Abstract: An optical apparatus for a lithography system comprises at least one optical element comprising an optical surface. The optical apparatus also comprises one or more actuators for deforming the optical surface. A strain gauge device is provided for determining the deformation of the optical surface. The strain gauge device comprises at least one optical fiber that maintains polarization.

Abstract: Provided is an eye implant having a lens sheath which is embodied for insertion in a capsular bag of an eye, is elastic, delimits a cavity in its interior and has a through hole via which the cavity is accessible from outside of the lens sheath, a plurality of reservoirs which are fastened to the lens sheath, project from the lens sheath to the outside, have an adhesive in their interior and are embodied to dispense the adhesive when pressed against the capsular bag, and at least two adapters which are fastened to the lens sheath, project from the lens sheath into the interior, and are embodied to engage with a respective haptic of an accommodative intraocular lens.

Abstract: An assembly, for example in a microlithographic projection exposure apparatus, comprises an optical element and a joint arrangement for mechanically bearing the optical element. The joint arrangement comprises at least one connecting element secured on the optical element. The mass of the connecting element is distributed over its length so that the moment of inertia of the connecting element is increased in comparison with a connecting element of identical mass and length in which the mass is distributed uniformly over the length.

Abstract: Provided is an eye implant having a lens sheath which is embodied for insertion in a capsular bag of an eye, is elastic, delimits a cavity in its interior and has a through hole via which the cavity is accessible from outside of the lens sheath, a plurality of reservoirs which are fastened to the lens sheath, project from the lens sheath to the outside, have an adhesive in their interior and are embodied to dispense the adhesive when pressed against the capsular bag, and at least two adapters which are fastened to the lens sheath, project from the lens sheath into the interior, and are embodied to engage with a respective haptic of an accommodative intraocular lens.

Abstract: An arrangement of a microlithographic optical imaging device includes first and second supporting structures. The first supporting structure supports an optical element of the imaging device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another between the first and second supporting structures. Each of the supporting spring devices defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device which measures the position and/or orientation of the at least one optical element in relation to a reference in at least one degree of freedom up to all six degrees of freedom in space. A reduction device reduces a change in a static relative situation between the first and second supporting structures in at least one correction degree of freedom.

Abstract: An arrangement of a microlithographic optical imaging device includes first and second supporting structures. The first supporting structure supports an optical element of the imaging device. The first supporting structure supports the second supporting structure via supporting spring devices of a vibration decoupling device. The supporting spring devices act kinematically parallel to one another between the first and second supporting structures. Each of the supporting spring devices defines a supporting force direction and a supporting length along the supporting force direction. The second supporting structure supports a measuring device which measures the position and/or orientation of the at least one optical element in relation to a reference in at least one degree of freedom up to all six degrees of freedom in space. A reduction device reduces a change in a static relative situation between the first and second supporting structures in at least one correction degree of freedom.

Abstract: The disclosure relates to an assembly in a microlithographic projection exposure apparatus, with an optical element and at least one weight compensating device, which includes at least one magnetic circuit. A magnetic field generated by this magnetic circuit brings about a force for compensating at least partially for the force of the weight acting on the optical element. The apparatus also includes a coil arrangement with a plurality of coils. The arrangement is energizable with electrical current to generate a compensating force acting on the optical element. This compensating force compensates at least partially for a parasitic force that is exerted by the magnetic circuit when there is movement of the optical element and does not contribute to the compensation for the force of the weight acting on the optical element.

Abstract: The disclosure relates to an assembly in a microlithographic projection exposure apparatus, with an optical element and at least one weight compensating device, which includes at least one magnetic circuit. A magnetic field generated by this magnetic circuit brings about a force for compensating at least partially for the force of the weight acting on the optical element. The apparatus also includes a coil arrangement with a plurality of coils. The arrangement is energizable with electrical current to generate a compensating force acting on the optical element. This compensating force compensates at least partially for a parasitic force that is exerted by the magnetic circuit when there is movement of the optical element and does not contribute to the compensation for the force of the weight acting on the optical element.

Abstract: A computer-implemented method for processing an online transaction involving a payment service provider includes receiving, in a backend system and from a frontend system, an initiate payment message generated by a user application for a transaction involving a payment service provider external to the frontend and backend systems. The method includes forwarding a set checkout instruction from the backend system to the payment service provider with first information about the transaction. The method includes redirecting the user application from the frontend system to the payment service provider. The method includes receiving a finalize payment instruction in the backend system from the frontend system after redirecting the user application from the frontend system. The method includes forwarding, in response to the finalize payment instruction, a perform checkout instruction from the backend system to the payment service provider with second information about the transaction.