Abstract: The present invention concerns new halogen substituted diketone compounds, new pyrazole compounds, processes for the manufacture of pyrazole compounds and processes for the manufacture of agrochemical or pharmaceutical compounds.

Abstract: The present invention concerns new halogen substituted diketone compounds, new pyrazole compounds, processes for the manufacture of pyrazole compounds and processes for the manufacture of agrochemical or pharmaceutical compounds.

Abstract: The present invention concerns new halogen substituted diketone compounds, new pyrazole compounds, processes for the manufacture of pyrazole compounds and processes for the manufacture of agrochemical or pharmaceutical compounds.

Abstract: A tube trailer containing a gas comprising from 35 to 92.5 vol % of molecular fluorine. A semiconductor manufacturing plant having a gas supply system wherein such tube trailer is connected to the gas supply system of the semiconductor manufacturing plant. A method for supplying a gas comprising using such tube trailer to transport gas from a gas manufacturing site to a user site.

Abstract: Elemental fluorine is used as etching agent for the manufacture of electronic devices, especially semiconductor devices, micro-electromechanical devices, thin film transistors, flat panel displays and solar panels, and as chamber cleaning agent mainly for plasma-enhanced chemical vapor deposition (PECVD) apparatus. For this purpose, fluorine often is produced on-site. The invention provides a process for the manufacture of electronic devices wherein fluorine is produced on site and is purified from HF by a low temperature treatment. A pressure of between 1.5 and 20 Bars absolute is especially advantageous.

Abstract: A method for removing a silicon hydride from the surface of a solid body which comprises treating the silicon hydride with a gas comprising molecular fluorine or reactive species generated from molecular fluorine.

Abstract: A process for the manufacture of 1,1,1,3,3-pentafluoropropane which comprises adding hydrogen fluoride to 1,1,1,3-tetrafluoropropene in the substantial absence of metal catalyst. Another embodiment provides for the manufacture of 1,1,1,3,3-pentafluoropropane which comprises adding hydrogen fluoride to 1,1,1,3-tetrafluoropropene in the presence of an amine hydrofluoride complex and a metal catalyst.

Abstract: A process for the manufacture of 1,1,1,3,3-pentafluoropropane, which comprises reacting 1,1,1,3,3,3-hexafluoropropane with a source of hydrogen.

Abstract: A process for the manufacture of 1,1,1,3,3-pentafluoropropane, which comprises reacting 1,1,1,3,3,3-hexafluoropropane with a source of hydrogen.

Abstract: A process for the manufacture of 1,1,1,3,3-pentafluoropropane which comprises adding hydrogen fluoride to 1,1,1,3-tetrafluoropropene in the substantial absence of metal catalyst. Another embodiment provides for the manufacture of 1,1,1,3,3-pentafluoropropane which comprises adding hydrogen fluoride to 1,1,1,3-tetrafluoropropene in the presence of an amine hydrofluoride complex and a metal catalyst.