Patents by Inventor Stefan Gerhold

Stefan Gerhold has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11735391
    Abstract: A charged-particle source for generating a charged-particle comprises a sequence of electrodes, including an emitter electrode with an emitter surface, a counter electrode held at an electrostatic voltage with respect to the emitter electrode at a sign opposite to that of the electrically charged particles, and one or more adjustment electrodes surrounding the source space between the emitter electrode and the counter electrode. These electrodes have a basic overall rotational symmetry along a central axis, with the exception of one or more steering electrodes which is an electrode which interrupts the radial axial-symmetry of the electric potential of the source, for instance tilted or shifted to an eccentric position or orientation, configured to force unintended, secondary charged particles away from the emission surface.
    Type: Grant
    Filed: April 19, 2021
    Date of Patent: August 22, 2023
    Assignee: IMS Nanofabrication GmbH
    Inventors: Stefan Gerhold, Werner Rupp, Mattia Capriotti, Christoph Spengler
  • Publication number: 20210335573
    Abstract: A charged-particle source for generating a charged-particle comprises a sequence of electrodes, including an emitter electrode with an emitter surface, a counter electrode held at an electrostatic voltage with respect to the emitter electrode at a sign opposite to that of the electrically charged particles, and one or more adjustment electrodes surrounding the source space between the emitter electrode and the counter electrode. These electrodes have a basic overall rotational symmetry along a central axis, with the exception of one or more steering electrodes which is an electrode which interrupts the radial axial-symmetry of the electric potential of the source, for instance tilted or shifted to an eccentric position or orientation, configured to force unintended, secondary charged particles away from the emission surface.
    Type: Application
    Filed: April 19, 2021
    Publication date: October 28, 2021
    Applicant: IMS Nanofabrication GmbH
    Inventors: Stefan Gerhold, Werner Rupp, Mattia Capriotti, Christoph Spengler