Abstract: A system having electric consumers includes an electrical device including an operating device and wires supplying the consumer. A first wire is provided for conducting the first phase of a three-phase voltage during a normal operation, a second wire conducts a second phase of the three-phase voltage, and a third wire conducts a third phase of the three-phase voltage. The consumer is able to be supplied with the three-phase voltage from the wires during a normal operation. The operating device is configured so that: in a normal operation, the first wire is connected to the first phase of the three-phase voltage; and in a safety case, the first wire is separated from the first phase of the three-phase voltage and will be or is connected to the second phase of the three-phase voltage.

Abstract: A system having electric consumers includes an electrical device including an operating device and wires supplying the consumer. A first wire is provided for conducting the first phase of a three-phase voltage during a normal operation, a second wire conducts a second phase of the three-phase voltage, and a third wire conducts a third phase of the three-phase voltage. The consumer is able to be supplied with the three-phase voltage from the wires during a normal operation. The operating device is configured so that: in a normal operation, the first wire is connected to the first phase of the three-phase voltage; and in a safety case, the first wire is separated from the first phase of the three-phase voltage and will be or is connected to the second phase of the three-phase voltage.

Abstract: A method for creating negative resist structures is described. In the method, a chemically fortified resist is applied to a substrate, dried, irradiated with light, x-ray, electron or ion beams, heated, developed using a aqueous-alkaline developer solution and siliconized from a liquid phase. The resist contains the following constituent: a polymer, whose polarity is modified by acidic action and which contains carboxylic acid anhydride groups, preferably in latent form; a compound which releases an acid as a result of thermal treatment; a photoreactive compound, from which a base is created during the irradiation with light, x-ray, electron or ion beams; a solvent; and optionally one or more additives.

Abstract: A bottom resist for the two-layer technique includes a phenolic base polymer, a thermoactive compound which above a temperature of 100° C. releases a sulfonic acid, and a solvent.

Abstract: A method for creating negative resist structures is described. In the method, a chemically fortified resist is applied to a substrate, dried, irradiated with light, x-ray, electron or ion beams, heated, developed using a aqueous-alkaline developer solution and siliconized from a liquid phase. The resist contains the following constituent: a polymer, whose polarity is modified by acidic action and which contains carboxylic acid anhydride groups, preferably in latent form; a compound which releases an acid as a result of thermal treatment; a photoreactive compound, from which a base is created during the irradiation with light, x-ray, electron or ion beams; a solvent; and optionally one or more additives.

Abstract: Film-forming, functionalized polymers having 1,2-dicarboxylic acid monoester groups have at least two polymer units, one of which is acid-labile and hydrolysis-stable and the other is thermally stable. These polymers are used in particular in photoresists.

Abstract: A radiation-sensitive mixture contains the following components:a film-forming polymer which has an acid-labile, hydrolysis-stable polymer unit and at least one thermally stable polymer unit;a radiation-sensitive compound which liberates an acid on exposure to radiation;a solvent;if required, additives.This radiation-sensitive mixture can be used for the production of positive or negative relief structures, in each case with an aqueous developer.