Patents by Inventor Stanley A. Ficner

Stanley A. Ficner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • CLEANING FORMULATION FOR REMOVING RESIDUES ON SURFACES
    Publication number: 20120048295
    Abstract: This disclosure relates to compositions that can be used to remove residues from a semiconductor substrate.
    Type: Application
    Filed: March 9, 2010
    Publication date: March 1, 2012
    Applicant: FUJIFILM ELECTRONIC MATERIALS U.S.A., INC.
    Inventors: Bing Du, William A. Wojtczak, Stanley A. Ficner
  • Antireflective composition for a deep ultraviolet photoresist
    Patent number: 6114085
    Abstract: The present invention relates to a novel antireflecting coating composition, where the composition comprises a polymer, thermal acid generator and a solvent composition. The invention further comprises processes for the use of such a composition in photolithography. The composition strongly absorbs radiation ranging from about 130 nm (nanometer) to about 250 nm.
    Type: Grant
    Filed: November 18, 1998
    Date of Patent: September 5, 2000
    Assignee: Clariant Finance (BVI) Limited
    Inventors: Munirathna Padmanaban, Ralph R. Dammel, Stanley A. Ficner, Joseph E. Oberlander, John P. Sagan
  • Method of developing positive photoresist and compositions therefor
    Patent number: 5821036
    Abstract: A method and composition for developing positive photoresists is illustrated. The developer of the present invention includes an ammonium hydroxide aqueous base and a surfactant of the fluorinated alkyl alkoxylate class most preferably present in an amount of from 10 to 30 ppm. A particularly preferred surfactant includes sulfonyl and amine moieties.
    Type: Grant
    Filed: October 27, 1997
    Date of Patent: October 13, 1998
    Assignee: Clariant Finance (BVI) Limited
    Inventors: Stanley A. Ficner, John Magvas, Christopher F. Lyons, Wayne M. Moreau, Marina V. Plat
  • Positive photoresist composition comprising a mixed ester of trishydroxyphenyl ethane and a mixed ester of trihydroxybenzophenone
    Patent number: 5612164
    Abstract: A photosensitizer comprising a trishydroxyphenylethane 80/20 to 50/50 2,1,5-/2,1,4-diazonaphthoquinone sulfonate, and a trishydroxybenzophenone 0/100 to 20/80 2,1,5-/2,1,4-diazonaphthoquinone sulfate, and a photoresist composition containing such photosensitizer, the photosensitizer being present in the photoresist composition in an amount sufficient to uniformly photosensitize the photoresist composition; and a water insoluble, aqueous alkali soluble novolak resin, the novolak resin being present in the photoresist composition in an amount sufficient to form a substantially uniform photoresist composition.
    Type: Grant
    Filed: February 9, 1995
    Date of Patent: March 18, 1997
    Assignee: Hoechst Celanese Corporation
    Inventors: Anthony Canize, Stanley A. Ficner, Ping-Hung Lu, Walter Spiess
  • Aqueous developable deep UV negative resist
    Patent number: 5258260
    Abstract: A radiation-sensitive mixture useful as a negative-working photoresist composition comprising:(a) at least one novolak resin; and(b) a photoactive benzennelated acetic acid selected from formula (I): ##STR1## wherein X is either an oxygen, sulfur or --C--H.sub.2.
    Type: Grant
    Filed: November 23, 1992
    Date of Patent: November 2, 1993
    Assignee: Olin Corporation
    Inventors: Sydney G. Slater, Stanley A. Ficner
  • Aqueous developable deep UV negative resist
    Patent number: 5258265
    Abstract: A radiation-sensitive mixture useful as a negative-working photoresist composition comprising:(a) at least one novolak resin; and(b) a photoactive benzannelated acetic acid selected from formula (I): ##STR1## wherein X is either an oxygen, sulfur or --C--H.sub.2.
    Type: Grant
    Filed: November 23, 1992
    Date of Patent: November 2, 1993
    Assignee: Olin Corporation
    Inventors: Sydney G. Slater, Stanley A. Ficner
  • Aqueous developable deep UV negative resist containing benzannelated acetic acid and novolak resin
    Patent number: 5178987
    Abstract: A radiation-sensitive mixture useful as a negative-working photoresist composition comprising:(a) at least one novolak resin; and(b) a photoactive benzannelated acetic acid selected from formula (I): ##STR1## wherein X is either an oxygen, sulfur or ##STR2##
    Type: Grant
    Filed: April 24, 1989
    Date of Patent: January 12, 1993
    Assignee: Olin Corporation
    Inventors: Sydney G. Slater, Stanley A. Ficner
  • Photoresist compositions containing selected 6-acetoxy cyclohexadienone photosensitizers and novolak resins
    Patent number: 4902603
    Abstract: A light-sensitive mixture useful as a negative-working photoresist composition comprising:(a) at least one novolak resin; and(b) at least one 6-acetoxy cyclohexadienone compound of the formula (I) below: ##STR1## wherein R.sub.1, R.sub.2, R.sub.3, R.sub.4 and R.sub.5 are individually selected from hydrogen and lower alkyl groups having from 1 to 4 carbon atoms with the proviso that at least three of the R.sub.1 to R.sub.5 groups are lower alkyl groups.
    Type: Grant
    Filed: October 5, 1987
    Date of Patent: February 20, 1990
    Assignee: Olin Corporation
    Inventors: Sydney G. Slater, Stanley A. Ficner
  • Process for making sodium tripolyphosphate from wet process phosphoric acid
    Patent number: 4251491
    Abstract: Disclosed is a process for producing sodium tripolyphosphate (STPP) with reduced amounts of silicon and magnesium impurities from wet process phosphoric acid.
    Type: Grant
    Filed: April 9, 1979
    Date of Patent: February 17, 1981
    Assignee: Olin Corporation
    Inventors: Stanley A. Ficner, Andrew J. Klanica, Theodore F. Korenowski