Abstract: Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a photoresist composition comprising a polycarbonate resin and a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with any of the aforementioned photoresist compositions; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.

Abstract: Disclosed is a photoresist composition comprising: a) at least one film forming resin selected from the group consisting of novolak resins, and polyhydroxystyrenes; b) at least one photoactive compound or photoacid generator; and c) a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a photoresist composition comprising a polycarbonate resin and a solvent composition comprising at least one solvent selected from the group consisting of acetals and ketals. Also disclosed is a process for imaging a photoresist composition, comprising the steps of: a) coating a suitable substrate with any of the aforementioned photoresist compositions; b) baking the substrate to substantially remove the solvent; c) imagewise irradiating the photoresist film; and d) removing the imagewise exposed or, alternatively, the unexposed areas of the coated substrate with a suitable developer.

Abstract: A method for producing polymers which are anhydride modifications of polymers containing hydroxyl groups, such as polyvinyl acetal polymers. Such modified polymers are useful as binders for photosensitive compositions used to prepare photographic elements such as lithographic printing plates, color proofing films and photoresists. The binder is the reaction product of an intramolecular anhydride of an organic polycarboxylic acid with a polymer containing hydroxyl groups, and which does not contain other functional groups which are capable of reaction with acid anhydrides. The reaction is conducted in a solvent composition free of hydroxyl containing solvents such as methyl ethyl ketone and ethylene glycol monomethyl ether.

Abstract: Disclosed is an assembly system for stationing a semiconductor wafer suitable for processing said wafer, said system comprising: (a) a holding block; (b) a semiconductor wafer; and (c) an aqueous adhesive composition interposed between said ceramic block and said semiconductor wafer, said adhesive composition comprising water; at least one release agent selected from the group consisting of polyethylene glycols, fluorine-free ethoxylated surfactants, fluorosurfacants, and silicone polymers; and at least one resin selected from the group consisting of (meth)acrylic acid or (meth)acrylate based polymers, vinyl acetate polymers, rosin-modified maleic resins, novolak resins, and polymers represented by the formula 1

Abstract: Disclosed is a method for producing low molecular weight oligomers of a film forming resin, which involves: a) providing a solution of the film forming resin in a first solvent system comprising a photoresist solvent, and optionally a water-soluble organic solvent; b) providing a second solvent system comprising at least one substantially pure C5-C8 alkane and/or at least one aromatic compound having at least one hydrocarbyl substituent and/or water/C1-C4 alcohol mixture; and performing steps c)-e) in the following order: c) mixing the solutions from a) and second solvent system from b) in a static mixer for a time period sufficient for efficient mixing; d) feeding the mixture from c) and second solvent system from b) through two separate inlet ports into a liquid/liquid centrifuge, one of the inlet ports feeding the mixture from c), the second inlet port feeding the second solvent system from b) into said liquid/liquid centrifuge at a feed ratio of the mixture from c) to the second solvent system from b) of

Abstract: A color ant dispersion having a pigment, a solvent composition of a C1-C8 aliphatic alcohol, a mono- or di-C1-C8 alkylene glycol C1-C8 alkyl ether, or a cyclic ketone; and an aqueous alkaline soluble or swellable polymeric compound which is the reaction product of a hydroxy containing polymer and an anhydride in the presence of a catalytic amount of a tertiary amine catalyst. The pigment and the polymeric compound are present in a high relative weight ratio of from about 0.75:1.25 to about 1.25:0.75. An admixture of the dispersion, a light sensitive component diazonium compound or photopolymerizable composition and an aqueous alkaline soluble or swellable polymeric binder, when coated and dried onto a substrate, forms a photographic element, which when imagewise exposed and developed has an exceptionally high contrast between image and removed non-image areas.

Abstract: The present invention provides a method for reducing the metal ion content of a film-forming resin, said method comprising the steps of: a) providing a solution of the film-forming resin in a water-immiscible solvent system comprising at least one water-immiscible solvent; b) providing a washing solution comprising water or a dilute solution of a water-soluble metal ion chelating agent; c) feeding the solutions from a) and b) through two separate inlet ports into a liquid/liquid centrifuge, one of said inlet ports feeding solution from a), the second inlet port feeding the solution from b) into said liquid/liquid centrifuge at a feed rate ratio of the solution from a) to that from b) from about 10/90 to about 90/10, at a temperature of from about 0° C.

Abstract: The present invention provides a method for producing a film forming, fractionated novolak resin, by:a) condensing formaldehyde with one or more phenolic compounds, and thereby producing a novolak resin;b) adding a photoresist solvent, and optionally a water-soluble organic polar solvent;c) feeding the mixture into a liquid/liquid centrifuge and feeding a C.sub.5 -C.sub.8 alkane, water or aromatic hydrocarbon solvent into the liquid/liquid centrifuge at a ratio of optional water-soluble organic polar solvent and photoresist solvent to C.sub.5 -C.sub.8 alkane, water or aromatic solvent, of from 5:1 to 0.5:1;d) rotating the liquid/liquid centrifuge containing the mixture at a speed of at least 500 rpm and thereby separating the mixture into two phases, collecting the two phases;e) optionally separating the lighter phase (L) into two second phases;f) removing residual C.sub.5 -C.sub.

Abstract: A photoresist composition comprising a film forming resin obtained by condensing a phenol derivative and a substituted diphenyl ether, a photoactive compound, and a solvent. The photoresist composition may also contain an alkali-soluble, film-forming resin, such as a novolak resin. The photoresist of the instant invention improves the photospeed, resolution and thermal stability of the photoresist images.

Abstract: The present invention provides a method for producing a film forming, fractionated novolak resin copolymer exhibiting fast photospeed and superior performance in a photoresist composition. A method is also provided for producing photoresist composition from such a fractionated novolak resin copolymer and for producing semiconductor devices using such a photoresist composition.

Abstract: A photosensitive positive working photosensitive composition suitable for use as a photoresist, which comprises an admixture of at least one water insoluble, aqueous alkali soluble, film forming novolak resin; at least one o-diazonaphthoquinone photosensitizer; and a photoresist solvent mixture comprising a propylene glycol alkyl ether acetate and 3-methyl-3-methoxy butanol and process for producing such a composition.

Abstract: Provided herein is a brushgraining process to improve the quality of lithographic printing plate substrate surfaces. In the process, the surface is brushed in an aqueous slurry comprising a mixture of particulates of alumina and quartz in a weight ratio range 95:5 to 5:95, with the particulates being in the size range of 1-20 microns. Such a process surprisingly lessens the number of scratches produced on the substrate surface than when compared to using alumina alone or quartz alone or a mixture of alumina and quartz with particle sizes higher than the range disclosed.

Abstract: This invention relates to water developable, negative working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process. The invention provides both overlay and transfer type proofing sheets which have good fingerprint resistance.

Abstract: This invention relates to water developable, negative working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process. The invention provides both overlay and transfer type proofing sheets which have good fingerprint resistance.

Abstract: This invention relates to water developable, negative working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process. The invention provides both overlay and transfer type proofing sheets which have good fingerprint resistance.

Abstract: A polymeric compound having the formula ##STR1## wherein x ranges from about 0.05 to about 0.5y ranges from about 0.80 to about 0.35z ranges from about 0.10 to about 0.25n ranges from about 50 to about 1500R is selected from the group consisting of phenyl and C.sub.1 to C.sub.4 alkyl substituted phenyl;K is selected from the group consisting of ##STR2## --S--, --O--, and --CH.sub.2 --, or is absent; P and P.sub.1 are selected from the group consisting of C.sub.1 to C.sub.4 alkyl, methoxy, ethoxy, butoxy, and H; andP.sub.1 may be the same as P or different.

Abstract: The invention provides a photographic article having a protected image which comprisesa) a colored image disposed on a substrate; andb) a thin, transparent, colorless, thermoplastic adhesive composition directly on the surface of the image, wherein said adhesive is substantially non-tacky at room temperature, and comprises one or more thermoplastic polymers of copolymers capable of forming a flexible film, said adhesive being capable of being transferred directly to the image when the adhesive is first disposed on the release surface of a temporary support and said image and adhesive are laminated together under pressure at temperatures of between about 60.degree. C. and about 90.degree. C. and said temporary support is peeled away; andc) a non-self supporting antiblocking layer directly on said adhesive said antiblocking layer being transparent, colorless and comprises one or more organic polymers or copolymers, which coating does not cohesively block at about 50.degree. C. or less.

Abstract: This invention relates to a method for making a dry transfer, photopolymerizable positive-working imaging system which provides a photopolymerizable layer on a support and a colored layer on a substrate. Upon imagewise exposure of the photopolymerizable layer, subsequent lamination of the colored layer to the photopolymerized layer and peel apart, a colored image is produced due to the preferred adhesion of the colored layer to the nonexposed areas of the photopolymerized layer.

Abstract: This invention relates to water developable, negative working photosensitized sheet constructions which, upon exposure to an actinic radiation source through a screened image, can accurately reproduce said image. The construction is useful as a color proofing film which can be employed to predict the image quality from a lithographic printing process. The invention provides both overlay and transfer type proofing sheets which have good fingerprint resistance.

Abstract: The invention provides a method for protecting an image which comprises providing a colored image on a substrate and either:A. Applying an antiblocking layer to a release surface of a temporary support; bonding a thermoplastic adhesive layer to said antiblocking layer; laminating said applied support to said colored image via said adhesive; and peeling away said temporary support from said antiblocking layer; orB. applying a thermoplastic adhesive layer to a release surface of a first temporary support; applying an antiblocking layer onto a release surface of a second temporary support, laminating said adhesive onto said colored image and peeling away said first temporary support; and laminating said antiblocking layer onto said adhesive layer and peeling away said second temporary support;wherein said adhesive layer is substantially nontacky at room temperature, is laminated at temperatures between about 60.degree. C. and 90.degree. C.