Patents by Inventor Stefan KRÜGEL

Stefan KRÜGEL has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11954065
    Abstract: A process of extending retention periods of records. In operation, an electronic computing device identifies a retention period associated with the record. The device obtains information related to a future event. The information includes a time period during which the future event is predicted or scheduled to occur and a location at which the future event is predicted or scheduled to occur. When the device determines that the record is contextually related to the future event based at least in part on the time period or the location of the future event, the retention period associated with the record is extended. The device may also automatically extend retention periods of records based on a number of other retention-related factors associated with the record including recording content, record trustworthiness, recording time, recording location, recording data type, recording source, recording officers' profile and their association, crime statistics, incident severity, and the like.
    Type: Grant
    Filed: March 18, 2022
    Date of Patent: April 9, 2024
    Assignee: MOTOROLA SOLUTIONS, INC.
    Inventors: Stuart J Boutell, Chris A Kruegel, Stefan Koprowski, Grzegorz Gustof
  • Publication number: 20200369927
    Abstract: The invention relates to a release foil comprising a substrate layer, a printed image and a release coating, wherein the the printed image is arranged at least partially between the substrate layer and the release coating, wherein the printed image includes at least one dye that is cured by UV radiation, and wherein the release coating includes a polysiloxane that is cured by UV radiation.
    Type: Application
    Filed: January 18, 2019
    Publication date: November 26, 2020
    Inventors: Sahin SAYGILI, Stefan SITZMANN (deceased), Werner SCHMIDT, Stefan KRÜGEL, Matthias SEELER, Gerald DITTRICH
  • Publication number: 20030157772
    Abstract: A method of forming oxide layers of different thickness on a substrate is disclosed, wherein the oxide layers preferably serve as gate insulation layers of field effect transistors. The method allows to form very thin, high quality oxide layers with a reduced number of masking steps compared to the conventional processing, wherein the thickness difference can be maintained within a range of some tenths of a nanometer. The method substantially eliminates any high temperature oxidations and is also compatible with most chemical vapor deposition techniques used for gate dielectric deposition in sophisticated semiconductor devices.
    Type: Application
    Filed: July 30, 2002
    Publication date: August 21, 2003
    Inventors: Karsten Wieczorek, Falk Graetsch, Stefan Kruegel