Patents by Inventor Stanislav Y. Smirnov
Stanislav Y. Smirnov has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10048591Abstract: A catadioptric optical system operates in a wide spectral range. In an embodiment, the catadioptric optical system includes a first reflective surface positioned and configured to reflect radiation; a second reflective surface positioned and configured to reflect radiation reflected from the first reflective surface as a collimated beam, the second reflective surface having an aperture to allow transmission of radiation through the second reflective surface; and a channel structure extending from the aperture toward the first reflective surface and having an outlet, between the first reflective surface and the second reflective surface, to supply radiation to the first reflective surface.Type: GrantFiled: January 8, 2015Date of Patent: August 14, 2018Assignee: ASML HOLDING N.V.Inventors: Stanislav Y. Smirnov, Yevgeniy Konstantinovich Shmarev
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Patent number: 9285687Abstract: An inspection apparatus includes an illumination system that receives a first beam and produces second and third beams from the first beam and a catadioptric objective that directs the second beam to reflect from a wafer. A first sensor detects a first image created by the reflected second beam. A refractive objective directs the third beam to reflect from the wafer, and a second sensor detects a second image created by the reflected third beam. The first and second images can be used for CD measurements. The second beam can have a spectral range from about 200 nm to about 425 nm, and the third beam can have a spectral range from about 425 nm to about 850 nm. A third sensor may be provide that detects a third image created by the third beam reflected from the wafer. The third image can be used for OV measurements.Type: GrantFiled: September 10, 2012Date of Patent: March 15, 2016Assignee: ASML Holding N.V.Inventors: Stanislav Y Smirnov, Lev Ryzhikov, Eric Brian Catey, Adel Joobeur, David Heald, Yevgeniy Konstantinovich Shmarev, Richard Jacobs
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Patent number: 9069260Abstract: A catadioptric optical system operates in a wide spectral range. In an embodiment, the catadioptric optical system includes a first reflective surface positioned and configured to reflect radiation; a second reflective surface positioned and configured to reflect radiation reflected from the first reflective surface as a collimated beam, the second reflective surface having an aperture to allow transmission of radiation through the second reflective surface; and a channel structure extending from the aperture toward the first reflective surface and having an outlet, between the first reflective surface and the second reflective surface, to supply radiation to the first reflective surface.Type: GrantFiled: June 20, 2011Date of Patent: June 30, 2015Assignee: ASML HOLDING N.V.Inventors: Stanislav Y. Smirnov, Yevgeniy Konstantinovich Shmarev
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Publication number: 20150116719Abstract: A catadioptric optical system operates in a wide spectral range. In an embodiment, the catadioptric optical system includes a first reflective surface positioned and configured to reflect radiation; a second reflective surface positioned and configured to reflect radiation reflected from the first reflective surface as a collimated beam, the second reflective surface having an aperture to allow transmission of radiation through the second reflective surface; and a channel structure extending from the aperture toward the first reflective surface and having an outlet, between the first reflective surface and the second reflective surface, to supply radiation to the first reflective surface.Type: ApplicationFiled: January 8, 2015Publication date: April 30, 2015Inventors: Stanislav Y. SMIRNOV, Yevgeniy Konstantinovich SHMAREV
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Patent number: 8982481Abstract: A system and method is described for correcting aberrations caused by field curvature with a catadioptric objective. In one example, a catadioptric optical system includes a first catadioptric element and a second catadioptric element. The first catadioptric element includes a first surface positioned to reflect a beam and a second surface positioned to focus the beam reflected by the first surface. The second catadioptric element is configured to receive the beam reflected by the second surface of the first catadioptric element. The second catadioptric element includes a third surface positioned to reflect the beam, and a fourth reflective surface positioned to focus the beam reflected by the third reflective surface. A curvature of the third or fourth surfaces of the second catadioptric element is chosen to apply a positive contribution to a field curvature associated with the first catadioptric element.Type: GrantFiled: November 28, 2012Date of Patent: March 17, 2015Assignee: ASML Holding N.V.Inventors: Stanislav Y. Smirnov, Adel Joobeur, Yevgeniy Konstantinovich Shmarev, Arun Mahadevan Venkataraman
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Patent number: 8634064Abstract: A lithography system can include a radiation source, an illumination system, a patterning device, and a projection system. The illumination system can be configured to process a beam of radiation to produce a plurality of beams of radiation. The illumination system can include a pupil defining element, a condenser lens, a field defining element, a first relay that includes first and second lens arrays, a plurality of rods, a diaphragm having transmission areas, and a second relay. The patterning device can be configured to pattern the plurality of beams of radiation. Further, the projection system can be configured to project the patterned beams onto a substrate.Type: GrantFiled: June 30, 2010Date of Patent: January 21, 2014Assignee: ASML Holding N.V.Inventor: Stanislav Y. Smirnov
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Publication number: 20130083306Abstract: An inspection apparatus includes an illumination system that receives a first beam and produces second and third beams from the first beam and a catadioptric objective that directs the second beam to reflect from a wafer. A first sensor detects a first image created by the reflected second beam. A refractive objective directs the third beam to reflect from the wafer, and a second sensor detects a second image created by the reflected third beam. The first and second images can be used for CD measurements. The second beam can have a spectral range from about 200 nm to about 425 nm, and the third beam can have a spectral range from about 425 nm to about 850 nm. A third sensor may be provide that detects a third image created by the third beam reflected from the wafer. The third image can be used for OV measurements.Type: ApplicationFiled: September 10, 2012Publication date: April 4, 2013Applicant: ASML Holding N. V.Inventors: Stanislav Y. Smirnov, Lev Ryzhikov, Eric Brian Catey, Adel Joobeur, David Heald, Yevgeniy Konstantinovich Shmarev, Richard Jacobs
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Patent number: 8259398Abstract: Disclosed are high numerical (NA) catadioptric objectives without a central obscuration, and applications thereof. Such objectives can operate through a wide spectral bandwidth of radiation, including deep ultraviolet (DUV) radiation. Importantly, refractive elements in the catadioptric objectives can be manufactured from a single type of material (such as, for example, CaF2 and/or fused silica). In addition, the elements of such catadioptric objectives are rotationally symmetric about an optical axis. The catadioptric objectives eliminate the central obscuration by (1) using a polarized beamsplitter (which passes radiation of a first polarization and reflects radiation of a second polarization), and/or (2) using one or more folding mirrors to direct off-axis radiation into the pupil of the catadioptric objective. An example catadioptric objective is shown in FIG. 2.Type: GrantFiled: October 6, 2011Date of Patent: September 4, 2012Assignee: ASML Holding N.V.Inventors: Stanislav Y. Smirnov, Eric Brian Catey, Adel Joobeur
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Publication number: 20120026607Abstract: Disclosed are high numerical (NA) catadioptric objectives without a central obscuration, and applications thereof. Such objectives can operate through a wide spectral bandwidth of radiation, including deep ultraviolet (DUV) radiation. Importantly, refractive elements in the catadioptric objectives can be manufactured from a single type of material (such as, for example, CaF2 and/or fused silica). In addition, the elements of such catadioptric objectives are rotationally symmetric about an optical axis. The catadioptric objectives eliminate the central obscuration by (1) using a polarized beamsplitter (which passes radiation of a first polarization and reflects radiation of a second polarization), and/or (2) using one or more folding mirrors to direct off-axis radiation into the pupil of the catadioptric objective. An example catadioptric objective is shown in FIG. 2.Type: ApplicationFiled: October 6, 2011Publication date: February 2, 2012Applicant: ASML Holding N.V.Inventors: Stanislav Y. SMIRNOV, Eric Brian CATEY, Adel JOOBEUR
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Patent number: 8107173Abstract: A catadioptric optical system having a high numerical aperture operates in a wide spectral range. The catadioptric system includes a correcting plate and an optical system. The correcting plate conditions electromagnetic radiation to correct at least one aberration. The optical system reflects a first portion of the conditioned electromagnetic radiation, refracts a second portion of the conditioned electromagnetic radiation, and focuses the reflected first portion of the conditioned electromagnetic radiation onto a target portion of a substrate. The first portion of the electromagnetic radiation is not refracted by an optical element, allowing the catadioptric optical system to operate in a broad spectral range.Type: GrantFiled: October 29, 2009Date of Patent: January 31, 2012Assignee: ASML Holding N.V.Inventors: Yevgeniy Konstanitinovich Shmarev, Stanislav Y. Smirnov, Irina I. Pozhinskaya
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Publication number: 20110310393Abstract: A catadioptric optical system operates in a wide spectral range. In an embodiment, the catadioptric optical system includes a first reflective surface positioned and configured to reflect radiation; a second reflective surface positioned and configured to reflect radiation reflected from the first reflective surface as a collimated beam, the second reflective surface having an aperture to allow transmission of radiation through the second reflective surface; and a channel structure extending from the aperture toward the first reflective surface and having an outlet, between the first reflective surface and the second reflective surface, to supply radiation to the first reflective surface.Type: ApplicationFiled: June 20, 2011Publication date: December 22, 2011Applicant: ASML HOLDING N.V.Inventors: Stanislav Y. SMIRNOV, Yevgeniy Konstantinovich SHMAREV
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Patent number: 8064148Abstract: Disclosed are high numerical (NA) catadioptric objectives without a central obscuration, and applications thereof. Such objectives can operate through a wide spectral bandwidth of radiation, including deep ultraviolet (DUV) radiation. Importantly, refractive elements in the catadioptric objectives can be manufactured from a single type of material (such as, for example, CaF2 and/or fused silica). In addition, the elements of such catadioptric objectives are rotationally symmetric about an optical axis. The catadioptric objectives eliminate the central obscuration by (1) using a polarized beamsplitter (which passes radiation of a first polarization and reflects radiation of a second polarization), and/or (2) using one or more folding mirrors to direct off-axis radiation into the pupil of the catadioptric objective. An example catadioptric objective is shown in FIG. 2.Type: GrantFiled: April 7, 2009Date of Patent: November 22, 2011Assignee: ASML Holding N.V.Inventors: Stanislav Y. Smirnov, Eric Brian Catey, Adel Joobeur
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Patent number: 7965378Abstract: An illuminator for a lithography system is provided. The illuminator includes a mask positioned along an optical axis and first and second refractive groupings positioned along the axis in cooperative arrangement with the mask. Also included are first and second reflecting devices for reflecting an image output from the first and second refractive groupings and a spatial light modulator (SLM) positioned along the axis in cooperative arrangement with the first and second reflecting devices. The active areas of the mask and the SLM are positioned off-axis.Type: GrantFiled: February 20, 2007Date of Patent: June 21, 2011Assignee: ASML Holding N.VInventors: Stanislav Y. Smirnov, Kirill Y. Sobolev
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Patent number: 7852459Abstract: A scatterometer has a radiation source capable of emitting radiation in distinct first and second wavelength ranges. An adjustable optical element is provided to effect a chromatic correction as necessary according to which wavelength range is in use. A single scatterometer can thereby effect measurements using widely separated wavelengths.Type: GrantFiled: February 2, 2007Date of Patent: December 14, 2010Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Stanislav Y. Smirnov, Adel Joobeur
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Patent number: 7839487Abstract: A system and method form illumination that efficiently illuminates target areas of an object. For example, target areas can be transmission areas of a diaphragm and/or active areas of a patterning device. A plurality of beams formed by a field defining element are directed onto respective entrance faces of a plurality of rods using a relay of first and second lens arrays. The rods process the beams to form illumination that impinges substantially only within a boundary of the target areas, e.g., the transmission areas and/or the active areas. The rods are arranged in number, configuration, and cross-sectional shape corresponding to a number, configuration, and a cross-sectional shape of the target areas, e.g., the transmission areas and/or the active areas. Thus, substantially all the illumination falls within the boundary of the target areas, increasing illumination efficiency.Type: GrantFiled: April 13, 2006Date of Patent: November 23, 2010Assignee: ASML Holding N.V.Inventor: Stanislav Y. Smirnov
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Patent number: 7826142Abstract: An embodiment of the present invention provides a method for designing optical surfaces. According to this method, m optical surfaces are defined, such that each successive optical surface receives a wavefront from a previous optical surface. Wavefront aberrations caused by each optical surface are calculated. The changes at each respective optical surface required to compensate for the wavefront aberration caused by the respective optical surfaces are then calculated. A desired optical profile for each of the m optical surfaces is determined in accordance with the calculated changes to each respective optical surface.Type: GrantFiled: April 29, 2005Date of Patent: November 2, 2010Assignee: ASML Holding N.V.Inventors: Nora-Jean Harned, Richard A. Gontin, Robert D. Harned, Azat M. Latypov, Stanislav Y. Smirnov
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Publication number: 20100259743Abstract: A lithography system can include a radiation source, an illumination system, a patterning device, and a projection system. The illumination system can be configured to process a beam of radiation to produce a plurality of beams of radiation. The illumination system can include a pupil defining element, a condenser lens, a field defining element, a first relay that includes first and second lens arrays, a plurality of rods, a diaphragm having transmission areas, and a second relay. The patterning device can be configured to pattern the plurality of beams of radiation. Further, the projection system can be configured to project the patterned beams onto a substrate.Type: ApplicationFiled: June 30, 2010Publication date: October 14, 2010Applicant: ASML Holding N.V.Inventor: Stanislav Y. Smirnov
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Patent number: 7777862Abstract: A system and method form illumination that efficiently illuminates target areas of an object. For example, target areas can be transmission areas of a diaphragm and/or active areas of a patterning device. A plurality of beams formed by a field defining element are directed onto respective entrance faces of a plurality of rods using a relay of first and second lens arrays. The rods process the beams to form illumination that impinges substantially only within a boundary of the target areas, e.g., the transmission areas and/or the active areas. The rods are arranged in number, configuration, and cross-sectional shape corresponding to a number, configuration, and a cross-sectional shape of the target areas, e.g., the transmission areas and/or the active areas. Thus, substantially all the illumination falls within the boundary of the target areas, increasing illumination efficiency.Type: GrantFiled: April 13, 2006Date of Patent: August 17, 2010Assignee: ASML Holding N.V.Inventor: Stanislav Y. Smirnov
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Publication number: 20100046092Abstract: A catadioptric system is provided comprising a correcting plate and an optical system. The correcting plate is configured to condition electromagnetic radiation to correct at least one aberration. The optical system is configured to reflect a first portion of the conditioned electromagnetic radiation, to refract a second portion of the conditioned electromagnetic radiation, and to focus the reflected first portion of the conditioned electromagnetic radiation onto a target portion of a substrate. The first portion of the electromagnetic radiation is not refracted by an optical element, allowing the catadioptric optical system to operate in a broad spectral range.Type: ApplicationFiled: October 29, 2009Publication date: February 25, 2010Applicant: ASML Holding N.V.Inventors: Yevgeniy Konstantinovich Shmarev, Stanislav Y. Smirnov, Irina I. Pozhinskaya
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Patent number: 7633689Abstract: A catadioptric optical system having a high numerical aperture operates in a wide spectral range. The catadioptric optical system includes a correcting plate, a first reflective surface and a second reflective surface. The correcting plate conditions electromagnetic radiation to correct at least one aberration. The first reflective surface is positioned to reflect the electromagnetic radiation conditioned by the correcting plate. The second reflective surface is positioned to focus the electromagnetic radiation reflected by the first reflective surface onto a target portion of a substrate. The electromagnetic radiation reflected by the first reflective surface and focused by the second reflective surface is not refracted by a refractive element, thereby enabling the catadioptric optical system to operate in a broad spectral range.Type: GrantFiled: July 18, 2007Date of Patent: December 15, 2009Assignee: ASML Holding N.V.Inventors: Yevgeniy Konstantinovich Shmarev, Stanislav Y. Smirnov, Irina I. Pozhinskaya