Patents by Inventor Steffen Kaiser
Steffen Kaiser has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 10859612Abstract: A testing device for an apparatus of an energy system which has inputs that can be connected in a conductive manner to at least one current transformer and at least one voltage transformer. The testing device is designed to apply a first test signal to a secondary side of the voltage transformer and, at the same time, to apply a second test signal to a primary side of the current transformer.Type: GrantFiled: July 7, 2016Date of Patent: December 8, 2020Assignee: Omicron electronics GmbHInventors: Ulrich Klapper, Steffen Kaiser
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Publication number: 20180149682Abstract: The invention relates to an apparatus (30) of an energy system which has inputs (39) that can be connected in a conductive manner to at least one current transformer (20, 28, 29) and at least one voltage transformer (10, 18, 19). A testing device (40) is designed to apply a first test signal (71) to a secondary side of a voltage transformer (10) and, at the same, to apply a second test signal to a primary side of a current transformer (20).Type: ApplicationFiled: July 7, 2016Publication date: May 31, 2018Inventors: Ulrich Klapper, Steffen Kaiser
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Patent number: 7980098Abstract: To optimize an optical component of synthetic quartz glass, in the case of which a quartz glass blank is subjected to a multistage annealing treatment, with respect to compaction and central birefringence, the present invention suggests a method comprising the following steps: (a) a first treatment phase during which the quartz glass blank is treated in an upper temperature range between 1130° C. and 1240° C., (b) cooling the quartz glass blank at a first-higher-mean cooling rate to a quenching temperature below 1100° C., a fictive temperature with a high mean value of 1100° C. or more being reached in the quartz glass, (c) a second treatment phase which comprises cooling of the quartz glass blank at a second-lower-mean cooling rate, and in which the quartz glass blank is treated in a lower temperature range between 950° C. and 1100° C. such that a fictive temperature is reached in the quartz glass with a low mean value which is at least 50° C.Type: GrantFiled: April 18, 2008Date of Patent: July 19, 2011Assignee: Heraeus Quarzglas GmbH & Co. KGInventors: Bodo Kuehn, Steffen Kaiser, Denis Kassube, Kerstin Merget
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Publication number: 20090239732Abstract: Starting from an optical component of quartz glass for transmitting ultraviolet radiation of a wavelength between 190 nm and 250 nm, with a glass structure essentially without oxygen defects, a hydrogen content ranging from 0.1×1016 molecules/cm3 to 5.0×1016 molecules/cm3, and with a content of SiH groups of less than 5×1016 molecules/cm3, to provide such a component which is particularly well suited for use with linearly polarized UV laser radiation, the present invention suggests that the component should have a content of hydroxyl groups ranging from 10 to 250 wt ppm and a fictive temperature above 1000° C.Type: ApplicationFiled: May 29, 2009Publication date: September 24, 2009Applicant: Heraeus Quarzglas GmbH & Co. KGInventors: Bodo Kuhn, Stephan Thomas, Steffen Kaiser
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Patent number: 7552601Abstract: Starting from an optical component of quartz glass for transmitting ultraviolet radiation of a wavelength between 190 nm and 250 nm, with a glass structure essentially without oxygen defects, a hydrogen content ranging from 0.1×1016 molecules/cm3 to 5.0×1016 molecules/cm3, and with a content of SiH groups of less than 5×1016 molecules/cm3, to provide such a component which is particularly well suited for use with linearly polarized UV laser radiation, the present invention suggests that the component should have a content of hydroxyl groups ranging from 10 to 250 wt ppm and a fictive temperature above 1000° C.Type: GrantFiled: March 30, 2005Date of Patent: June 30, 2009Assignee: Heraeus Quarzglas GmbH & Co. KGInventors: Bodo Kühn, Stephan Thomas, Steffen Kaiser
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Patent number: 7501367Abstract: To provide an optical component of quartz glass for use in a projection lens system for immersion lithography with an operating wavelength below 250 nm, which is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should show the combination of several properties: particularly a glass structure essentially without oxygen defects, a mean content of hydroxyl groups of less than 60 wt ppm, a mean content of fluorine of less than 10 wt ppm, a mean content of chlorine of less than 1 wt ppm. A method for producing such an optical component comprises the following method steps: producing and drying an SiO2 soot body under reducing conditions and treating the dried soot body before or during vitrification with a reagent reacting with oxygen defects of the quartz glass structure.Type: GrantFiled: April 13, 2006Date of Patent: March 10, 2009Assignee: Heraeus Quarzglas GmbH & Co. KGInventors: Bodo Kuehn, Stephan Ochs, Steffen Kaiser, Denis Kassube
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Publication number: 20090004088Abstract: To optimize an optical component of synthetic quartz glass, in the case of which a quartz glass blank is subjected to a multistage annealing treatment, with respect to compaction and central birefringence, the present invention suggests a method comprising the following steps: (a) a first treatment phase during which the quartz glass blank is treated in an upper temperature range between 1130° C. and 1240° C., (b) cooling the quartz glass blank at a first-higher-mean cooling rate to a quenching temperature below 1100° C., a fictive temperature with a high mean value of 1100° C. or more being reached in the quartz glass, (c) a second treatment phase which comprises cooling of the quartz glass blank at a second-lower-mean cooling rate, and in which the quartz glass blank is treated in a lower temperature range between 950° C. and 1100° C. such that a fictive temperature is reached in the quartz glass with a low mean value which is at least 50° C.Type: ApplicationFiled: April 18, 2008Publication date: January 1, 2009Applicant: Heraeus Quarzglas GmbH & Co. KGInventors: Bodo Kuehn, Steffen Kaiser, Denis Kassube, Kerstin Merget
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Patent number: 7149968Abstract: A method is provided for the simultaneous non-overlapping representation of at least further data visualization window in addition to a first established data visualization window in the display area of a monitor. The method allows arrangement of at least one further data visualization window in the display area of a monitor while maintaining the aspect ratio and the size thereof, beside a first data visualization window. Free rectangular areas of the first data visualization window are detected in the display area and are filed in a list with their characteristic data. The area of the free rectangular areas and their aspect ration and the aspect ration of the first data visualization window are taken into consideration for the determination of the optimizing variable. The additional data visualization window is positioned in the rectangular area with a priority in the derived list.Type: GrantFiled: January 21, 2000Date of Patent: December 12, 2006Assignee: Siemens AktiengesellschaftInventors: Torsten Ackerschewski, Christian Peter Brandt, Steffen Kaiser, Otto Kueckmann, Stefan Schwabe
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Publication number: 20060234848Abstract: To provide an optical component of quartz glass for use in a projection lens system for immersion lithography with an operating wavelength below 250 nm, which is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should show the combination of several properties: particularly a glass structure essentially without oxygen defects, a mean content of hydroxyl groups of less than 60 wt ppm, a mean content of fluorine of less than 10 wt ppm, a mean content of chlorine of less than 1 wt ppm. A method for producing such an optical component comprises the following method steps: producing and drying an SiO2 soot body under reducing conditions and treating the dried soot body before or during vitrification with a reagent reacting with oxygen defects of the quartz glass structure.Type: ApplicationFiled: April 13, 2006Publication date: October 19, 2006Applicant: Heraeus Quarzglas GmbH & Co. KGInventors: Bodo Kuehn, Stefan Ochs, Steffen Kaiser, Denis Kassube
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Patent number: 7080527Abstract: The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction. The quartz glass blank according to the invention is characterized by the following properties: a glass structure essentially free of oxygen defect sites, an H2-content in the range of 0.1×1016 molecules/cm3 to 4.0×1016 molecules/cm3, an OH-content in the range of 125 wt-ppm to 450 wt-ppm, an SiH group-content of less than 5×1016 molecules/cm3, a refractive index inhomogeneity, ?n, of less than 2 ppm, and a stress birefringence of less than 2 nm/cm.Type: GrantFiled: December 5, 2002Date of Patent: July 25, 2006Assignee: Heraeus Quarzglas GmbH & Co. KGInventors: Bodo Kühn, Bruno Uebbing, Martin Trommer, Stefan Ochs, Stephan Thomas, Steffen Kaiser, Jan Vydra
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Publication number: 20050217318Abstract: Starting from an optical component of quartz glass for transmitting ultraviolet radiation of a wavelength between 190 nm and 250 nm, with a glass structure essentially without oxygen defects, a hydrogen content ranging from 0.1×1016 molecules/cm3 to 5.0×1016 molecules/cm3, and with a content of SiH groups of less than 5×1016 molecules/cm3, to provide such a component which is particularly well suited for use with linearly polarized UV laser radiation, the present invention suggests that the component should have a content of hydroxyl groups ranging from 10 to 250 wt ppm and a fictive temperature above 1000° C.Type: ApplicationFiled: March 30, 2005Publication date: October 6, 2005Applicant: Heraeus Quarzglas GmbH & Co. KGInventors: Bodo Kuhn, Stephan Thomas, Steffen Kaiser
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Patent number: 6633166Abstract: The invention is directed to a method for producing a fault signal indicating a short-circuit between a first phase conductor and a second phase conductor of two different, parallel-running, three-phase power transmission lines. The method produces a fault signal indicating a short-circuit which has occurred between a first phase conductor and a second phase conductor of a power transmission arrangement.Type: GrantFiled: August 27, 2001Date of Patent: October 14, 2003Assignee: Siemens AktiensellscraftInventor: Steffen Kaiser
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Publication number: 20030115905Abstract: The present invention relates to a quartz glass blank for an optical component for transmission of ultraviolet radiation of a wavelength of 250 nm or shorter, and to a use of the quartz glass blank in microlithography in combination with ultraviolet radiation of a wavelength of 250 nm or shorter. Moreover, the invention relates to a procedure for manufacture of the quartz glass blank. A quartz glass blank of the described type should show little induced absorption and be optimized with respect to compaction and decompaction.Type: ApplicationFiled: December 5, 2002Publication date: June 26, 2003Inventors: Bodo Kuhn, Bruno Uebbing, Martin Trommer, Stefan Ochs, Stephan Thomas, Steffen Kaiser, Jan Vydra
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Patent number: 5946174Abstract: The invention concerns a process for detecting a ground fault in an electric power transmission line with three phase conductors where, upon response of the protective device, a fault identification signal indicating a single-pole or multipole fault is generated by comparing currents and voltages with predefined limit values. To reliably distinguish not only between a single-pole and a multipole ground fault, but also to reliably determine the phase conductor affected by the ground fault in such a process, measured quantities, corresponding to the currents of the zero phase-sequence system and the negative phase-sequence system, are formed when no fault identification signal is present. In the event of a ground fault of one phase conductor, when the phase angle between the two measured quantities drops below a predefined limit phase angle, an auxiliary signal is generated. Another auxiliary signal is generated when the currents in the two other phase conductors drop below a fraction of the ground current.Type: GrantFiled: July 21, 1997Date of Patent: August 31, 1999Assignee: Siemens AktiengesellschaftInventor: Steffen Kaiser