Abstract: A method for monitoring a pressurized gas-based cleaning process in a hose filter installation (2): during a cleaning process, a throughflow (Q) of a pressurized-gas flow during a predefinable time period (T) is determined, a throughflow characteristic (V) is determined using the determined throughflow (Q) of the pressurized-gas flow, and the pressurized gas-based cleaning process is monitored using the throughflow characteristic (V), wherein the throughflow characteristic (V) is a pressurized-gas quantity that has flowed in the predefinable time period (T). A monitoring system (40) for a hose filter installation (2) has at least one throughflow sensor (44) for determining a throughflow (Q) of a pressurized-gas flow, and a control unit (42) for controlling a pressurized gas-based cleaning process, wherein the throughflow sensor (44) is a volume flow sensor or a mass flow sensor, and the control unit (42) is set up for carrying out the method.

Abstract: The invention relates to an emission cleaning system which is disposed on the intake tract of an internal combustion engine and has at least one device for taking in air and also at least one filter unit and a control/regulating device.

Abstract: The invention relates to an emission cleaning system which is disposed on the intake tract of an internal combustion engine and has at least one device for taking in air and also at least one filter unit and a control/regulating device.

Abstract: A material transport and event control in systems with piezoelectrically activated droplet emission including a device for metering a material into a carrier matrix, having a carrier matrix source (0) supplying a carrier matrix, a supply vessel (1) filled with the material in preferably liquid form, a metering unit (3, 4) including a metering chamber (4), disposed downstream of the carrier matrix source and a metering head (3 disposed downstream of the supply vessel and configured preferably for piezoelectrically activated droplet emission, the carrier matrix being supplied to the metering chamber from the carrier matrix source, and the material being supplied to the metering head from the supply vessel, being emitted via the metering head into the metering chamber and consequently being metered into the carrier matrix, including a pressure control device configured to control the pressure in the supply vessel (1) and/or the pressure in the metering unit.