Patents by Inventor Steffen Lauer

Steffen Lauer has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Method of determining optical properties and projection exposure system comprising a wavefront detection system
    Patent number: 7230220
    Abstract: A method of determining at least one optical property of a projection exposure system is described, wherein the exposure system includes a beam delivery system having a light source for generating an exposure optical beam having light of a first wavelength (?1) and a second wavelength (?2), wherein a first ratio is defined as an intensity of light ?2 to an intensity of light ?1 in the exposure optical beam. The method includes supplying at least one measuring optical beam including light of at least ?1 to the projection optical system, detecting wavefronts having traversed the projection optical system, and determining an optical property in dependence of the detected wavefronts, wherein a second ratio of an intensity of light of ?2 to an intensity of light of ?1 in the measuring optical beam being incident on the detector of the wavefront detection system is less than the first ratio.
    Type: Grant
    Filed: March 24, 2006
    Date of Patent: June 12, 2007
    Assignee: Carl Zeiss SMT AG
    Inventors: Steffen Lauer, Ulrich Wegmann, Wolfgang Emer, Harald Sakowski, Martin Schriever
  • Method of determining optical properties and projection exposure system comprising a wavefront detection system
    Publication number: 20060231731
    Abstract: A method of determining at least one optical property of a projection exposure system is described, wherein the exposure system includes a beam delivery system having a light source for generating an exposure optical beam having light of a first wavelength (?1) and a second wavelength (?2), wherein a first ratio is defined as an intensity of light ?2 to an intensity of light ?1 in the exposure optical beam. The method includes supplying at least one measuring optical beam including light of at least ?1 to the projection optical system, detecting wavefronts having traversed the projection optical system, and determining an optical property in dependence of the detected wavefronts, wherein a second ratio of an intensity of light of ?2 to an intensity of light of ?1 in the measuring optical beam being incident on the detector of the wavefront detection system is less than the first ratio.
    Type: Application
    Filed: March 24, 2006
    Publication date: October 19, 2006
    Applicant: Carl Zeiss SMT AG
    Inventors: Steffen Lauer, Ulrich Wegmann, Wolfgang Emer, Harald Sakowski, Martin Schriever