Patents by Inventor Stefan Rehders

Stefan Rehders has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7718349
    Abstract: The invention relates to a method for producing submicron structures using a shadow mask, whereby a material charge and/or energy charge occurs through the openings of the shadow mask. The method comprises the following steps: a film which is used as a shadow mask and which is made of a masking material is applied to the substrate, tears are produced in the film, the tears extending until the substrate, edge areas of the film arranged on the tears are detached thereby exposing the substrate and the material or the energy is applied to the substrate by the tears, also above the exposed edge area of the shadow mask film.
    Type: Grant
    Filed: October 17, 2005
    Date of Patent: May 18, 2010
    Assignee: Christian-Albrechts-Universitaet Zu Kiel
    Inventors: Rainer Adelung, Stefan Rehders
  • Publication number: 20100112493
    Abstract: A method for producing a plurality of regularly arranged nanoconnections on a substrate using an elastic masking layer forming cracks. Said method comprises the following steps: the masking layer is microstructured in order to produce at least one defined region provided with a masking over which the nanoconnections are to extend; cracks are produced in the masking layer; the material forming the nanoconnections is applied at least to the structures of the masking layer in the cracks and to the non-masked regions of the substrate; the masking layer with the is removed, and the defined region is covered with an essentially rectangular masking strip, over the width of which the nanoconnections are to extend the length of the strip being longer than the width; and a self-organized regular crack pattern comprising a plurality of crack lines is produced by inducing stress in the masking strip, such that a plurality of regularly arranged nanoconnections is formed over the at least one defined region.
    Type: Application
    Filed: November 24, 2006
    Publication date: May 6, 2010
    Inventors: Rainer Adelung, Seid Jebril, Mady Elbahri, Stefan Rehders
  • Publication number: 20080090181
    Abstract: The invention relates to a method for producing submicron structures using a shadow mask, whereby a material charge and/or energy charge occurs through the openings of the shadow mask. The method comprises the following steps: a film which is used as a shadow mask and which is made of a masking material is applied to the substrate, tears are produced in the film, the tears extending until the substrate, edge areas of the film arranged on the tears are detached thereby exposing the substrate and the material or the energy is applied to the substrate by the tears, also above the exposed edge area of the shadow mask film.
    Type: Application
    Filed: October 17, 2005
    Publication date: April 17, 2008
    Inventors: Rainer Adelung, Stefan Rehders