Patents by Inventor Stefan Roling

Stefan Roling has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Control of critical dimensions in optical imaging processes for semiconductor production by extracting imaging imperfections on the basis of imaging tool specific intensity measurements and simulations
    Patent number: 8332783
    Abstract: Variations in critical dimensions of circuit features of sophisticated semiconductor devices may be reduced by efficiently extracting mask and/or imaging tool specific non-uniformities with high spatial resolution by using measured intensity values and simulated intensity values. For example, a tool internal radiation sensor may be used for measuring the intensity of an image of a lithography mask, while a simulated intensity enables eliminating the mask pattern specific intensity contributions. In this manner, high spatial resolution of the corresponding correction map may be obtained without undue effort in terms of man power and measurement tool resources.
    Type: Grant
    Filed: December 10, 2010
    Date of Patent: December 11, 2012
    Assignee: GLOBALFOUNDRIES Inc.
    Inventors: Rolf Seltmann, Stefan Roling, Francois Weisbuch
  • Control of Critical Dimensions in Optical Imaging Processes for Semiconductor Production by Extracting Imaging Imperfections on the Basis of Imaging Tool Specific Intensity Measurements and Simulations
    Publication number: 20120005634
    Abstract: Variations in critical dimensions of circuit features of sophisticated semiconductor devices may be reduced by efficiently extracting mask and/or imaging tool specific non-uniformities with high spatial resolution by using measured intensity values and simulated intensity values. For example, a tool internal radiation sensor may be used for measuring the intensity of an image of a lithography mask, while a simulated intensity enables eliminating the mask pattern specific intensity contributions. In this manner, high spatial resolution of the corresponding correction map may be obtained without undue effort in terms of man power and measurement tool resources.
    Type: Application
    Filed: December 10, 2010
    Publication date: January 5, 2012
    Applicant: GLOBALFOUNDRIES INC.
    Inventors: Rolf Seltmann, Stefan Roling, Francois Weisbuch