Abstract: Embodiments of systems and methods for storing documents in a cloud storage system comprising a cloud processor and a plurality of storage components are disclosed.

Abstract: A process for the production of a fluorinated quartz glass including the steps of generating SiO2 particles in a synthesis burner; depositing the resulting SiO2 particles into a body; and vitrifying the resulting body, wherein a fluorinating agent having a boiling point greater than or equal to ?10° C. is supplied to the synthesis burner.

Abstract: A process for producing a fluorinated quartz glass is described, including providing an SiO2 soot body; reacting the SiO2 soot body with a fluorinating agent having a boiling point of greater than or equal to ?10° C. to obtain a fluorinated SiO2 soot body; and vitrifying the fluorinated SiO2 soot body.

Abstract: Embodiments of systems and methods for storing documents in a cloud storage system comprising a cloud processor and a plurality of storage components are disclosed.

Abstract: Embodiments of systems and methods for storing documents in a cloud storage system comprising a cloud processor and a plurality of storage components are disclosed.

Abstract: Embodiments of systems and methods for storing documents in a cloud storage system comprising a cloud processor and a plurality of storage components are disclosed.

Abstract: Embodiments of systems and methods for storing documents in a cloud storage system comprising a cloud processor and a plurality of storage components are disclosed.

Abstract: One aspect relates to a method for producing an optical blank from synthetic quartz glass by vitrifying and shaping a porous, cylindrical SiO2 soot body having a longitudinal axis, in a heating zone including a melt mold with bottom plate. The SiO2 soot body vitrified in the heating zone at a vitrification temperature so as to form a full cylindrical, completely vitrified, transparent quartz glass body. Subsequently, the vitrified quartz glass body is shaped by softening in the melt mold at a softening temperature so as to form a viscous quartz glass mass which partly fills the volume of the melt mold, and cooling the quartz glass mass and removal from the melt mold so as to form the optical blank. During shaping in the melt mold, the full cylindrical quartz glass body is brought into contact by way of controlled supply with a centering means of the bottom plate.

Abstract: A method operates a production plant, the method having process modules, wherein, for each process module, the amount of material that is respectively present in this process module and is to be processed by this process module is continuously or discretely detected and compared with a prescribed limit value for the amount, wherein a mass inflow into the respective process module is increased or decreased if the amount of material that is respectively present in this process module and is to be processed by this process module is less than or greater than the limit value for the amount, or a mass outflow from the respective process module is increased or decreased if the amount of material that is respectively present in this process module and is to be processed by this process module is greater than or less than the limit value for the amount.

Abstract: A production installation having at least two process modules (P1, . . . , Pn) that can be connected to one another for production engineering purposes and a communication network (2), wherein each process module (P1, . . . , Pn) has an electronic device by means of which the respective process module (P1, . . . , Pn) can be connected to the communication network (2) for communications engineering purposes and is set up to control and/or regulate the respective process module (P1, . . . , Pn) to independently carry out a particular process section of the production.

Abstract: One aspect relates to a method for producing an optical blank from synthetic quartz glass by vitrifying and shaping a porous, cylindrical SiO2 soot body having a longitudinal axis, in a heating zone including a melt mold with bottom plate. The SiO2 soot body vitrified in the heating zone at a vitrification temperature so as to form a fully cylindrical, completely vitrified, transparent quartz glass body. Subsequently, the vitrified quartz glass body is shaped by softening in the melt mold at a softening temperature so as to form a viscous quartz glass mass which partly fills the volume of the melt mold, and cooling the quartz glass mass and removal from the melt mold so as to form the optical blank. During shaping in the melt mold, the fully cylindrical quartz glass body is brought into contact by way of controlled supply with a centering means of the bottom plate.

Abstract: A method for producing a blank of iron-doped silica glass with high silicic acid content for use as heat protection glass is provided. The method involves: (a) producing an iron-doped SiO2 soot body which contains iron in a first oxidation state Fe3+ by flame hydrolysis of a silicon-containing and an iron-containing starting substance, (b) drying the soot body to obtain a mean hydroxyl group content of less than 10 ppm by weight, and (c) vitrifying the soot body under a reducing atmosphere that is suitable for at least partially reducing the iron from the first oxidation state Fe3+ to a second, lower oxidation state Fe2+. A blank is obtained having an iron content between 0.1 and 1% by weight which exhibits an internal transmission of at most 40% in the infrared wavelength range and an internal transmission of at least 85% in the visible spectral range.

Abstract: The Ti3+ ions present in Ti-doped silica glass cause a brown staining of the glass, causing inspection of the lens to become more difficult. Known methods for reducing Ti3+ ions in favor of Ti4+ ions in Ti-doped silica glass include a sufficiently high proportion of OH-groups and carrying out an oxygen treatment prior to vitrification, which both have disadvantages. In order to provide a cost-efficient production method for Ti-doped silica glass, which at a hydroxyl group content of less than 120 ppm shows an internal transmittance (sample thickness 10 mm) of at least 70% in the wavelength range of 400 nm to 1000 nm, the TiO2—SiO2 soot body is subjected to a conditioning treatment with a nitrogen oxide prior to vitrification. The blank produced in this way from Ti-doped silica glass has the ratio Ti3+/Ti4+?5×10?4.

Abstract: A method for producing a silica glass blank co-doped with titanium and fluorine for use in EUV lithography includes (a) producing a TiO2—SiO2 soot body by flame hydrolysis of silicon- and titanium-containing precursor substances, (b) fluorinating the TiO2—SiO2 soot body to form a fluorine-doped TiO2—SiO2 soot body, (c) treating the fluorine-doped TiO2—SiO2 soot body in a water vapor-containing atmosphere to form a conditioned soot body, and (d) vitrifying the conditioned soot body to form the blank. The blank has an internal transmission of at least 60% in the wavelength range of 400 to 700 nm at a sample thickness of 10 mm, a mean OH content in the range of 10 to 100 wt. ppm and a mean fluorine content in the range of 2,500 to 10,000 wt. ppm. Titanium is present in the blank in the oxidation forms Ti3+ and Ti4+.

Abstract: A blank made of titanium-doped silica glass for a mirror substrate for use in EUV lithography is provided. The blank includes a surface portion to be provided with a reflective film and having an optically used area (CA) over which a coefficient of thermal expansion (CTE) has a two-dimensional inhomogeneity (dCTE) distribution profile averaged over a thickness of the blank. A maximum inhomogeneity (dCTEmax) of less than 5 ppb/K is defined as a difference between a CTE maximum value and a CTE minimum value. The dCTEmax is at least 0.5 ppb/K. The CA forms a non-circular area having a centroid. The dCTE distribution profile is not rotation-symmetrical and is defined over the CA, such that straight profile sections normalized to a unit length and extending through the centroid of the area yield a dCTE family of curves forming a curve band with a bandwidth of less than 0.5×dCTEmax.

Abstract: A blank of TiO2—SiO2 glass for a mirror substrate for use in EUV lithography has a low need for adaptation to optimize the progression of the coefficient of thermal expansion, and consequently also the progression of the zero crossing temperature Tzc. The TiO2—SiO2 glass has at a mean value of the fictive temperature Tf in the range between 920° C. and 970° C. a dependence expressed as the differential quotient dTzc/dTf of its zero crossing temperature Tzc on the fictive temperature Tf of less than 0.3.

Abstract: A production installation having at least two process modules (P1, . . . , Pn) that can be connected to one another for production engineering purposes and a communication network (2), wherein each process module (P1, . . . , Pn) has an electronic device by means of which the respective process module (P1, . . . , Pn) can be connected to the communication network (2) for communications engineering purposes and is set up to control and/or regulate the respective process module (P1, . . . , Pn) to independently carry out a particular process section of the production.

Abstract: Embodiments of systems and methods for storing documents in a cloud storage system comprising a cloud processor and a plurality of storage components are disclosed.

Abstract: A known method for producing synthetic quartz glass comprises the method steps: (a) forming a cylindrical SiO2 soot body having an inner portion and at least one free cylinder jacket surface surrounding the inner portion; (b) thermally drying the porous soot body; and (c) vitrifying the dried soot body with formation of the cylinder from synthetic quartz glass.

Abstract: In a known method for producing quartz glass that is doped with nitrogen, an SiO2 base product is prepared in the form of SiO2 grains or in the form of a porous semi-finished product produced from the SiO2 grains and the SiO2 base product is processed into the quartz glass with the nitrogen chemically bound therein in a hot process in an atmosphere containing a reaction gas containing nitrogen. From this starting point, a method is provided for achieving nitrogen doping in quartz glass with as high a fraction of chemically bound nitrogen as possible. This object is achieved according to the invention in that a nitrogen oxide is used as the nitrogen-containing reaction gas, and that a SiO2 base product is used that in the hot process has a concentration of oxygen deficient defects of at least 2×1015 cm?3, wherein the SiO2 base product comprises SiO2 particles having an average particle size in the range of 200 nm to 300 ?m (D50 value).