Patents by Inventor Stefan Geyer

Stefan Geyer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8557185
    Abstract: A pressure vessel arrangement comprises an external pressure vessel and at least one insert basket in the pressure vessel for receiving a substance to be treated which is exposable to a pressure fluid which is feedable to the pressure vessel and the insert basket. There is provided a control device for the internal pressure prevailing in the insert basket, in particular in the form of a switchable pressure compensation line connecting the interior of the insert basket directly to the surroundings, i.e. not via the pressure vessel.
    Type: Grant
    Filed: August 21, 2009
    Date of Patent: October 15, 2013
    Assignee: NATECO2 GmbH & Co. KG
    Inventors: Josef Schulmeyr, Stefan Geyer, Manfred Gehrig
  • Patent number: 8245565
    Abstract: An embodiment of the present invention is a transport and storage system for a slurry comprising: a main container; and a test container, the main container and the test container being exposed to the same environmental conditions, the main container and the test container containing a slurry from the same batch, wherein the test container is designed to determine the viscosity of the slurry.
    Type: Grant
    Filed: June 3, 2008
    Date of Patent: August 21, 2012
    Assignee: Infineon Technologies AG
    Inventor: Stefan Geyer
  • Patent number: 7858138
    Abstract: The invention relates to a method for decaffeinating tea (Camellia sinensis). The method involves of using, as an extraction agent, a carbon dioxide which is compressed of a pressure greater than 50 and up to 100 MPa.
    Type: Grant
    Filed: July 8, 2005
    Date of Patent: December 28, 2010
    Assignee: NATECO2 GmbH + Co. KG
    Inventors: Manfred Gehrig, Stefan Geyer, Josef Schulmeyr, Birgit Forchhammer, Karin Simon
  • Publication number: 20100047135
    Abstract: A pressure vessel arrangement comprises an external pressure vessel and at least one insert basket in the pressure vessel for receiving a substance to be treated which is exposable to a pressure fluid which is feedable to the pressure vessel and the insert basket. There is provided a control device for the internal pressure prevailing in the insert basket, in particular in the form of a switchable pressure compensation line connecting the interior of the insert basket directly to the surroundings, i.e. not via the pressure vessel.
    Type: Application
    Filed: August 21, 2009
    Publication date: February 25, 2010
    Applicant: NATECO2 GmbH & Co. KG
    Inventors: Josef Schulmeyr, Stefan Geyer, Manfred Gehrig
  • Publication number: 20090293593
    Abstract: An embodiment of the present invention is a transport and storage system for a slurry comprising: a main container; and a test container, the main container and the test container being exposed to the same environmental conditions, the main container and the test container containing a slurry from the same batch, wherein the test container is designed to determine the viscosity of the slurry.
    Type: Application
    Filed: June 3, 2008
    Publication date: December 3, 2009
    Applicant: Infineon Technologies AG
    Inventor: Stefan GEYER
  • Publication number: 20080197493
    Abstract: One embodiment provides an integrated circuit including an electrical contact and a conductive bump elongated via centrifugal forces. The conductive bump has a base and a top. The base is attached to the electrical contact and the top remains unattached.
    Type: Application
    Filed: February 16, 2007
    Publication date: August 21, 2008
    Inventor: Stefan Geyer
  • Patent number: 7344807
    Abstract: The present invention relates to an exposure mask for structuring a photoresist layer on a substrate wafer, in which an inorganic adhesive is used as an adhesive device for connecting a reticle having a lithographic structure, a frame and a pellicle. For chemical reasons, an adhesive of this type has no tendency or a considerably lower tendency to gassing out than an organic adhesive used in conventional exposure masks, so that the risk of particles which are deposited on the lithographic structure and which can cause projection errors during an exposure process is largely ruled out. The invention relates further to a method of producing such an inorganic adhesive and also a method of producing an exposure mask with the aid of such an inorganic adhesive.
    Type: Grant
    Filed: May 12, 2004
    Date of Patent: March 18, 2008
    Assignee: Infineon Technologies AG
    Inventor: Stefan Geyer
  • Publication number: 20070231445
    Abstract: The invention relates to a method for decaffeinating tea (Camellia sinensis). The method consists of using, as an extraction agent, a carbon dioxide which is compressed of a pressure greater than 50 and up to 100 MPa.
    Type: Application
    Filed: July 8, 2005
    Publication date: October 4, 2007
    Applicant: NATECO2 GMBH + CO. KG
    Inventors: Manfred Gehrig, Stefan Geyer, Josef Schulmeyr, Birgit Forchhammer, Karin Simon
  • Patent number: 7091062
    Abstract: The invention relates to a wafer level package for chips with chip edge protection, comprising individual chips, which can in each case be mounted on a suitable carrier board, and to a method for producing such a wafer level package. Aspects of the invention can be achieved by the chip being thinned extremely from the back side and bonded onto a fiber reinforced synthetic resin sheet, forming a solidly bonded assembly that cannot come apart in the customary temperature range, and the edges of the assembly being at least partly coated with a polymer.
    Type: Grant
    Filed: October 15, 2004
    Date of Patent: August 15, 2006
    Assignee: Infineon Technologies AG
    Inventor: Stefan Geyer
  • Publication number: 20050158635
    Abstract: The present invention relates to an exposure mask for structuring a photoresist layer on a substrate wafer, in which an inorganic adhesive is used as an adhesive device for connecting a reticle having a lithographic structure, a frame and a pellicle. For chemical reasons, an adhesive of this type has no tendency or a considerably lower tendency to gassing out than an organic adhesive used in conventional exposure masks, so that the risk of particles which are deposited on the lithographic structure and which can cause projection errors during an exposure process is largely ruled out. The invention relates further to a method of producing such an inorganic adhesive and also a method of producing an exposure mask with the aid of such an inorganic adhesive.
    Type: Application
    Filed: May 12, 2004
    Publication date: July 21, 2005
    Applicant: Infineon Technologies AG
    Inventor: Stefan Geyer
  • Patent number: 6911059
    Abstract: An abrasive pad is suitable for the wet-chemical grinding of a substrate surface. The novel abrasive pad has a polymer matrix with a defined water-solubility. The water-solubility is realized by the level of nonpolar and polar repeat units in the polymers.
    Type: Grant
    Filed: November 26, 2003
    Date of Patent: June 28, 2005
    Assignee: Infineon Technologies AG
    Inventor: Stefan Geyer
  • Publication number: 20050110156
    Abstract: The invention relates to a wafer level package for chips with chip edge protection, comprising individual chips, which can in each case be mounted on a suitable carrier board, and to a method for producing such a wafer level package. Aspects of the invention can be achieved by the chip being thinned extremely from the back side and bonded onto a fiber reinforced synthetic resin sheet, forming a solidly bonded assembly that cannot come apart in the customary temperature range, and the edges of the assembly being at least partly coated with a polymer.
    Type: Application
    Filed: October 15, 2004
    Publication date: May 26, 2005
    Inventor: Stefan Geyer
  • Patent number: 6854484
    Abstract: A valve for a slurry outlet opening in an installation for chemical mechanical polishing, in particular of semiconductor wafers in DRAM production, includes an elastic diaphragm, which covers the slurry outlet opening and has at least one self-closing opening. It is possible for the opening to be moved into a feedthrough position for the slurry by flowing slurry and to be automatically moved into a blocking position for the slurry when the slurry is not flowing. A CMP installation having such a valve is also provided. This creates a simple way of preventing particle agglomerations in the region of the fluid outlet opening of a CMP installation.
    Type: Grant
    Filed: July 31, 2002
    Date of Patent: February 15, 2005
    Assignee: Infineon Technologies AG
    Inventors: Stefan Geyer, Andreas Fischer
  • Publication number: 20040121040
    Abstract: In a method of producing a xanthohumol-concentrated hop extract, the xanthohumol-containing hop extract is extracted from a xanthohumol-containing hop raw material by highly compressed CO2 as a solvent at pressures above 500 bar and temperatures above 60° C.
    Type: Application
    Filed: December 1, 2003
    Publication date: June 24, 2004
    Applicant: NATECO2 GMBH & CO. KG
    Inventors: Adrian Forster, Josef Schulmeyr, Roland Schmidt, Karin Simon, Martin Ketterer, Birgit Forchhammer, Stefan Geyer, Manfred Gehrig
  • Publication number: 20040116054
    Abstract: An abrasive pad is suitable for the wet-chemical grinding of a substrate surface. The novel abrasive pad has a polymer matrix with a defined water-solubility. The water-solubility is realized by the level of nonpolar and polar repeat units in the polymers.
    Type: Application
    Filed: November 26, 2003
    Publication date: June 17, 2004
    Inventor: Stefan Geyer
  • Publication number: 20030024582
    Abstract: A valve for a slurry outlet opening in an installation for chemical mechanical polishing, in particular of semiconductor wafers in DRAM production, includes an elastic diaphragm, which covers the slurry outlet opening and has at least one self-closing opening. It is possible for the opening to be moved into a feedthrough position for the slurry by flowing slurry and to be automatically moved into a blocking position for the slurry when the slurry is not flowing. A CMP installation having such a valve is also provided. This creates a simple way of preventing particle agglomerations in the region of the fluid outlet opening of a CMP installation.
    Type: Application
    Filed: July 31, 2002
    Publication date: February 6, 2003
    Inventors: Stefan Geyer, Andreas Fischer
  • Patent number: 6472130
    Abstract: A solution of tetramethylammonium hydroxide in water comprises a surfactant component and a hydrotropic component. A process for preparing a solution for developing an exposed photoresist comprises the steps: preparation of a solution of tetramethylammonium hydroxide in water; addition of a surfactant component; and addition of a hydrotropic component.
    Type: Grant
    Filed: October 16, 2000
    Date of Patent: October 29, 2002
    Assignee: Infineon Technologies AG
    Inventors: Stefan Geyer, Michael Horn
  • Patent number: 6250141
    Abstract: A scanning device for semiconductor wafers with which rapid and dependable scanning is permitted. The invention is characterized by a base plate with a guiding pin protruding from it for the manual guidance of a depositing plate which is displaceable on the latter. The depositing plate is intended to receive a semiconductor wafer and is provided on an underside with meandering guiding channels for guiding by the guiding pin. A liquid drop is kept on a surface of the semiconductor wafer by a scanning tube and collects metal and dopant traces from the semiconductor wafer. The liquid drop can then be analyzed for determining a purity of the surface of the semiconductor wafer.
    Type: Grant
    Filed: November 9, 1999
    Date of Patent: June 26, 2001
    Assignee: Infineon Technologies AG
    Inventors: Stefan Geyer, Michael Horn, RĂ¼diger Hunger
  • Patent number: 6050125
    Abstract: A calibrating wafer and a method for the production of a calibrating wafer having polymer microspheres. The polymer microspheres are subjected to a heat treatment in a temperature range in which the polymer microspheres start to soften.
    Type: Grant
    Filed: August 27, 1998
    Date of Patent: April 18, 2000
    Assignee: Siemens Aktiengesellschaft
    Inventors: Stefan Geyer, Michael Horn, Ralf Gothel, Kathrin Kurth
  • Patent number: 4946695
    Abstract: This invention relates to a process for extracting nonpolar constituents from natural substances such as hops with simultaneous separation of residues of nonpolar plant protectives (fungicides/insecticides). In a first step, the plant protective as well as other ingredients that are soluble under the chosen conditions is extracted with compressed gases, and in a subsequent stage, the dissolved mixture is passed through an adsorbent and the plant protective is selectively removed from the mixture.
    Type: Grant
    Filed: March 31, 1989
    Date of Patent: August 7, 1990
    Assignee: Hopfen-Extraktion HVG Bart, Raiser & Co.
    Inventors: Adrian Forster, Stefan Geyer, Josef Schulmeyr, Roland Schmidt, Manfred Gehrig