Patents by Inventor Stefan Belfroid

Stefan Belfroid has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Lithographic apparatus and device manufacturing method
    Publication number: 20070242243
    Abstract: A plurality of extraction conduits are provided to remove immersion liquid into a chamber. The extraction conduits are arranged at different distances from a target portion of the substrate. From the chamber, a passage is provided to which a suction force is applied. When all the conduits are filled with immersion liquid, the extraction capacity will be greater than when one or more of the conduits comprise gas.
    Type: Application
    Filed: April 14, 2006
    Publication date: October 18, 2007
    Applicant: ASML Netherlands B.V.
    Inventors: Nicolaas Kemper, Marcel Beckers, Stefan Belfroid, Ferdy Migchelbrink, Sergei Shulepov
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060103816
    Abstract: In an immersion lithography apparatus, ultrasonic waves are used to atomize liquid on a surface of the substrate.
    Type: Application
    Filed: November 12, 2004
    Publication date: May 18, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Stefan Belfroid, Nicolaas Kate, Nicolaas Kemper, Johannes Smeulers, Arno Volker, Rene Breeuwer
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060087630
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: August 29, 2005
    Publication date: April 27, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Kemper, Henrikus Cox, Sjoerd Donders, Roelof Graaf, Christiaan Hoogendam, Nicolaas Kate, Martinus Hendrikus Leenders, Jeroen Mertens, Frits Meulen, Joost Ottens, Franciscus Maria Teunissen, Jan-Gerard Toorn, Martinus Verhagen, Marco Polizzi, Edwin Augustinus Van Gompel, Johannes Smeulers, Stefan Belfroid
  • Lithographic apparatus and device manufacturing method
    Publication number: 20060038968
    Abstract: A porous member is used in a liquid removal system of an immersion lithographic projection apparatus to smooth uneven flows. A pressure differential across the porous member may be maintained at below the bubble point of the porous member so that a single-phase liquid flow is obtained. Alternatively, the porous member may be used to reduce unevenness in a two-phase flow.
    Type: Application
    Filed: August 19, 2004
    Publication date: February 23, 2006
    Applicant: ASML NETHERLANDS B.V.
    Inventors: Nicolaas Kemper, Henrikus Marie Cox, Sjoerd Nicolaas Donders, Roelof Frederick De Graaf, Christiaan Alexander Hoogendam, Nicolaas Kate, Jeroen Johannes Sophia Mertens, Frits Der Meulen, Franciscus Herman Maria Teunissen, Jan-Gerard Van Der Toorn, Martinus Cornelis Verhagen, Stefan Belfroid, Johannes Smeulers