Patents by Inventor Stefan Harrar

Stefan Harrar has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of fabricating dual damascene structures using a multilevel multiple exposure patterning scheme
    Publication number: 20130026639
    Abstract: A method for fabricating a dual damascene structure includes providing a first photoresist layer coated on an underlying dielectric stack, exposing said first photoresist layer to a first predetermined pattern of light, coating a second photoresist layer onto the pre-exposed first photoresist layer, exposing said second photoresist layer to a second predetermined pattern of light, optionally post-exposure baking the multi-tiered photoresist layers and developing said photoresist layers to form a multi-tiered dual damascene structure in the photoresist layers.
    Type: Application
    Filed: September 14, 2012
    Publication date: January 31, 2013
    Applicant: International Business Machines Corporation
    Inventors: John C. Arnold, Kuang-Jung Chen, Matthew E. Colburn, Dario L. Goldfarb, Stefan Harrar, Steven J. Holmes, Pushkara Varanasi