Patents by Inventor Stefan Cwik

Stefan Cwik has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20250011226
    Abstract: A functionalized glass device, such as a microchannel plate, includes a glass substrate having a chemistry including an ionic species that may diffuse toward a surface, and a functional layer supported by the glass substrate and having a functional characteristic that may be undesirably altered by introduction of the ionic species during operation of the device. An ion barrier layer is disposed between the surface of the glass substrate and the functional layer, the ion barrier layer being substantially of a metal oxide material effective to limit the diffusion of the ionic species into the functional layer.
    Type: Application
    Filed: July 3, 2024
    Publication date: January 9, 2025
    Inventors: Anil U. Mane, Jeffrey W. Elam, Michael J. Minot, Stephen M. Clarke, Cole J. Hamel, Derrick O. Mensah, Mark A. Popecki, Melvin Aviles, Michael E. Stochaj, Stefan Cwik
  • Patent number: 12084464
    Abstract: Halide ligand free rhenium complexes are described as well as methods for depositing rhenium-containing films. Some embodiments provide a rhenium complex with a general formula of O3ReO-M-R1R2R3, where M is a group IV element, R1 is selected from H, alkyl, alkenyl, alkynyl, an aromatic ring, or alkoxy, and R2 and R3 are each independently selected from H, alkyl, alkenyl, alkynyl, an aromatic ring, or alkoxy, or R2 and R3 join together to form a ring structure or an oxo group. Some embodiments provide a rhenium complex with a general formula of Re(NR?)3(NHR?), where R? and R? are independently selected from H, alkyl, alkenyl, alkynyl, or an aromatic ring.
    Type: Grant
    Filed: November 20, 2020
    Date of Patent: September 10, 2024
    Assignees: Applied Materials, Inc., Wayne State University
    Inventors: Thomas Knisley, Keenan N. Woods, Mark Saly, Charles H. Winter, Stefan Cwik
  • Patent number: 11532474
    Abstract: Methods for depositing rhenium-containing thin films on a substrate are described. The substrate is exposed to a rhenium precursor and a reducing agent to form the rhenium-containing film (e.g., metallic rhenium, rhenium nitride, rhenium oxide, rhenium carbide). The exposures can be sequential or simultaneous. The rhenium-precursors are substantially free of halogen.
    Type: Grant
    Filed: August 10, 2020
    Date of Patent: December 20, 2022
    Assignee: Applied Materials, Inc.
    Inventors: Thomas Knisley, Keenan N. Woods, Mark Saly, Charles H. Winter, Stefan Cwik
  • Publication number: 20210155646
    Abstract: Halide ligand free rhenium complexes are described as well as methods for depositing rhenium-containing films. Some embodiments provide a rhenium complex with a general formula of O3ReO-M-R1R2R3, where M is a group IV element, R1 is selected from H, alkyl, alkenyl, alkynyl, an aromatic ring, or alkoxy, and R2 and R3 are each independently selected from H, alkyl, alkenyl, alkynyl, an aromatic ring, or alkoxy, or R2 and R3 join together to form a ring structure or an oxo group. Some embodiments provide a rhenium complex with a general formula of Re(NR?)3(NHR?), where R? and R? are independently selected from H, alkyl, alkenyl, alkynyl, or an aromatic ring.
    Type: Application
    Filed: November 20, 2020
    Publication date: May 27, 2021
    Applicants: Applied Materials, Inc., Wayne State University
    Inventors: Thomas Knisley, Keenan N. Woods, Mark Saly, Charles H. Winter, Stefan Cwik
  • Publication number: 20210050211
    Abstract: Methods for depositing rhenium-containing thin films on a substrate are described. The substrate is exposed to a rhenium precursor and a reducing agent to form the rhenium-containing film (e.g., metallic rhenium, rhenium nitride, rhenium oxide, rhenium carbide). The exposures can be sequential or simultaneous. The rhenium-precursors are substantially free of halogen.
    Type: Application
    Filed: August 10, 2020
    Publication date: February 18, 2021
    Applicants: Applied Materials, Inc., Wayne State University
    Inventors: Thomas Knisley, Keenan N. Woods, Mark Saly, Charles H. Winter, Stefan Cwik
  • Publication number: 20200362458
    Abstract: Methods for depositing rhenium-containing thin films on a substrate are described. The substrate is exposed to a rhenium precursor and a reducing agent to form the rhenium-containing film (e.g., metallic rhenium, rhenium nitride). The exposures can be sequential or simultaneous.
    Type: Application
    Filed: May 14, 2020
    Publication date: November 19, 2020
    Applicants: Applied Materials, Inc., Wayne State University
    Inventors: Thomas Knisley, Keenan N. Woods, Mark Saly, Stefan Cwik, Charles H. Winter