Patents by Inventor Stanley E. Perreault

Stanley E. Perreault has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 5273856
    Abstract: Positive photoresist compositions which comprise an alkali soluble resin material, a diazoquinone dissolution inhibitor which decompose on exposure to mid and near UV radiation, and a sulfonic acid ester of an imide or oxime which does not absorb such mid or near UV radiation. Resist images of high contrast are formed.
    Type: Grant
    Filed: October 31, 1990
    Date of Patent: December 28, 1993
    Assignee: International Business Machines Corporation
    Inventors: Christopher F. Lyons, Stanley E. Perreault, Gary T. Spinillo, Robert L. Wood
  • Patent number: 5202061
    Abstract: Structures containing conducting polymers and methods of fabrication thereof. Electrical conductivity can be induced in polymers selected from the group of substituted and unsubstituted polyanilines, polyparaphenylenvinyles, substituted and unsubstituted polythiophenes substituted and unsubstituted poly-p-phenylene sulfides, substituted polyfuranes, substituted polypyrroles, substituted polyselenophene, polyacetylines formed from soluble precursors, combinations thereof and blends thereof with other polymers. The polymer contains a doping precursor, selected from the group of onium salts, iodonium salts, triflate salts, borate salts and tosylate salts and sulfonoxylimides. Conductivity can be selectively induced in the polymer by selectively doping upon selective exposure to a source of energy such as electromagnetic radiation, an electron beam and heat.
    Type: Grant
    Filed: June 20, 1991
    Date of Patent: April 13, 1993
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Wu-Song Huang, Richard D. Kaplan, Marie-Annick Le Corre, Stanley E. Perreault, Jane M. Shaw, Michel R. Tissier, George F. Walker
  • Patent number: 5200112
    Abstract: Structures containing conducting polymers and methods of fabrication thereof. Electrical conductivity can be induced in polymers selected from the group of substituted and unsubstituted polyanilines, polyparaphenylenvinyles, substituted and unsubstituted polythiophenes substituted and unsubstituted poly-p-phenylene sulfides, substituted polyfuranes, substituted polypyrroles, substituted polyselenophene, polyacetylines formed from soluble precursors, combinations thereof and blends thereof with other polymers. The polymer contains a doping precursor, selected from the group of onium salts, iodonium salts, triflate salts, borate salts and tosylate salts and sulfonoxylimides. Conductivity can be selectively induced in the polymer by selectivly doping upon selective exposure to a source of energy such as electromagnetic radiation, an electron beam and heat.
    Type: Grant
    Filed: June 20, 1991
    Date of Patent: April 6, 1993
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Wu-Song Huang, Richard D. Kaplan, Marie-Annick Le Corre, Stanley E. Perreault, Jane M. Shaw, Michel R. Tissier, George F. Walker
  • Patent number: 5198153
    Abstract: Structures containing conducting polymers and methods of fabrication thereof. Electrical conductivity can be induced in polymers selected from the group of substituted and unsubstituted polyanilines, polyparaphenylenvinyles, substituted and unsubstituted polythiophenes substituted and unsubstituted poly-p-phenylene sulfides, substituted polyfuranes, substituted polypyrroles, substituted polyselenophene, polyacetylines formed from soluble precursors, combinations thereof and blends thereof with other polymers. The polymer contains a doping precursor, selected from the group of onium salts, iodonium salts, triflate salts, borate salts and tosylate salts and sulfonoxylimides. Conductivity can be selectively induced in the polymer by selectively doping upon selective exposure to a source of energy such as electromagnetic radiation, an electron beam and heat.
    Type: Grant
    Filed: May 26, 1989
    Date of Patent: March 30, 1993
    Assignee: International Business Machines Corporation
    Inventors: Marie Angelopoulos, Wu-Song Huang, Richard D. Kaplan, Marie-Annick Le Corre, Stanley E. Perreault, Jane M. Shaw, Michel R. Tissier, George F. Walker
  • Patent number: 4564575
    Abstract: Reduction of the alkaline developer solubility of novolak-diazoquinone positive resists by acylation of phenolic hydroxyl groups of the novolak resin.
    Type: Grant
    Filed: January 30, 1984
    Date of Patent: January 14, 1986
    Assignee: International Business Machines Corporation
    Inventors: Stanley E. Perreault, Robert L. Wood