Patents by Inventor Stefan Kubsky

Stefan Kubsky has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8479311
    Abstract: The invention relates to a device for an atomic force microscope (AFM) for the study and/or modification of surface properties. The device comprises a cantilever (flexible bar) having an integrated, piezoresistive sensor, an integrated bimorphic actuator, and a measuring tip. The measuring tip carries at least two metal electrodes, which can be activated via electrical terminals. The measuring tip and/or the cantilever have at least one nanoscopic hole through which synchrotron radiation or laser light is directed onto the material surface to be studied. Furthermore, the invention relates to a method for the study and modification of surface properties and surface-proximal properties, which can be executed using such a device. To this end, atomic force microscopy (AFM), surface enhanced Raman scattering (SERS), photo emission spectroscopy (XPS, XAS), and material modification by local exposure are executed in sequence or simultaneously using the same device.
    Type: Grant
    Filed: December 10, 2008
    Date of Patent: July 2, 2013
    Assignees: Technische Universitat Ilmenau, Synchrotron Soleil, The Regents of the University of California
    Inventors: Stefan Kubsky, Deirdre Olynick, Peter Schuck, Jan Meijer, Ivo W. Rangelow
  • Publication number: 20110055985
    Abstract: The invention relates to a device for an atomic force microscope (AFM) for the study and/or modification of surface properties. The device comprises a cantilever (flexible bar) having an integrated, piezoresistive sensor, an integrated bimorphic actuator, and a measuring tip. The measuring tip carries at least two metal electrodes, which can be activated via electrical terminals. The measuring tip and/or the cantilever have at least one nanoscopic hole through which synchrotron radiation or laser light is directed onto the material surface to be studied. Furthermore, the invention relates to a method for the study and modification of surface properties and surface-proximal properties, which can be executed using such a device. To this end, atomic force microscopy (AFM), surface enhanced Raman scattering (SERS), photo emission spectroscopy (XPS, XAS), and material modification by local exposure are executed in sequence or simultaneously using the same device.
    Type: Application
    Filed: December 10, 2008
    Publication date: March 3, 2011
    Applicants: TECHNISCHE UNIVERSITAT ILMENAU, SYNCHROTRON SOLEIL, THE REGENTS OF THE UNIVERSITY OF CALIFORNIA
    Inventors: Stefan Kubsky, Deirdre Olynick, Peter Schuck, Jan Meijer, Ivo W. Rangelow