Patents by Inventor Stanton Ashburn

Stanton Ashburn has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Nitride trench fill process for increasing shallow trench isolation (STI) robustness
    Patent number: 6054343
    Abstract: A semiconductor device and method having shallow trench isolation. A pad oxide 24 and silicon 42 are formed on a substrate 20 to form a mask, and the pad oxide 24/silicon 42 mask is then patterned. Portions of the pad oxide 24/silicon 42 mask and the substrate 20 are removed to form trenches 22 in the substrate 20. A nitride fill 40 is deposited over the pad oxide 24/silicon 42 mask and the trenches 22. Advantages of the invention include a more robust STI device without central voids 34 and without edge voids 36 in the trench fill material.
    Type: Grant
    Filed: January 20, 1999
    Date of Patent: April 25, 2000
    Assignee: Texas Instruments Incorporated
    Inventor: Stanton Ashburn