Patents by Inventor Stefan J. Pastine

Stefan J. Pastine has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11926737
    Abstract: A composition for curable films, a curable film made thereof, and a cured product obtained by curing the curable film are disclosed. The curable film contains fused silica and/or hollow glass microspheres, a rubber composition containing at least one diene-based rubber, and a toluene soluble maleimide resin. The curable film is thin and has excellent processibilities. The cured product has desirable dielectric and thermomechanical characteristics that are suitable to be used as a dielectric material for printed circuit boards, especially for multilayer printed circuit boards and high-density interconnect printed circuit boards.
    Type: Grant
    Filed: February 24, 2023
    Date of Patent: March 12, 2024
    Assignee: Thintronics, Inc.
    Inventors: Stefan J. Pastine, Yaroslav Klichko
  • Patent number: 11926736
    Abstract: A curable film and a cured product obtained by curing the curable film are disclosed. The curable film contains, as essential components, hollow glass microspheres and a rubber composition containing at least one diene-based rubber. The curable film is thin and has excellent processibilities. The cured product has desirable dielectric and thermomechanical characteristics that are suitable to be used as a dielectric material for printed circuit boards, especially for multilayer printed circuit boards and high-density interconnect printed circuit boards.
    Type: Grant
    Filed: February 17, 2023
    Date of Patent: March 12, 2024
    Assignee: Thintronics, Inc.
    Inventors: Stefan J. Pastine, Yaroslav Klichko
  • Patent number: 11930596
    Abstract: Described herein are dielectric polymer films and printed circuit boards, such as multilayer and high-density interconnect printed circuit board comprising at least one dielectric polymer film.
    Type: Grant
    Filed: January 12, 2023
    Date of Patent: March 12, 2024
    Assignee: Thintronics, Inc.
    Inventors: Tarun Amla, Stefan J. Pastine
  • Patent number: 11905228
    Abstract: This application relates, in part, to novel salts represented by the following structure of Formula (1): wherein R1a is selected from the group consisting of hydrogen and optionally substituted alkyl (e.g., unsubstituted C1-6 alkyl, e.g., —CH3); R1b is optionally substituted alkyl (e.g., unsubstituted C1-6 alkyl, e.g., —CH3); each occurrence of R2 and R3 is independently selected from the group consisting of hydrogen, optionally substituted alkyl, optionally substituted cycloalkyl, and optionally substituted aryl; R2 and R3 can combine with each other to form optionally substituted cycloalkyl; each m and n is independently an integer ranging from 1 to 20 (e.g., m and n is independently an integer ranging from 1 to 5); and each of Q1? and Q2? is independently a counterion (e.g., each of Q1? and Q2? is independently a counterion selected from the group consisting of chloride, bromide, fluoride, iodide, acetate, carboxylate, hydrogen sulfate, nitrate, and phenolate, and sulfonate, e.g.
    Type: Grant
    Filed: August 5, 2021
    Date of Patent: February 20, 2024
    Assignee: Aditya Birla Chemicals (USA), Inc.
    Inventors: Szymon Kosinski, Stefan J. Pastine, Ulhas Bhatt
  • Patent number: 11820875
    Abstract: Provided herein is a polymer composition comprising a polyhydroxyamino ether (e.g., a crosslinked polyhydroxyamino ether) and printed circuit boards comprising the same.
    Type: Grant
    Filed: May 12, 2022
    Date of Patent: November 21, 2023
    Assignee: Thintronics, Inc.
    Inventors: Tarun Amla, Stefan J. Pastine
  • Publication number: 20230309221
    Abstract: Described herein are dielectric polymer films and printed circuit boards, such as multilayer and high-density interconnect printed circuit board comprising at least one dielectric polymer film.
    Type: Application
    Filed: January 12, 2023
    Publication date: September 28, 2023
    Applicant: Thintronics, Inc.
    Inventors: Tarun Amla, Stefan J. Pastine
  • Patent number: 11731932
    Abstract: Provided herein are silicon-containing recyclable polyamino compounds; epoxy resin compositions containing these silicon-containing reworkable or recyclable polyamino compounds; and methods of their use.
    Type: Grant
    Filed: November 2, 2020
    Date of Patent: August 22, 2023
    Assignee: Aditya Birla Chemicals (USA), Inc.
    Inventors: Szymon Kosinski, Stefan J. Pastine
  • Publication number: 20230099234
    Abstract: Provided herein is a polymer composition comprising a polyhydroxyamino ether (e.g., a crosslinked polyhydroxyamino ether) and printed circuit boards comprising the same.
    Type: Application
    Filed: May 12, 2022
    Publication date: March 30, 2023
    Inventors: Tarun Amla, Stefan J. Pastine
  • Patent number: 11596066
    Abstract: Described herein are dielectric polymer films and printed circuit boards, such as multilayer and high-density interconnect printed circuit board comprising at least one dielectric polymer film.
    Type: Grant
    Filed: March 22, 2022
    Date of Patent: February 28, 2023
    Assignee: Thintronics. Inc.
    Inventors: Tarun Amla, Stefan J. Pastine
  • Patent number: 11542224
    Abstract: The present invention relates to the reduction of polycyano compounds to produce polyamines, in particular diaminoacetal and diaminoketal compounds, and their use as curing agents in epoxy resin compositions. The reduction with molecular hydrogen can be carried out using a metal catalyst selected from GROUP VIII and a catalytic promoter. The reduction can include anhydrous or aqueous ammonia. The reaction can be carried out in continuous and batch modes with catalyst and solvent recycling. The epoxy resin composition consisting of an epoxy resin and a polyamine curing agent that can be used in fiber-reinforced composite materials, coating materials, and the like.
    Type: Grant
    Filed: April 17, 2020
    Date of Patent: January 3, 2023
    Assignee: Aditya Birla Chemicals (USA), Inc.
    Inventors: Szymon Kosinski, Stefan J. Pastine
  • Publication number: 20220356145
    Abstract: Provided herein are silicon-containing recyclable polyamino compounds; epoxy resin compositions containing these silicon-containing reworkable or recyclable polyamino compounds; and methods of their use.
    Type: Application
    Filed: November 2, 2020
    Publication date: November 10, 2022
    Inventors: Szymon Kosinski, Stefan J. Pastine
  • Patent number: 11359062
    Abstract: Provided herein is a polymer composition comprising a polyhydroxyamino ether (e.g., a crosslinked polyhydroxyamino ether) and printed circuit boards comprising the same.
    Type: Grant
    Filed: January 20, 2021
    Date of Patent: June 14, 2022
    Assignee: Thintronics, Inc.
    Inventors: Tarun Amla, Stefan J. Pastine
  • Publication number: 20220024854
    Abstract: This application relates, in part, to novel salts represented by the following structure of Formula (1): wherein R1a is selected from the group consisting of hydrogen and optionally substituted alkyl (e.g., unsubstituted C1-6 alkyl, e.g., —CH3); R1b is optionally substituted alkyl (e.g., unsubstituted C1-6 alkyl, e.g., —CH3); each occurrence of R2 and R3 is independently selected from the group consisting of hydrogen, optionally substituted alkyl, optionally substituted cycloalkyl, and optionally substituted aryl; R2 and R3 can combine with each other to form optionally substituted cycloalkyl; each m and n is independently an integer ranging from 1 to 20 (e.g., m and n is independently an integer ranging from 1 to 5); and each of Q1? and Q2? is independently a counterion (e.g., each of Q1? and Q2? is independently a counterion selected from the group consisting of chloride, bromide, fluoride, iodide, acetate, carboxylate, hydrogen sulfate, nitrate, and phenolate, and sulfonate, e.g.
    Type: Application
    Filed: August 5, 2021
    Publication date: January 27, 2022
    Inventors: Szymon Kosinski, Stefan J. Pastine, Ulhas Bhatt
  • Patent number: 11124473
    Abstract: This application relates, in part, to novel salts represented by the following structure of Formula (1): wherein R1a is selected from the group consisting of hydrogen and optionally substituted alkyl (e.g., unsubstituted C1-6 alkyl, e.g., —CH3); R1b is optionally substituted alkyl (e.g., unsubstituted C1-6 alkyl, e.g., —CH3); each occurrence of R2 and R3 is independently selected from the group consisting of hydrogen, optionally substituted alkyl, optionally substituted cycloalkyl, and optionally substituted aryl; R2 and R3 can combine with each other to form optionally substituted cycloalkyl; each m and n is independently an integer ranging from 1 to 20 (e.g., m and n is independently an integer ranging from 1 to 5); and each of Q1? and Q2? is independently a counterion (e.g., each of Q1? and Q2? is independently a counterion selected from the group consisting of chloride, bromide, fluoride, iodide, acetate, carboxylate, hydrogen sulfate, nitrate, and phenolate, and sulfonate, e.g.
    Type: Grant
    Filed: June 11, 2018
    Date of Patent: September 21, 2021
    Assignee: Aditya Birla Chemicals (USA) LLC
    Inventors: Szymon Kosinski, Stefan J. Pastine, Ulhas Bhatt
  • Patent number: 10919839
    Abstract: Provided herein are silicon-containing recyclable polyamino compounds; epoxy resin compositions containing these silicon-containing reworkable or recyclable polyamino compounds; and methods of their use.
    Type: Grant
    Filed: June 11, 2018
    Date of Patent: February 16, 2021
    Assignee: Aditya Birla Chemicals (USA) LLC
    Inventors: Szymon Kosinski, Stefan J. Pastine
  • Publication number: 20200317604
    Abstract: The present invention relates to the reduction of polycyano compounds to produce polyamines, in particular diaminoacetal and diaminoketal compounds, and their use as curing agents in epoxy resin compositions. The reduction with molecular hydrogen can be carried out using a metal catalyst selected from GROUP VIII and a catalytic promoter. The reduction can include anhydrous or aqueous ammonia. The reaction can be carried out in continuous and batch modes with catalyst and solvent recycling. The epoxy resin composition consisting of an epoxy resin and a polyamine curing agent that can be used in fiber-reinforced composite materials, coating materials, and the like.
    Type: Application
    Filed: April 17, 2020
    Publication date: October 8, 2020
    Inventors: Szymon Kosinski, Stefan J. Pastine
  • Publication number: 20190284128
    Abstract: The present invention relates to the reduction of polycyano compounds to produce polyamines, in particular diaminoacetal and diaminoketal compounds, and their use as curing agents in epoxy resin compositions. The reduction with molecular hydrogen can be carried out using a metal catalyst selected from GROUP VIII and a catalytic promoter. The reduction can include anhydrous or aqueous ammonia. The reaction can be carried out in continuous and batch modes with catalyst and solvent recycling. The epoxy resin composition consisting of an epoxy resin and a polyamine curing agent that can be used in fiber-reinforced composite materials, coating materials, and the like.
    Type: Application
    Filed: January 3, 2019
    Publication date: September 19, 2019
    Inventors: Szymon Kosinski, Stefan J. Pastine
  • Patent number: 10214479
    Abstract: The present invention relates to the reduction of polycyano compounds to produce polyamines, in particular diaminoacetal and diaminoketal compounds, and their use as curing agents in epoxy resin compositions. The reduction with molecular hydrogen can be carried out using a metal catalyst selected from GROUP VIII and a catalytic promoter. The reduction can include anhydrous or aqueous ammonia. The reaction can be carried out in continuous and batch modes with catalyst and solvent recycling. The epoxy resin composition consisting of an epoxy resin and a polyamine curing agent that can be used in fiber-reinforced composite materials, coating materials, and the like.
    Type: Grant
    Filed: January 3, 2017
    Date of Patent: February 26, 2019
    Assignee: Connora Technologies, Inc.
    Inventors: Szymon Kosinski, Stefan J. Pastine
  • Publication number: 20190016667
    Abstract: This application relates, in part, to novel salts represented by the following structure of Formula (1): wherein R1a is selected from the group consisting of hydrogen and optionally substituted alkyl (e.g., unsubstituted C1-6 alkyl, e.g., —CH3); R1b is optionally substituted alkyl (e.g., unsubstituted C1-6 alkyl, e.g., —CH3); each occurrence of R2 and R3 is independently selected from the group consisting of hydrogen, optionally substituted alkyl, optionally substituted cycloalkyl, and optionally substituted aryl; R2 and R3 can combine with each other to form optionally substituted cycloalkyl; each m and n is independently an integer ranging from 1 to 20 (e.g., m and n is independently an integer ranging from 1 to 5); and each of Q1? and Q2? is independently a counterion (e.g., each of Q1? and Q2? is independently a counterion selected from the group consisting of chloride, bromide, fluoride, iodide, acetate, carboxylate, hydrogen sulfate, nitrate, and phenolate, and sulfonate, e.g.
    Type: Application
    Filed: June 11, 2018
    Publication date: January 17, 2019
    Inventors: Szymon Kosinski, Stefan J. Pastine, Ulhas Bhatt
  • Publication number: 20190016870
    Abstract: Provided herein are silicon-containing recyclable polyamino compounds; epoxy resin compositions containing these silicon-containing reworkable or recyclable polyamino compounds; and methods of their use.
    Type: Application
    Filed: June 11, 2018
    Publication date: January 17, 2019
    Inventors: Szymon Kosinski, Stefan J. Pastine