Abstract: A method for examining at least one wafer (13) with regard to a contamination limit, in which the contamination potential of the resist (13a) of the wafer (13), which resist (13a) outgasses contaminating substances, is examined with regard to a contamination limit before the wafer (13) is exposed in an EUV projection exposure system (1). The method preferably includes: arranging the wafer (13) and/or a test disc coated with the same resist (13a) as the resist (13a) of the wafer (13) in a vacuum chamber (19), evacuating the vacuum chamber (19), and measuring the contamination potential of the contaminating substances outgassed from the wafer (13) in the evacuated vacuum chamber (19), and also comparing the contamination potential of the wafer (13) with a contamination limit. An EUV projection exposure system (1) for carrying out the method is also disclosed.

Abstract: A household appliance includes a cabinet-shaped housing comprised of a plurality of walls. At least one of the walls has an arrangement of embossings. The arrangement of embossings includes a first embossing arranged centered in relation to a center of the at least one wall and configured in the shape of a ring when viewed from above. A second embossing is arranged outside the first embossing in substantial concentric relationship to the first embossing and configured in the shape of a ring when viewed from above. At least one third embossing is arranged outside the second embossing and has a strip-shaped configuration. The presence of embossings in the at least one wall is able to reduce vibrations and thereby significantly reduce the amount of unwanted noise.

Abstract: A method for examining at least one wafer (13) with regard to a contamination limit, in which the contamination potential of the resist (13a) of the wafer (13), which resist (13a) outgasses contaminating substances, is examined with regard to a contamination limit before the wafer (13) is exposed in an EUV projection exposure system (1). The method preferably includes: arranging the wafer (13) and/or a test disc coated with the same resist (13a) as the resist (13a) of the wafer (13) in a vacuum chamber (19), evacuating the vacuum chamber (19), and measuring the contamination potential of the contaminating substances outgassed from the wafer (13) in the evacuated vacuum chamber (19), and also comparing the contamination potential of the wafer (13) with a contamination limit. An EUV projection exposure system (1) for carrying out the method is also disclosed.

Abstract: A cleaning module for an EUV lithography device with a supply (206) for molecular hydrogen, a heating filament (210) and a line (212) for atomic and/or molecular hydrogen. The line (212) has at least one bend with a bending angle of less than 120 degrees, and has a material on its inner surface which has a low recombination rate for atomic hydrogen. The supply (206) is of flared shape at its end, which faces the heating filament (210). A gentler cleaning of optical elements is achieved with such a cleaning module, or also by exciting a cleaning gas with a cold cathode or a plasma, or by filtering out charged particles via of electrical and/or magnetic fields.

Abstract: A bus module for connecting electrically triggerable fluidic valves to a data bus. The bus module has an electrical circuit configuration, which evaluates address data and user data from data telegrams transmitted on the data bus and which triggers a fluidic valve determined by the address data in accordance with the user data of the data telegram. In order to keep the current load on the bus module low particularly when triggering hydraulic valves, the electronic circuit configuration, following the reception of user data in the form of a switch-on command for one of the fluidic valves connected to the bus module, first constantly supplies a supply voltage to the fluidic valve determined by the address data during a gate-controlled rise time of specifiable duration. Following the expiration of the gate-controlled rise time, the electronic circuit configuration supplies the fluidic valve with the supply voltage in a pulse width modulated form having a specifiable pulse control factor.

Abstract: A method of producing exhaust-gas carrying devices, in particular exhaust-gas cleaning devices, makes provision that the outer geometry of each substrate is ascertained. An outer housing with an adapted geometry is manufactured dependent on this outer geometry. The substrate, together with a compensation element, are accommodated and clamped in this outer housing.

Abstract: A spotlight for illumination in film, studio, event or theatre environments, with an electrical terminal for connecting the spotlight to a supply line for supplying electricity to the spotlight, is provided. The electrical terminal is rotatably mounted on the spotlight and can be matched in terms of its alignment, so as to connect the spotlight to the supply line. The position of the electrical terminal can be matched in dependence on the arrangement of the spotlight, in order to supply the electric supply line to the spotlight from different directions.

Abstract: The invention relates to an array for optical evaluation of an object array, to which a microlens array (MLA), preferably an exchangeable and/or rotational microlens array, and a field lens with an illuminating device coupled by means of a beam splitter, preferably a rotational beam splitter, are pre-assigned in the direction of a detector array, wherein said illuminating device is coupled between the field lens and an objective.

Abstract: An exhaust gas cleaning device includes an outer housing, an insert disposed therein, and an elastic compensating element which surrounds the insert. At least before a first operation, an adhesive layer is provided between the insert and the compensating element and/or between the compensating element and the outer housing. Furthermore, there is described a method for manufacturing an exhaust gas cleaning device.

Abstract: A method for examining at least one wafer (13) with regard to a contamination limit, in which the contamination potential of the resist (13a) of the wafer (13), which resist (13a) outgasses contaminating substances, is examined with regard to a contamination limit before the wafer (13) is exposed in an EUV projection exposure system (1). The method preferably includes: arranging the wafer (13) and/or a test disc coated with the same resist (13a) as the resist (13a) of the wafer (13) in a vacuum chamber (19), evacuating the vacuum chamber (19), and measuring the contamination potential of the contaminating substances outgassed from the wafer (13) in the evacuated vacuum chamber (19), and also comparing the contamination potential of the wafer (13) with a contamination limit. An EUV projection exposure system (1) for carrying out the method is also disclosed.

Abstract: An exhaust-gas system for a motor vehicle includes at least one exhaust-gas cleaning system and at least one regeneration device for the exhaust-gas cleaning system, by means of which regeneration device an oxidizable fluid in vapor form can be introduced into the exhaust-gas stream ahead of the exhaust-gas cleaning system. The regeneration device includes a housing with a chamber formed in it as well as a heating element positioned in the chamber, the housing having on its upstream side an inflow opening for exhaust gases and on its downstream side an outlet opening and being arranged in the interior of the exhaust-gas stream.

Abstract: An apparatus comprises an emissions trap and a loading determination device. The emissions trap is configured to trap emissions present in exhaust gas and comprises a first local region and a second local region. The loading determination device is configured to determine emissions loading of the first local region and emissions loading of the second local region. An associated method is disclosed.

Abstract: Inside a vacuum chamber 200 a cleaning unit 204 provides atomic hydrogen or atomic deuterium for cleaning a surface 202 at a pressure of less than 10?4 Torr or of more than 10?3 Torr. The surface 202 is heated by the heating unit 203 to a temperature of at least 50° C. This allows achieving cleaning rates of more than 60 ?/h. Preferably, the surface 202 is the surface of a multilayer mirror 201 as used in an EUV lithography apparatus.

Abstract: A method and device for fracture separation of a workpiece into components of the workpiece, wherein a recess is produced by a material processing device in a predetermined area of the components by removal of material from the components. The recess serves as a crack initiation site for the separation of the components. The component is heated in an area of the recess by the material processing device, and the heating takes place with a predetermined heat input in such a way that a temperature of the components does not exceed a predetermined temperature.

Abstract: In an electrohydraulic control unit for rotor blade adjustment of a wind farm via a hydraulic cylinder, the hydraulic cylinder has one piston chamber and one piston rod chamber. Via an inflow valve assembly, a pressure fluid connection can be established between the pump and the piston chamber, while via an outflow valve assembly, a pressure fluid connection can be established between the piston rod chamber and the tank. Each valve assembly has at least two parallel-connected switch valves, which open and can be closed in various combinations in order to establish a desired position of the hydraulic cylinder. This control unit makes precise regulation of the rotor blade possible.

Abstract: A spotlight for illumination in film, studio, event or theatre environments, with an electrical terminal for connecting the spotlight to a supply line for supplying electricity to the spotlight, is provided. The electrical terminal is rotatably mounted on the spotlight and can be matched in terms of its alignment, so as to connect the spotlight to the supply line. The position of the electrical terminal can be matched in dependence on the arrangement of the spotlight, in order to supply the electric supply line to the spotlight from different directions.

Abstract: The present invention relates to an irradiation device for irradiating an irradiation object with heavy charged particles at an irradiation station, comprising a particle accelerator for providing a particle beam and a swivelling device for swivelling the particle beam impinging on the irradiation object, wherein the swivelling device comprises a carrier pivotable about an axis. In accordance with the invention, the irradiation device is characterized in that the particle accelerator is mounted on the pivotable carrier.

Abstract: A motor vehicle includes a diesel propulsion engine and an exhaust system that comprises a discontinuously regenerating exhaust gas purification system. A fuel evaporator unit serves to enrich engine exhaust gases with fuel vapors. The fuel evaporator unit is connected to a vehicle fuel tank, and is provided upstream of the exhaust gas purification system. The fuel evaporator unit includes a fuel evaporator in the form of a heat exchanger that is exposed to the exhaust gas stream. The heat exchanger has a fuel feed line and a fuel vapor discharge. The fuel evaporator unit also includes an auxiliary oxidizing converter connected upstream of the heat exchanger. A percentage of nonburned diesel fuel in the exhaust gases fed into the auxiliary oxidizing converter is adjustable using an enrichment device.

Abstract: A bus module for connecting electrically triggerable fluidic valves to a data bus. The bus module has an electrical circuit configuration, which evaluates address data and user data from data telegrams transmitted on the data bus and which triggers a fluidic valve determined by the address data in accordance with the user data of the data telegram. In order to keep the current load on the bus module low particularly when triggering hydraulic valves, the electronic circuit configuration, following the reception of user data in the form of a switch-on command for one of the fluidic valves connected to the bus module, first constantly supplies a supply voltage to the fluidic valve determined by the address data during a gate-controlled rise time of specifiable duration. Following the expiration of the gate-controlled rise time, the electronic circuit configuration supplies the fluidic valve with the supply voltage in a pulse width modulated form having a specifiable pulse control factor.