Abstract: A multi-beam pattern definition device for use in a particle-beam processing or inspection apparatus, which is irradiated with a beam of electrically charged particles through a plurality of apertures to form corresponding beamlets, comprises an aperture array device in which said apertures are realized according to several sets of apertures arranged in respective aperture arrangements, and an absorber array device having openings configured for the passage of at least a subset of beamlets that are formed by the apertures. The absorber array device comprises openings corresponding to one of the aperture arrangement sets, whereas it includes a charged-particle absorbing structure comprising absorbing regions surrounded by elevated regions and configured to absorb charged particles impinging thereupon at locations corresponding to apertures of the other aperture arrangements of the aperture array device, effectively confining the effects of irradiated particles and electric charge therein.

Abstract: The invention relates to a multi-beam pattern definition device for use in a particle-beam processing or inspection apparatus, said device being adapted to be irradiated with a beam of electrically charged particles and allow passage of the beam through a plurality of apertures thus forming a corresponding number of beamlets, said device comprising an aperture array device in which at least two sets of apertures are realized, an opening array device located downstream of the aperture array device having a plurality of openings configured for the passage of beamlets, said opening array device comprises impact regions, wherein charged impinge upon said impact regions.

Abstract: A multi-beam pattern definition device for use in a particle-beam processing or inspection apparatus, which is irradiated with a beam of electrically charged particles and allows passage of the beam through a plurality of apertures to form corresponding beamlets, comprises an aperture array device in which said apertures are realized according to several sets of apertures arranged in respective aperture arrangements, and an absorber array device having a plurality of openings configured for the passage of at least a subset of beamlets that are formed by the apertures.

Abstract: A fine-adjustable electromagnetic lens for a charged-particle optical apparatus comprises a magnetic circuit assembly including one or more ring magnets, and a sleeve insert of generally rotational symmetry around a longitudinal axis. The sleeve insert surrounds a passage opening extending along the longitudinal axis, and comprises several electrically conductive electrode elements configured to generate an electrostatic field within the passage opening. The ring magnets are arranged circumferentially around an inner yoke shell and surrounded by an outer yoke shell; the inner yoke shell in turn surrounds a central portion of the sleeve insert. The ring magnets are magnetized such that the two magnetic poles are oriented towards the inner and outer yoke shell, respectively.