Abstract: This disclosure provides methods and apparatus related to thin films. In one aspect, a silicon wafer with a first silicon nitride layer disposed on a first side of the silicon wafer and a second silicon nitride layer disposed on a second side of the silicon wafer is provided. A first side of the first silicon nitride layer is disposed on the first side of the silicon wafer. The second silicon nitride layer is patterned. The silicon wafer is etched to expose the first side of the first silicon nitride layer. A polymer is deposited on a second side of the first silicon nitride layer. A first ceramic layer is deposited on the polymer disposed on the second side of the first silicon nitride layer using an atomic layer deposition process. The first silicon nitride layer and the polymer are etched to expose a first side of the first ceramic layer.

Abstract: Plasmonic gratings, along with methods of creating devices using width-graded plasmonic gratings are described. Plasmonic gratings may be transmission-type or closed-ended plasmonic gratings, and may be disposed on detectors to enhance the spectral range detection of the detectors or in further device architectures.

Abstract: Plasmonic gratings, along with methods of creating devices using width-graded plasmonic gratings are described. Plasmonic gratings may be transmission-type or closed-ended plasmonic gratings, and may be disposed on detectors to enhance the spectral range detection of the detectors or in further device architectures.

Abstract: This disclosure provides systems, methods, and apparatus related to optofluidic devices. In one aspect, an optofluidic device includes a substrate, a first nanostructure, a second nanostructure, and a cover. A channel having cross-sectional dimensions of less than about 100 nanometers is defined in a surface of the substrate. The first nanostructure is disposed on the substrate on a first side of the channel and proximate the channel. The second nanostructure is disposed on the substrate on a second side of the channel and proximate the channel. The first and the second nanostructures are disposed on a line that passes across the channel. The cover is disposed on the surface of the substrate.

Abstract: Provided is a composition for resist patterning comprising a thiol; at least one -ene monomer; at least one polymerization initiator; and, optionally, a metal oxide used in an amount of 0.1 to 50 wt. % per weight of the composition; the thiol and -ene monomer are used in a stoichiometric ratio with a refractive index between 1.6 and 1.8. The composition is used in a patterning process wherein the composition is dispensed to the substrate, is covered with a mask, and is cured, e.g., by UV radiation, at room temperature with light having a wavelength in the range of 200 nm to 450 nm. The process may be carried out with thermal annealing.

Abstract: Provided is a composition for resist patterning comprising a thiol; at least one -ene monomer; at least one polymerization initiator; and, optionally, a metal oxide used in an amount of 0.1 to 50 wt. % per weight of the composition; the thiol and -ene monomer are used in a stoichiometric ratio with a refractive index between 1.6 and 1.8. The composition is used in a patterning process wherein the composition is dispensed to the substrate, is covered with a mask, and is cured, e.g., by UV radiation, at room temperature with light having a wavelength in the range of 200 nm to 450 nm. The process may be carried out with thermal annealing.

Abstract: To manufacture a nanophotonic device, a metal oxide precursor is mixed with an organic acid, an organic polymer and a photoinitiator in a solvent to form a dispersion comprising a hybrid organic-inorganic phase. A film is formed on a substrate form the dispersion, the film including the hybrid organic-inorganic phase. The film is annealed to transform the hybrid organic-inorganic phase into an inorganic phase.

Abstract: The present invention provides a plasmonic optical transformer to produce a highly focuses optical beam spot, where the transformer includes a first metal layer, a dielectric layer formed on the first metal layer, and a second metal layer formed on the dielectric layer, where the first metal layer, the dielectric layer, and the second layer are patterned to a shape including a first section having a first cross section, a second section following the first section having a cross-section tapering from the first section to a smaller cross-section, and a third section following the second section having a cross-section matching the tapered smaller cross-section of the second section.

Abstract: This disclosure provides systems, methods, and apparatus related to probes for multidimensional nanospectroscopic imaging. In one aspect, a method includes providing a transparent tip comprising a dielectric material. A four-sided pyramidal-shaped structure is formed at an apex of the transparent tip using a focused ion beam. Metal layers are deposited over two opposing sides of the four-sided pyramidal-shaped structure.

Abstract: This disclosure provides systems, methods, and apparatus related to optofluidic devices. In one aspect, an optofluidic device includes a substrate, a first nanostructure, a second nanostructure, and a cover. A channel having cross-sectional dimensions of less than about 100 nanometers is defined in a surface of the substrate. The first nanostructure is disposed on the substrate on a first side of the channel and proximate the channel. The second nanostructure is disposed on the substrate on a second side of the channel and proximate the channel. The first and the second nanostructures are disposed on a line that passes across the channel. The cover is disposed on the surface of the substrate.

Abstract: This disclosure provides systems, methods, and apparatus related to probes for multidimensional nanospectroscopic imaging. In one aspect, a method includes providing a transparent tip comprising a dielectric material. A four-sided pyramidal-shaped structure is formed at an apex of the transparent tip using a focused ion beam. Metal layers are deposited over two opposing sides of the four-sided pyramidal-shaped structure.

Abstract: The present invention provides a plasmonic optical transformer to produce a highly focuses optical beam spot, where the transformer includes a first metal layer, a dielectric layer formed on the first metal layer, and a second metal layer formed on the dielectric layer, where the first metal layer, the dielectric layer, and the second layer are patterned to a shape including a first section having a first cross section, a second section following the first section having a cross-section tapering from the first section to a smaller cross-section, and a third section following the second section having a cross-section matching the tapered smaller cross-section of the second section,

Abstract: An apparatus for determining the internal outline of a duct or cavity, comprises light-emitting means (71) suitable for generating a collimated light beam, an elongate probe element (51; 51?; 51?) suitable for being introduced into the duct and for guiding the collimated beam along a predetermined propagation direction, reflector means (52) supported by the probe element (51; 51?; 51?) and suitable for deflecting the collimated beam so as to illuminate the internal wall of the duct, and for deflecting the reflected or diffused light coming from an illuminated point (P) of the internal wall so as to guide it along the probe element (51; 51?; 51?), and detection means (76) suitable for receiving an image of the illuminated point (P), which image is correlated with the optical distance of the point from the detection means (76), and for providing a corresponding electrical signal. The image is formed by the light guided by the receiving reflector means (52).

Abstract: An apparatus for determining the internal outline of a duct or cavity, comprises light-emitting means (71) suitable for generating a collimated light beam, an elongate probe element (51; 51?; 51?) suitable for being introduced into the duct and for guiding the collimated beam along a predetermined propagation direction, reflector means (52) supported by the probe element (51; 51?; 51?) and suitable for deflecting the collimated beam so as to illuminate the internal wall of the duct, and for deflecting the reflected or diffused light coming from an illuminated point (P) of the internal wall so as to guide it along the probe element (51; 51?; 51?), and detection means (76) suitable for receiving an image of the illuminated point (P), which image is correlated with the optical distance of the point from the detection means (76), and for providing a corresponding electrical signal. The image is formed by the light guided by the receiving reflector means (52).