Patents by Inventor Stefan Kruiswijk

Stefan Kruiswijk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Publication number: 20070229828
    Abstract: A double processing technique for device manufacture is disclosed that includes performing a first patterning step to form apertures in a resist layer which apertures are filled before the first resist layer is stripped and replaced by a second resist layer to be used in the second exposure. In an embodiment, a lithographic cell includes an integrated fill and/or strip unit and may be used to perform the above technique.
    Type: Application
    Filed: April 4, 2006
    Publication date: October 4, 2007
    Applicant: ASML NETHERLANDS B.V.
    Inventor: Stefan Kruiswijk