Abstract: The invention relates to a device (1) for coating an object (2) with a silicone coating (3), the device comprising: at least one processing station (4) having a processing region (5) for receiving the object (2); at least one silicone spray nozzle (6) for applying the silicone (9) to at least one surface region (7) of the object (2) in order to result in a silicone coating (3); at least one optical sensor (8) for monitoring the quality of the silicone coating (3) by identifying silicone (9), wherein the optical sensor (8) has an identification region (10) aligned with the processing region (5), in which identification region the sensor (8) can identify silicone (9); and at least one compressed air nozzle (11), which is aligned with the identification region (10) of the at least one optical sensor (8), for flushing the identification region (10) with compressed air.

Abstract: The invention relates to a device (1) for coating an object (2) with a silicone coating (3), the device comprising: at least one processing station (4) having a processing region (5) for receiving the object (2); at least one silicone spray nozzle (6) for applying the silicone (9) to at least one surface region (7) of the object (2) in order to result in a silicone coating (3); at least one optical sensor (8) for monitoring the quality of the silicone coating (3) by identifying silicone (9), wherein the optical sensor (8) has an identification region (10) aligned with the processing region (5), in which identification region the sensor (8) can identify silicone (9); and at least one compressed air nozzle (11), which is aligned with the identification region (10) of the at least one optical sensor (8), for flushing the identification region (10) with compressed air.

Abstract: The invention relates to a device for treating formed parts with high-energy electron beams. The electron beams are guided by two opposite stationary or displaceable electron discharge windows onto the formed part and bounding a process space for the formed part. A transport device is present for the formed part, by which the formed part can be guided through the process space to the electron discharge windows disposed substantially vertically perpendicular to the transport direction. A channel is disposed in the process space for transporting the formed part and largely shielded against the X-ray radiation.