Patents by Inventor Stefan Michiel Witte
Stefan Michiel Witte has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20240004312Abstract: Disclosed is a metrology apparatus for measurement of a target formed on a substrate by a lithographic process and associated method. The metrology apparatus comprises a radiation source operable to provide first radiation; a configured solid high harmonic generation medium being configured to receive and be excited by said first radiation to generate high harmonic second radiation from an output surface of the configured solid high harmonic generation medium; and a detection arrangement operable to detect said second radiation, at least a portion of which having been scattered by said target. The configured solid high harmonic generation medium is configured to shape the beam of said second radiation and/or separate said first and second radiation.Type: ApplicationFiled: October 28, 2021Publication date: January 4, 2024Applicant: ASML Netherlands B.V.Inventors: Peter Michael KRAUS, Sylvianne Dorothea Christina ROSCAM ABBING, Filippo CAMPI, ZhuangYan ZHANG, Petrus Wilhelmus SMORENBURG, Nan LIN, Stefan Michiel WITTE, Arie Jeffrey DEN BOEF
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Publication number: 20240003809Abstract: Disclosed is a metrology apparatus and method for measurement of a diffractive structure on a substrate. The metrology apparatus comprises a radiation source operable to provide first radiation for excitation of the diffractive structure such that high harmonic second radiation is generated from said diffractive structure and/or substrate; and a detection arrangement operable to detect said second radiation, at least a portion of which having been diffracted by said diffractive structure.Type: ApplicationFiled: October 12, 2021Publication date: January 4, 2024Applicant: ASML Netherlands B.V.Inventors: Peter Michael KRAUS, Sylvianne Dorothea Christina ROSCAM ABBING, Filippo CAMPI, ZhuangYan ZHANG, Petrus Wilhelmus SMORENBURG, Nan LIN, Stefan Michiel WITTE, Arie Jeffrey DEN BOEF
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Patent number: 11391677Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.Type: GrantFiled: January 23, 2020Date of Patent: July 19, 2022Assignee: ASML Netherlands B. V.Inventors: Stefan Michiel Witte, Gijsbert Simon Matthijs Jansen, Lars Christian Freisem, Kjeld Sijbrand Eduard Eikema, Simon Gijsbert Josephus Mathijssen
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Patent number: 11042096Abstract: A method for determining a characteristic of a feature in an object, the feature being disposed below a surface of the object is disclosed. The surface of the object is irradiated with a pulsed pump radiation beam so as to produce an acoustic wave in the object. The surface of the object is then irradiated with a measurement radiation beam. A portion of the measurement radiation beam scattered from the surface is received and a characteristic of the feature in the object is determined from at least a portion of the measurement radiation beam scattered from the surface within a measurement time period. A temporal intensity distribution of the pulsed pump radiation beam is selected such that in the measurement time period a signal to background ratio is greater than a signal to background ratio achieved using a single pulse of the pulsed pump radiation beam.Type: GrantFiled: May 15, 2018Date of Patent: June 22, 2021Assignee: ASML Netherlands B.V.Inventors: Stefan Michiel Witte, Alessandro Antoncecchi, Hao Zhang, Stephen Edward, Paulus Clemens Maria Planken, Sebastianus Adrianus Goorden, Simon Reinald Huisman, Irwan Dani Setija, David Ferdinand Vles
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Patent number: 10788765Abstract: As increasing numbers of layers, using increasing numbers of specific materials, are deposited on substrates, it becomes increasingly difficult to detect alignment marks accurately for, for example, applying a desired pattern onto a substrate using a lithographic apparatus, in part due to one or more of the materials used in one or more of the layers being wholly or partially opaque to the radiation used to detect alignment marks. In a first step, the substrate is illuminated with excitation radiation. In a second step, at least one effect associated with a reflected material effect scattered by a buried structure is measured. The effect may, for example, include a physical displacement of the surface of the substrate. In a third step, at least one characteristic of the structure based on the measured effect is derived.Type: GrantFiled: January 10, 2018Date of Patent: September 29, 2020Assignee: ASML Netherlands B.V.Inventors: Stefan Michiel Witte, Alessandro Antoncecchi, Stephen Edward, Hao Zhang, Paulus Clemens Maria Planken, Kjeld Sijbrand Eduard Eikema, Sebastianus Adrianus Goorden, Simon Reinald Huisman, Irwan Dani Setija
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Publication number: 20200232931Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.Type: ApplicationFiled: January 23, 2020Publication date: July 23, 2020Applicants: ASML Netherlands B.V., Stiching Nederlandse Wetenschappelijk Onderzoek Instituten, Stichting VU, Universiteit van AmsterdamInventors: Stefan Michiel WITTE, Gijsbert Simon Matthijs JANSEN, Lars Christian FREISEM, Kjeld Sijbrand Eduard EIKEMA, Simon Gijsbert Josephus MATHIJSSEN
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Patent number: 10648919Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.Type: GrantFiled: May 15, 2018Date of Patent: May 12, 2020Assignee: ASML Netherlands B.V.Inventors: Stefan Michiel Witte, Gijsbert Simon Matthijs Jansen, Lars Christian Freisem, Kjeld Sijbrand Eduard Eikema, Simon Gijsbert Josephus Mathijssen
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Publication number: 20200142319Abstract: A method for determining a characteristic of a feature in an object, the feature being disposed below a surface of the object is disclosed. The surface of the object is irradiated with a pulsed pump radiation beam so as to produce an acoustic wave in the object. The surface of the object is then irradiated with a measurement radiation beam. A portion of the measurement radiation beam scattered from the surface is received and a characteristic of the feature in the object is determined from at least a portion of the measurement radiation beam scattered from the surface within a measurement time period. A temporal intensity distribution of the pulsed pump radiation beam is selected such that in the measurement time period a signal to background ratio is greater than a signal to background ratio achieved using a single pulse of the pulsed pump radiation beam.Type: ApplicationFiled: May 15, 2018Publication date: May 7, 2020Applicant: ASML Netherlands B.V.Inventors: Stefan Michiel WITTE, Alessandro ANTONCECCHI, Hao ZHANG, Stephen EDWARD, Paulus Clemens Maria PLANKEN, Sebastianus Adrianus GOORDEN, Simon Reinaid HUISMAN, Irwan Dani SETiJA, David Ferdinand VLES
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Publication number: 20190354026Abstract: As increasing numbers of layers, using increasing numbers of specific materials, are deposited on substrates, it becomes increasingly difficult to detect alignment marks accurately for, for example, applying a desired pattern onto a substrate using a lithographic apparatus, in part due to one or more of the materials used in one or more of the layers being wholly or partially opaque to the radiation used to detect alignment marks. In a first step, the substrate is illuminated with excitation radiation. In a second step, at least one effect associated with a reflected material effect scattered by a buried structure is measured. The effect may, for example, include a physical displacement of the surface of the substrate. In a third step, at least one characteristic of the structure based on the measured effect is derived.Type: ApplicationFiled: January 10, 2018Publication date: November 21, 2019Applicant: ASML Netherlands B.V.Inventors: Stefan Michiel WITTE, Alessandro ANTONCECCHI, Stephen EDWARD, Hao ZHANG, Paulus Clemens Maria PLANKEN, Kjeld Sijbrand Eduard EIKEMA, Sebastianus Adrianus GOORDEN, Simon Reinald HUISMAN, Irwan Dani SETIJA
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Patent number: 10459347Abstract: In an inspection apparatus, a target on the surface is illuminated with illuminating radiation that comprises first and second illuminating components. The illuminating components form one or more periodic illuminating patterns on the surface. A plurality of scattered radiation patterns formed by the illuminating radiation after scattering by the target is captured at a detector for a number of values of a controllable characteristic of at least one of the illuminating components. The captured radiation is then used to reconstruct data describing the target.Type: GrantFiled: March 8, 2017Date of Patent: October 29, 2019Assignee: ASML Netherlands B.V.Inventors: Dirk Ewoud Boonzajer Flaes, Stefan Michiel Witte, Kjeld Sijbrand Eduard Eikema
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Patent number: 10386735Abstract: A lithographic apparatus comprises comprise a substrate table constructed to hold a substrate; and a sensor configured to sense a position of an alignment mark provided onto the substrate held by the substrate table. The sensor comprises a source of radiation configured to illuminate the alignment mark with a radiation beam, a detector configured to detect the radiation beam, having interacted with the alignment mark, as an out of focus optical pattern, and a data processing system. The data processing system is configured to receive image data representing the out of focus optical pattern, and process the image data for determining alignment information, comprising applying a lensless imaging algorithm to the out of focus optical pattern.Type: GrantFiled: August 22, 2016Date of Patent: August 20, 2019Assignee: ASML Netherlands B.V.Inventors: Simon Gijsbert Josephus Mathijssen, Arie Jeffrey Den Boef, Nitesh Pandey, Patricius Aloysius Jacobus Tinnemans, Stefan Michiel Witte, Kjeld Sijbrand Eduard Eikema
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Publication number: 20180348145Abstract: A metrology apparatus (302) includes a higher harmonic generation (HHG) radiation source for generating (310) EUV radiation. Operation of the HHG source is monitored using a wavefront sensor (420) which comprises an aperture array (424, 702) and an image sensor (426). A grating (706) disperses the radiation passing through each aperture so that the image detector captures positions and intensities of higher diffraction orders for different spectral components and different locations across the beam. In this way, the wavefront sensor can be arranged to measure a wavefront tilt for multiple harmonics at each location in said array. In one embodiment, the apertures are divided into two subsets (A) and (B), the gratings (706) of each subset having a different direction of dispersion. The spectrally resolved wavefront information (430) is used in feedback control (432) to stabilize operation of the HGG source, and/or to improve accuracy of metrology results.Type: ApplicationFiled: May 15, 2018Publication date: December 6, 2018Applicants: ASML Netherlands B.V., Stichting Nederlandse Wetenschappelijk Onderzoek Instituten, Stichting VU, Universiteit van AmsterdamInventors: Stefan Michiel WITTE, Gijsbert Simon Matthijs Jansen, Lars Christian Freisem, Kjeld Sijbrand Eduard Eikema, Simon Gijsbert Josephus Mathijssen
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Patent number: 10088762Abstract: A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). The lithographic apparatus has an inspection apparatus with an EUV radiation source. The radiation source emits a radiation beam that includes coherent radiation of a specific wavelength. The beam propagates to illumination optical system, which focuses the radiation beam into a focused beam of illuminating radiation. The illumination optical system illuminates a three-dimensional product structure on the substrate, which scatters the illuminating radiation. On the surface of a detector, the radiation scattered by the product structure forms a diffraction pattern that is used to reconstruct data describing the three-dimensional product structure.Type: GrantFiled: December 16, 2016Date of Patent: October 2, 2018Assignee: ASML Netherlands B.V.Inventors: Stefan Michiel Witte, Kjeld Sijbrand Eduard Eikema
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Publication number: 20180246423Abstract: A lithographic apparatus comprises comprise a substrate table constructed to hold a substrate; and a sensor configured to sense a position of an alignment mark provided onto the substrate held by the substrate table. The sensor comprises a source of radiation configured to illuminate the alignment mark with a radiation beam, a detector configured to detect the radiation beam, having interacted with the alignment mark, as an out of focus optical pattern, and a data processing system. The data processing system is configured to receive image data representing the out of focus optical pattern, and process the image data for determining alignment information, comprising applying a lensless imaging algorithm to the out of focus optical pattern.Type: ApplicationFiled: August 22, 2016Publication date: August 30, 2018Applicant: ASML Netherlands B.V.Inventors: Simon Gijsbert Josephus MATHIJSSEN, Arie Jeffrey DEN BOEF, Nitesh PANDEY, Patricius Aloysius Jacobus TINNEMANS, Stefan Michiel WITTE, Kjeld Sijbrand Eduard EIKEMA
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Publication number: 20170269482Abstract: In an inspection apparatus, a target on the surface is illuminated with illuminating radiation that comprises first and second illuminating components. The illuminating components form one or more periodic illuminating patterns on the surface. A plurality of scattered radiation patterns formed by the illuminating radiation after scattering by the target is captured at a detector for a number of values of a controllable characteristic of at least one of the illuminating components. The captured radiation is then used to reconstruct data describing the target.Type: ApplicationFiled: March 8, 2017Publication date: September 21, 2017Applicants: Stichting VU, Universiteit van Amsterdam, Stichting voor Fundamenteel Onderzoek der Materie, ASML Netherlands B.V.Inventors: Dirk Ewoud Boonzajer Flaes, Stefan Michiel Witte, Kjeld Sijbrand Eduard Eikema
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Publication number: 20170176879Abstract: A lithographic apparatus is a machine that applies a desired pattern onto a substrate, usually onto a target portion of the substrate. A lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs). The lithographic apparatus has an inspection apparatus with an EUV radiation source. The radiation source emits a radiation beam that includes coherent radiation of a specific wavelength. The beam propagates to illumination optical system, which focuses the radiation beam into a focused beam of illuminating radiation. The illumination optical system illuminates a three-dimensional product structure on the substrate, which scatters the illuminating radiation. On the surface of a detector, the radiation scattered by the product structure forms a diffraction pattern that is used to reconstruct data describing the three-dimensional product structure.Type: ApplicationFiled: December 16, 2016Publication date: June 22, 2017Applicants: Stichting VU, Universiteit van Amsterdam, Stichting voor Fundamenteel Onderzoek der Materie, ASML Netherlands B.V.Inventors: Stefan Michiel WITTE, Kjeld Sijbrand Eduard EIKEMA
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Patent number: 9632039Abstract: Metrology targets are formed on a substrate (W) by a lithographic process. A target (T) comprising one or more grating structures is illuminated with spatially coherent radiation under different conditions. Radiation (650) diffracted by from said target area interferes with reference radiation (652) interferes with to form an interference pattern at an image detector (623). One or more images of said interference pattern are captured. From the captured image(s) and from knowledge of the reference radiation a complex field of the collected scattered radiation at the detector. A synthetic radiometric image (814) of radiation diffracted by each grating is calculated from the complex field. From the synthetic radiometric images (814, 814?) of opposite portions of a diffractions spectrum of the grating, a measure of asymmetry in the grating is obtained. Using suitable targets, overlay and other performance parameters of the lithographic process can be calculated from the measured asymmetry.Type: GrantFiled: August 27, 2015Date of Patent: April 25, 2017Assignee: ASML Netherlands B.V.Inventors: Arie Jeffrey Den Boef, Simon Gijsbert Josephus Mathijssen, Nitesh Pandey, Stefan Michiel Witte, Kjeld Eikema
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Publication number: 20160061750Abstract: Metrology targets are formed on a substrate (W) by a lithographic process. A target (T) comprising one or more grating structures is illuminated with spatially coherent radiation under different conditions. Radiation (650) diffracted by from said target area interferes with reference radiation (652) interferes with to form an interference pattern at an image detector (623). One or more images of said interference pattern are captured. From the captured image(s) and from knowledge of the reference radiation a complex field of the collected scattered radiation at the detector. A synthetic radiometric image (814) of radiation diffracted by each grating is calculated from the complex field. From the synthetic radiometric images (814, 814?) of opposite portions of a diffractions spectrum of the grating, a measure of asymmetry in the grating is obtained. Using suitable targets, overlay and other performance parameters of the lithographic process can be calculated from the measured asymmetry.Type: ApplicationFiled: August 27, 2015Publication date: March 3, 2016Applicants: Vrije Universiteit Amsterdam, Universiteit van Amsterdam, Stichting voor Fundamenteel Onderzoek der Materie, ASML Netherlands B.V.Inventors: Arie Jeffrey DEN BOEF, Simon Gijsbert Josephus MATHIJSSEN, Nitesh PANDEY, Stefan Michiel WITTE, Kjeld EIKEMA
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Publication number: 20150234170Abstract: A microscopic imaging apparatus to provide an image of a sample. The apparatus includes an illumination system to provide an illumination beam with radiation; and a sensor constructed and arranged to receive: a first image of a first diffraction pattern created by diffraction of the illumination beam on the sample; and a second image of a second diffraction pattern created by diffraction of the illumination beam on the sample.Type: ApplicationFiled: August 27, 2013Publication date: August 20, 2015Inventors: Stefan Michiel Witte, Kjeld Sijbrand Eduard Eikema