.
    Type: Grant
    Filed: January 6, 2005
    Date of Patent: July 28, 2009
    Assignee: ASML Holding N.V.
    Inventors: Wenceslao A. Cebuhar, Jason D. Hintersteiner, Stan Janik, Yuli Vladimirsky
  • Systems and methods for minimizing scattered light in multi-SLM maskless lithography
    Publication number: 20060146308
    Abstract: The present invention is directed to a lithography system in which scattered light from a pattern generator, having one or more pattern generating devices, is blocked from an object, such as a wafer or display. The system includes a pattern generator with multiple pattern generating devices, a projection system for directing light from the pattern generating device, and an aperture located at or near an object window. The aperture has a profile that matches the configuration of the pattern generating devices. A method for blocking scattered light in a lithography system using multiple pattern generating devices is also provided.
    Type: Application
    Filed: January 6, 2005
    Publication date: July 6, 2006
    Applicant: ASML Holding N.V.
    Inventors: Wenceslao Cebuhar, Jason Hintersteiner, Stan Janik, Yuli Vladimirsky