Patents by Inventor Stanley Drazkiewicz

Stanley Drazkiewicz has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9551939
    Abstract: An apparatus to measure the position of a mark, the apparatus including an illumination arrangement to direct radiation across a pupil of the apparatus, the illumination arrangement including an illumination source to provide multiple-wavelength radiation of substantially equal polarization and a wave plate to alter the polarization of the radiation in dependency of the wavelength, such that radiation of different polarization is supplied; an objective to direct radiation on the mark using the radiation supplied by the illumination arrangement while scanning the radiation across the mark in a scanning direction; a radiation processing element to process radiation that is diffracted by the mark and received by the objective; and a detection arrangement to detect variation in an intensity of radiation output by the radiation processing element during the scanning and to calculate from the detected variation a position of the mark in at least a first direction of measurement.
    Type: Grant
    Filed: September 23, 2013
    Date of Patent: January 24, 2017
    Assignees: ASML NETHERLANDS B.V., ASML HOLDING N.V.
    Inventors: Simon Gijsbert Josephus Mathijssen, Arie Jeffrey Den Boef, Stanley Drazkiewicz, Justin Lloyd Kreuzer, Gerrit Johannes Nijmeijer
  • Publication number: 20150234290
    Abstract: An apparatus to measure the position of a mark, the apparatus including an illumination arrangement to direct radiation across a pupil of the apparatus, the illumination arrangement including an illumination source to provide multiple-wavelength radiation of substantially equal polarization and a wave plate to alter the polarization of the radiation in dependency of the wavelength, such that radiation of different polarization is supplied; an objective to direct radiation on the mark using the radiation supplied by the illumination arrangement while scanning the radiation across the mark in a scanning direction; a radiation processing element to process radiation that is diffracted by the mark and received by the objective; and a detection arrangement to detect variation in an intensity of radiation output by the radiation processing element during the scanning and to calculate from the detected variation a position of the mark in at least a first direction of measurement.
    Type: Application
    Filed: September 23, 2013
    Publication date: August 20, 2015
    Applicants: ASML Netherlands B.V., ASML Holding N.V.
    Inventors: Simon Gijsbert Josephus Mathijssen, Arie Jeffrey Den Boef, Stanley Drazkiewicz, Justin Lloyd Kreuzer, Gerrit Johannes Nijmeijer
  • Publication number: 20050036125
    Abstract: An system and method that expand emitted light from a laser beam without changing spatial coherence or producing speckle. The system includes a laser source and an optical projection system having a multiplexing device. The multiplexing device expands light emitted by laser source into plural beams having light intensity about equal to each other without changing spatial coherence. The multiplexing device has a plurality of spatially separated beam splitters positioned parallel to and on a same side of a mirror. The system further includes an illuminating optical system that focuses each of the plural beams and a projection optical system that projects an image of a mask illuminated with light output from illuminating optical system onto a substrate.
    Type: Application
    Filed: September 23, 2004
    Publication date: February 17, 2005
    Applicant: ASML Holding N.V.
    Inventors: Alexander Kremer, Stanley Drazkiewicz