Abstract: A component for a projection exposure apparatus for semiconductor lithography, comprises an optical element and an actuator, which are force-fittingly connected to each other. The actuator at least locally deforms the optical element. The actuator can be configured to minimize the loss in rigidity at the peripheries delimiting the actuator on the imaging quality. A method for designing a component of projection exposure apparatus is provided.

Abstract: Powder paint composition, processes for preparing and uses for the same. The composition includes (a) at least one polymer powder redispersible in water, (b) pigment and filler and (c) optionally further additives. Where (a) is a polymer stabilized with polyvinyl alcohol, based on (a1) 20 to 100% by weight of at least one monomer from the group consisting of acrylic esters of branched or unbranched alcohols having 1 to 12 carbon atoms, (a2) 0 to 60% by weight of at least one monomer from the group consisting of methacrylic esters of branched or unbranched alcohols having 1 to 12 carbon atoms and styrene, (a3) 0 to 40% by weight of at least one monomer from the group consisting of vinyl esters of branched or unbranched carboxylic acids having 2 to 12 carbon atoms, and (a4) 0 to 20% by weight of other ethylenically unsaturated comonomers copolymerizable therewith.

Abstract: Copolymers of vinyl acetate, vinyl chloride, and vinyl esters of long chain carboxylic acids are soluble in low polarity organic solvents, and produce superior binder and seam-sealing compositions. The copolymers contain 50-75 wt. % vinyl chloride, 5-25 wt. % vinyl acetate, and 10-55 wt. % vinyl ester of long-chain carboxylic acid.