Abstract: An approach includes a new power and ground structure description language (PSDL) will allow the user to describe the desired routing pattern for each layer and on a user defined region by region basis, including how the pattern will be laid out in the design with respect to other patterns from a different layer. The new PSDL also gives the complete picture of the entire power and ground structure, instead of just a layer-by-layer view from a single command. It also allowed flexibility in alignment especially when dealing with track misalignments, thus avoiding the extensive trial-and-error steps needed to calculate offsets and distances to maintain pattern alignment using previous approaches. Additionally, because PSDL is not tightly dependent on the design size and/or floorplan, transferring the desired power and ground structure from one design to another will be very easy with only few adjustments.

Abstract: An improved approach is described to implement trim data representation for an electronic design. Instead of maintaining a gap shape object for every gap in the layout, existing objects adjacent to the gap location are configured to include attributes of the gap shape. The properties of the gap shape can then be derived from the adjacent objects.

Abstract: Methods and systems for enhancing electronic designs for improving mask designs and manufacturability of electronic circuit designs for multi-exposure lithography are disclosed. The methods identify gap rectangles in a design and create gap blocks with the some of the identified gap rectangles according to at least their positions in a design and design rules. A relation graph is determined among the gap blocks or gap rectangles. The methods adjust some gap blocks by altering their sizes or dimensions. Some gap blocks may be split into multiple smaller gap blocks. The methods convert some gap rectangles into metal fill(s) and/or metal extensions to generate a structured physical design based at least in part upon the gap blocks and/or the multiple smaller gap blocks.

Abstract: Disclosed are methods, systems, and articles of manufactures for implementing correct-by-construction physical designs with multiple-patterning-awareness by identifying a first set of grids for a layer based at least in part upon characteristics of other layer(s), identifying a set of tracks for the layer to implement the physical design for the layer, and implementing a shape in the physical design by at least terminating an end of the shape at a grid of the identified first set of grids. The end of the shape may be extended or contracted from its as-design location to the grid. The physical design thus implemented is correct-by-construction and is free of violations of one or more directional design rules.

Abstract: Various embodiments include computer-implemented methods, computer program products and systems for aligning a set of orthogonal circuit elements in an integrated circuit (IC) layout. In some embodiments, a computer-implemented method for aligning a set of orthogonal circuit elements in an IC layout includes: classifying each orthogonal circuit element in the set of orthogonal circuit elements as including a first space-designated edge and a second space-designated edge; and aligning each orthogonal circuit element on an edge placement grid according to the first space-designated edge and the second space-designated edge, the edge placement grid having a first set of space-designated grid lines separated by a first distance, and a second set of space-designated grid lines separated by a second distance, wherein the first set of space-designated grid lines is separated from the second set of space-designated grid lines by an offset distance.

Abstract: Various embodiments include computer-implemented methods, computer program products and systems for aligning a set of orthogonal circuit elements in an integrated circuit (IC) layout. In some embodiments, a computer-implemented method for aligning a set of orthogonal circuit elements in an IC layout includes: classifying each orthogonal circuit element in the set of orthogonal circuit elements as including a first space-designated edge and a second space-designated edge; and aligning each orthogonal circuit element on an edge placement grid according to the first space-designated edge and the second space-designated edge, the edge placement grid having a first set of space-designated grid lines separated by a first distance, and a second set of space-designated grid lines separated by a second distance, wherein the first set of space-designated grid lines is separated from the second set of space-designated grid lines by an offset distance.

Abstract: Disclosed are methods, systems, and articles of manufactures for implementing multiple-patterning-aware correct-by-construction layout processing for an electronic design by identifying rules for a first layer and for second layer(s) adjacent to the first layer, determining one or more sets of grids based on the rules, extending or implementing shapes to terminate at some grids of the one or more sets of grids, and populating the data of the ends of the shapes in the first layer in a data structure. The one or more sets of grids are in direction(s) perpendicular to the routing direction(s) of the first layer and have one or more grid pitches determined based at least in part upon routing pitch(es) of the second layer(s) and rule(s) for vias.

Abstract: Techniques are described which decrease DRC (design rule check) marking time, e.g., in a circuit interconnect router, by capitalizing on repetitious relationships between interconnect elements (and/or circuit components) in a circuit design, by recording previously calculated markings and reusing the markings on subsequent marking iterations or processes. Marking information corresponding to each marking point includes indications of what types of interconnect elements or circuit components can be positioned at the marking point location without violating a design rule. With a dynamic caching process, once the marking computations have been completed for an element and the corresponding points in the vicinity, those values are stored in a cache. The next time the router encounters another instance of a known element-to-point relationship, the stored values are reloaded and applied to the current point.

Abstract: Techniques are described which decrease DRC (design rule check) marking time, e.g., in a circuit interconnect router, by capitalizing on repetitious relationships between interconnect elements (and/or circuit components) in a circuit design, by recording previously calculated markings and reusing the markings on subsequent marking iterations or processes. Marking information corresponding to each marking point includes indications of what types of interconnect elements or circuit components can be positioned at the marking point location without violating a design rule. With a dynamic caching process, once the marking computations have been completed for an element and the corresponding points in the vicinity, those values are stored in a cache. The next time the router encounters another instance of a known element-to-point relationship, the stored values are reloaded and applied to the current point.