Patents by Inventor Stanislav Smirnov
Stanislav Smirnov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11537055Abstract: A method to reduce sensitivity of a level sensor, arranged to measure a height of a substrate, to variations of a property of an optical component in the level sensor includes directing a beam of radiation toward a diffractive element and directing the beam, via an optical system, to a first reflective element at a first angle of incidence. The beam has a first polarization and a second polarization that is perpendicular to the first polarization. The first reflective element reflects the beam toward a second reflective element at a second angle of incidence causing the beam to impinge on the substrate. The first and second angles of incidence are selected to reduce variations of a ratio of intensities of the first polarization to the second polarization of the beam imparted by a property of a layer of at least one of the first and second reflective elements.Type: GrantFiled: February 28, 2020Date of Patent: December 27, 2022Assignee: ASML Holding N.V.Inventor: Stanislav Smirnov
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Publication number: 20220179330Abstract: A method to reduce sensitivity of a level sensor, arranged to measure a height of a substrate, to variations of a property of an optical component in the level sensor includes directing a beam of radiation toward a diffractive element and directing the beam, via an optical system, to a first reflective element at a first angle of incidence. The beam has a first polarization and a second polarization that is perpendicular to the first polarization. The first reflective element reflects the beam toward a second reflective element at a second angle of incidence causing the beam to impinge on the substrate. The first and second angles of incidence are selected to reduce variations of a ratio of intensities of the first polarization to the second polarization of the beam imparted by a property of a layer of at least one of the first and second reflective elements.Type: ApplicationFiled: February 28, 2020Publication date: June 9, 2022Applicant: ASML Holding N.V.Inventor: Stanislav SMIRNOV
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Patent number: 11126007Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.Type: GrantFiled: June 26, 2020Date of Patent: September 21, 2021Assignee: ASML Holding N.V.Inventors: Douglas C. Cappelli, Stanislav Smirnov, Richard Carl Zimmerman, Joshua Adams, Alexander Kenneth Raub, Yevgeniy Konstantinovich Shmarev
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Patent number: 10852247Abstract: An optical inspection apparatus, including: an optical metrology tool configured to measure structures, the optical metrology tool including: an electromagnetic (EM) radiation source configured to direct a beam of EM radiation along an EM radiation path; and an adaptive optical system disposed in a portion of the EM radiation path and configured to adjust a shape of a wave front of the beam of EM radiation, the adaptive optical system including: a first aspherical optical element; a second aspherical optical element adjacent the first aspherical optical element; and an actuator configured to cause relative movement between the first optical element and the second optical element in a direction different from a beam axis of the portion of the EM radiation path.Type: GrantFiled: July 31, 2017Date of Patent: December 1, 2020Assignees: ASML Holding N.V., ASML Netherlands B.V.Inventors: Stanislav Smirnov, Johannes Matheus Marie De Wit, Teunis Willem Tukker, Armand Eugene Albert Koolen
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Publication number: 20200326556Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.Type: ApplicationFiled: June 26, 2020Publication date: October 15, 2020Applicant: ASML Holding N.V.Inventors: Douglas C. CAPPELLI, Stanislav SMIRNOV, Richard Carl ZIMMERMAN, Joshua ADAMS, Alexander Kenneth RAUB, Yevgeniy Konstantinovich SHMAREV
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Patent number: 10747010Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.Type: GrantFiled: December 12, 2018Date of Patent: August 18, 2020Assignee: ASML Holding N.V.Inventors: Douglas C. Cappelli, Stanislav Smirnov, Richard Carl Zimmerman, Joshua Adams, Alexander Kenneth Raub, Yevgeniy Konstantinovich Shmarev
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Patent number: 10724961Abstract: An inspection apparatus includes an inspection optical system configured to a direct an inspection beam onto a surface of a substrate, the inspection optical system having an objective, a focus measurement optical system configured to receive a focus measurement beam, redirected by the substrate, from the objective, the focus measurement optical system having a movable reflective element configured to receive the focus measurement beam, and a control system configured to cause movement of the reflective element with a direction component along a beam path of the focus measurement beam and configured to determine whether the substrate surface is in the focus of the objective based on the focus measurement beam.Type: GrantFiled: August 22, 2017Date of Patent: July 28, 2020Assignee: ASML Holding N.V.Inventors: Yevgeniy Konstantinovich Shmarev, Stanislav Smirnov
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Patent number: 10495889Abstract: A beam homogenizer for homogenizing a beam of radiation and an illumination system and metrology apparatus comprising such a beam homogenizer as provided. The beam homogenizer comprises a filter system having a controllable radial absorption profile and configured to output a filtered beam and an optical mixing element configured to homogenize the filtered beam. The filter system may be configured to homogenize the angular beam profile radially and said optical mixing element may be configured to homogenize the angular beam profile azimuthally.Type: GrantFiled: February 22, 2017Date of Patent: December 3, 2019Assignees: ASML Netherlands B.V., ASML Holding N.V.Inventors: Markus Franciscus Antonius Eurlings, Armand Eugene Albert Koolen, Teunis Willem Tukker, Johannes Matheus Marie De Wit, Stanislav Smirnov
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Publication number: 20190179162Abstract: According to one embodiment, a prism system is provided. The prism system includes a polarizing beam splitter (PBS) surface. The PBS surface is configured to generate first and second sub-beams having corresponding first and second polarization information from a received beam, the second polarization information being different than the first polarization information. A first optical path of the first sub-beam within the prism system has substantially same length as a second optical path of the second sub-beam within the prism system. Additionally or alternatively, the first sub-beam achieves a predetermined polarization extinction ratio.Type: ApplicationFiled: December 12, 2018Publication date: June 13, 2019Applicant: ASML Holding N.V.Inventors: Douglas C. CAPPELLI, Stanislav SMIRNOV, Richard Carl ZIMMERMAN, Joshua ADAMS, Alexander Kenneth RAUB, Yevgeniy Konstantinovich SHMAREV
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Patent number: 10107761Abstract: An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed on the substrate, the second focusing beam having a second intensity distribution, wherein at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or the aperture device.Type: GrantFiled: December 21, 2016Date of Patent: October 23, 2018Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.Inventors: Yevgeniy Konstantinovich Shmarev, Stanislav Smirnov, Chien-Hung Tseng, Armand Eugene Albert Koolen
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Publication number: 20180067057Abstract: An inspection apparatus includes an inspection optical system configured to a direct an inspection beam onto a surface of a substrate, the inspection optical system having an objective, a focus measurement optical system configured to receive a focus measurement beam, redirected by the substrate, from the objective, the focus measurement optical system having a movable reflective element configured to receive the focus measurement beam, and a control system configured to cause movement of the reflective element with a direction component along a beam path of the focus measurement beam and configured to determine whether the substrate surface is in the focus of the objective based on the focus measurement beam.Type: ApplicationFiled: August 22, 2017Publication date: March 8, 2018Applicant: ASML HOLDING N.V.Inventors: Yevgeniy Konstantinovich SHMAREV, Stanislav SMIRNOV
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Patent number: 9904173Abstract: An inspection apparatus may determine precise OV measurements of a target on a substrate using an optical pupil symmetrizer to reduce the inspection apparatus's sensitivity to asymmetry and non-uniformity of the illumination beam in the pupil plane. The inspection apparatus includes an illumination system that forms a symmetrical illumination pupil by (1) splitting an illumination beam into sub-beams, (2) directing the sub-beams along different optical branches, (3) inverting or rotating at least one of the sub-beams in two dimensions, and recombining the sub-beams along the illumination path to symmetrize the intensity distribution. The illumination system is further configured such that the first and second sub-beams have an optical path difference that is greater than a temporal coherence length of the at least one beam and less than a depth of focus in the pupil plane of the objective optical system.Type: GrantFiled: December 15, 2015Date of Patent: February 27, 2018Assignee: ASML Holding N.V.Inventors: Yevgeniy Konstantinovich Shmarev, Stanislav Smirnov
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Publication number: 20180045657Abstract: An optical inspection apparatus, including: an optical metrology tool configured to measure structures, the optical metrology tool including: an electromagnetic (EM) radiation source configured to direct a beam of EM radiation along an EM radiation path; and an adaptive optical system disposed in a portion of the EM radiation path and configured to adjust a shape of a wave front of the beam of EM radiation, the adaptive optical system including: a first aspherical optical element; a second aspherical optical element adjacent the first aspherical optical element; and an actuator configured to cause relative movement between the first optical element and the second optical element in a direction different from a beam axis of the portion of the EM radiation path.Type: ApplicationFiled: July 31, 2017Publication date: February 15, 2018Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.Inventors: Stanislav SMIRNOV, Johannes Matheus Marie DE WIT, Teunis Willem TUKKER, Armand Eugene Albert KOOLEN
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Publication number: 20170248794Abstract: A beam homogenizer for homogenizing a beam of radiation and an illumination system and metrology apparatus comprising such a beam homogenizer as provided. The beam homogenizer comprises a filter system having a controllable radial absorption profile and configured to output a filtered beam and an optical mixing element configured to homogenize the filtered beam. The filter system may be configured to homogenize the angular beam profile radially and said optical mixing element may be configured to homogenize the angular beam profile azimuthally.Type: ApplicationFiled: February 22, 2017Publication date: August 31, 2017Applicants: ASML Netherlands B.V., ASML Holding N.V.Inventors: Markus Franciscus Antonius EURLINGS, Armand Eugene Albert Koolen, Teunis Willem Tukker, Johannes Matheus Marie De Wit, Stanislav Smirnov
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Publication number: 20170191944Abstract: An inspection apparatus including: a substrate holder configured to hold a substrate; an aperture device; and an optical system configured to direct a first measurement beam of radiation onto the substrate, the first measurement beam having a first intensity distribution, and configured to direct a second focusing beam of radiation onto the substrate at a same time as the first measurement beam is directed on the substrate, the second focusing beam having a second intensity distribution, wherein at least part of the second intensity distribution is spatially separated from the first intensity distribution at least at the substrate and/or the aperture device.Type: ApplicationFiled: December 21, 2016Publication date: July 6, 2017Applicants: ASML HOLDING N.V., ASML NETHERLANDS B.V.Inventors: Yevgeniy Konstantinovich SHMAREV, Stanislav SMIRNOV, Chien-Hung TSENG, Armand Eugene Albert KOOLEN
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Publication number: 20160209755Abstract: An inspection apparatus may determine precise OV measurements of a target on a substrate using an optical pupil symmetrizer to reduce the inspection apparatus's sensitivity to asymmetry and non-uniformity of the illumination beam in the pupil plane. The inspection apparatus includes an illumination system that forms a symmetrical illumination pupil by (1) splitting an illumination beam into sub-beams, (2) directing the sub-beams along different optical branches, (3) inverting or rotating at least one of the sub-beams in two dimensions, and recombining the sub-beams along the illumination path to symmetrize the intensity distribution. The illumination system is further configured such that the first and second sub-beams have an optical path difference that is greater than a temporal coherence length of the at least one light source and less than a depth of focus in the pupil plane of the objective optical system.Type: ApplicationFiled: December 15, 2015Publication date: July 21, 2016Applicant: ASML Holding N.V.Inventors: Yevgeniy Konstantinovich SHMAREV, Stanislav SMIRNOV
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Patent number: 7859647Abstract: A system and method are used to direct a radiation beam to illuminate non-perpendicularly a patterning array of individually controllable elements used for patterning the radiation beam. The individually controllable elements can change a telecentricity of the radiation beam. Projection of the radiation beam onto the individually controllable elements can be by a concave mirror or use a folding mirror placed in an object field of the individually controllable elements. Alternatively, the individually controllable elements can change the optical axis of the radiation beam.Type: GrantFiled: January 28, 2008Date of Patent: December 28, 2010Assignee: ASML Holding N.V.Inventors: Arno Jan Bleeker, Johannes Jacobus Matheus Baselmans, Marce Mathijs Theodore Marie Dierichs, Stanislav Smirnov, Christian Wagner, Lev Ryzhikov, Kars Zeger Troost
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Patent number: 7834979Abstract: An off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate is provided. The optical system includes an off-axis mirror segment, a fold mirror, a relay, an aperture stop and a refractive lens group. Modulated light is transmitted through the system to form an image on a substrate. The projection system includes an off-axis mirror segment, an aperture stop and a refractive lens group. Alternatively, the projection system includes an off-axis mirror segment, a negative refractive lens group, a concave mirror, a relay, an aperture stop, and a refractive lens group.Type: GrantFiled: February 20, 2009Date of Patent: November 16, 2010Assignee: ASML Netherlands B.V.Inventors: Stanislav Smirnov, Mark Oskotsky
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Publication number: 20090153954Abstract: The present invention is directed to off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate, such as a semiconductor wafer or flat panel display. In one embodiment the optical system includes an off-axis mirror segment, a fold mirror, a relay, an aperture stop and a refractive lens group. Modulated light is transmitted through the system to form an image on a substrate. In a second embodiment the projection system includes an off-axis mirror segment, an aperture stop and a refractive lens group. In a third embodiment the projection system includes an off-axis mirror segment, a negative refractive lens group, a concave mirror, a relay, an aperture stop, and a refractive lens group. A method to produce a device using a lithographic apparatus including a projection system with an off-axis mirror segment as the first element in a projection optics system is also provided.Type: ApplicationFiled: February 20, 2009Publication date: June 18, 2009Applicant: ASML Holding N.V.Inventors: Stanislav SMIRNOV, Mark Oskotsky
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Patent number: 7511798Abstract: An off-axis catadioptric projection optical systems for use in lithography tools for processing modulated light used to form an image on a substrate is provided. In one embodiment the optical system includes an off-axis mirror segment, a fold mirror, a relay, an aperture stop and a refractive lens group. Modulated light is transmitted through the system to form an image on a substrate. In a second embodiment the projection system includes an off-axis mirror segment, an aperture stop and a refractive lens group. In a third embodiment the projection system includes an off-axis mirror segment, a negative refractive lens group, a concave mirror, a relay, an aperture stop, and a refractive lens group. A method to produce a device using a lithographic apparatus including a projection system with an off-axis mirror segment as the first element in a projection optics system is also provided.Type: GrantFiled: July 30, 2004Date of Patent: March 31, 2009Assignee: ASML Holding N.V.Inventors: Stanislav Smirnov, Mark Oskotsky