Patents by Inventor Steffen Schulze
Steffen Schulze has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20170064254Abstract: A technique processes an initial recording of a meeting. The technique involves receiving the initial recording of the meeting, and performing a content classification operation that electronically classifies the initial recording of the meeting into a set of relevant conference portions and a set of irrelevant conference portions. The technique further involves, based on the initial recording of the meeting, providing a shortened recording of the meeting. The shortened recording includes the set of relevant conference portions and omits the set of irrelevant conference portions.Type: ApplicationFiled: August 31, 2015Publication date: March 2, 2017Inventors: Alexander Mueller, Martin Unzner, Mathias Buhr, Paul Elsner, Steffen Schulze
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Patent number: 9448481Abstract: Techniques for reducing the number of shots required by a radiation beam writing tool to write a pattern, such as fractured layout design, onto a substrate. One or more apertures are employed by a radiation beam writing tool to write a desired pattern onto a substrate using L-shaped images, T-shaped images, or some combination of both. By reducing the number of shots required to write a pattern onto a substrate, various implementations of the invention may reduce the write time and/or write complexity of the write process.Type: GrantFiled: September 8, 2015Date of Patent: September 20, 2016Assignee: Mentor Graphics CorporationInventors: Emile Y. Sahouria, Steffen Schulze
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Publication number: 20160198158Abstract: A technique for encoding a video signal includes generating a representative value for each block of one or more video frames by applying a predetermined function to the pixels of the respective block. To perform a block matching operation for a current block, the technique applies the predetermined function to the current block and interrogates representative values of blocks at specified locations in a spatial and/or temporal vicinity of the current block to find a matching block whose representative value matches the one generated for the current block.Type: ApplicationFiled: January 5, 2015Publication date: July 7, 2016Inventors: Eugen Wige, Steffen Schulze, Sascha Kuemmel
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Publication number: 20160150235Abstract: A technique for encoding a video signal generates multiple layers and multiple corresponding masks for each of a set of blocks of the video signal. Each of the layers for a given block is a rendition of that block, and each of the masks distinguishes pixels of the respective layer that are relevant in reconstructing the block from pixels that are not. The encoder applies lossy compression to each of the layers and transmits the lossily compressed layers and a set of the masks to a decoder, such that the decoder may reconstruct the respective block from the layers and the mask(s).Type: ApplicationFiled: November 20, 2014Publication date: May 26, 2016Inventor: Steffen Schulze
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Publication number: 20160150231Abstract: A technique for decoding video signals includes receiving, by electronic decoding circuitry, a set of video data representing a two-dimensional array of pixels of a video signal. The set of video data includes (i) multiple residual layers, each residual layer providing an incomplete, lossily-compressed representation of the two-dimensional array of pixels (ii) multiple sets of prediction information, one for each of the residual layers, and (iii) a set of masks for directing reconstruction of the two-dimensional array of pixels. The method further includes generating multiple decompressed layers based on the residual layers and on the sets of prediction information for the respective residual layers and combining the decompressed layers, as directed by the set of masks, to generate a complete reconstruction of the two-dimensional array of pixels of the video signal.Type: ApplicationFiled: February 6, 2015Publication date: May 26, 2016Inventor: Steffen Schulze
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Publication number: 20160133458Abstract: Techniques for reducing the number of shots required by a radiation beam writing tool to write a pattern, such as fractured layout design, onto a substrate. One or more apertures are employed by a radiation beam writing tool to write a desired pattern onto a substrate using L-shaped images, T-shaped images, or some combination of both. By reducing the number of shots required to write a pattern onto a substrate, various implementations of the invention may reduce the write time and/or write complexity of the write process.Type: ApplicationFiled: September 8, 2015Publication date: May 12, 2016Inventors: Emile Y. Sahouria, Steffen Schulze
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Patent number: 9266554Abstract: A motor vehicle steering column includes an inner jacket pipe that receives a steering spindle, which is received in a longitudinally adjustable manner in an outer jacket pipe held on a steering console and having a hollow cross-section. The steering column also includes a clamping device, by means of which the inner jacket pipe can be releasably secured in its adjusted longitudinal position relative to the outer jacket pipe. The outer jacket pipe has a recess at least over a longitudinal region, whereby its hollow cross-section can be altered by the clamping device.Type: GrantFiled: February 5, 2013Date of Patent: February 23, 2016Assignee: Daimler AGInventors: Detlef Hansen, Torsten Harms, Axel Hebenstreit, Holger Kittler, Jan Maak, Juergen Niemoeller, Steffen Schulze, Marco Schwieger
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Patent number: 9029702Abstract: The disclosure relates to a connection assembly for a sensor assembly having a connection element which is electrically and mechanically connected to one end of at least one wire of a connection cable in a first contacting region and can be electrically and mechanically connected to a sensor element in a second contacting region, wherein the connection element is at least partially enclosed by a plastic overmold which has a window-shaped recess in a transition region between the first contacting region and the second contacting region which is sealed in the injection molding die during the injection process of the plastic overmold and a corresponding sensor assembly. According to the disclosure, a positioning opening is arranged in the transition region such that the connection element can be positioned in the injection molding die and the transition region surrounding the positioning opening is sealed flat in the injection molding die to create the window-shaped recess.Type: GrantFiled: July 5, 2010Date of Patent: May 12, 2015Assignee: Robert Bosch GmbHInventors: Ronald Steinbrink, Sven Kluge, Stefan Ortmann, Steffen Schulze, Daniel Matthie, Jens Liebetrau, Frank Weishaeutel, Jan Beyersdorfer
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Publication number: 20150082936Abstract: A steering column damper element is arranged between an outer shaft and an inner shaft and is accommodated inside the outer shaft at least in sections and coaxially. The steering column damper element is formed as an elastomer ring that has a hardness of 40 to 80 Shore and has at least one hole running axially.Type: ApplicationFiled: January 19, 2013Publication date: March 26, 2015Applicant: Daimler AGInventors: Axel Hebenstreit, Steffen Kraus, Steffen Schulze
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Publication number: 20150076804Abstract: A motor vehicle steering column includes an inner jacket pipe that receives a steering spindle, which is received in a longitudinally adjustable manner in an outer jacket pipe held on a steering console and having a hollow cross-section. The steering column also includes a clamping device, by means of which the inner jacket pipe can be releasably secured in its adjusted longitudinal position relative to the outer jacket pipe. The outer jacket pipe has a recess at least over a longitudinal region, whereby its hollow cross-section can be altered by the clamping device.Type: ApplicationFiled: February 5, 2013Publication date: March 19, 2015Applicant: Daimler AGInventors: Detlef Hansen, Torsten Harms, Axel Hebenstreit, Holger Kittler, Jan Maak, Juergen Niemoeller, Steffen Schulze, Marco Schwieger
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Publication number: 20140338974Abstract: An apparatus for drilling a borehole into an earth formation includes: a drill bit configured to be rotated to drill into the formation; a drill tubular coupled to the drill bit and configured to rotate the drill bit; a steering device coupled to the drill string and configured to impart a force on the drill string to control a direction of drilling; and a controller configured to communicate a control signal to the steering device. The control signal includes information for directing actuation of the steering device for steering the drill bit in an intended drilling direction. The controller is further configured to direct the steering device to provide a compensating force on the drill string that prevents or reduces an azimuthal deviation from the intended drilling direction due to drill bit walking.Type: ApplicationFiled: May 14, 2013Publication date: November 20, 2014Applicant: Baker Hughes IncorporatedInventors: Donald Keith Trichel, Andreas Peter, Oliver Hoehn, Steffen Schulze
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Patent number: 8623254Abstract: A method for producing a magnetic field sensor for use in drive train of a motor vehicle includes encapsulating an electrical assembly and an end of a connecting cable via injection molding and integrally extruding a fastening tab. After a first injection step in which the electrical assembly and the connecting cable are encapsulated in a core-type first molded part, a second injection molding step in implemented in which a fastening tab is integrally formed via injection molding on the core-type insertion part in a specifiable longitudinal and/or angular position. The core-like insertion part is held in the injection mold in a longitudinally displaceable and/or rotatable manner.Type: GrantFiled: November 26, 2008Date of Patent: January 7, 2014Assignee: Robert Bosch GmbHInventors: Rolf Goetz, Steffen Schulze, Daniel Matthie, Markus Kny, Frank Weishaeutel
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Publication number: 20120198933Abstract: The disclosure relates to a connection assembly for a sensor assembly having a connection element which is electrically and mechanically connected to one end of at least one wire of a connection cable in a first contacting region and can be electrically and mechanically connected to a sensor element in a second contacting region, wherein the connection element is at least partially enclosed by a plastic overmold which has a window-shaped recess in a transition region between the first contacting region and the second contacting region which is sealed in the injection moulding die during the injection process of the plastic overmold and a corresponding sensor assembly. According to the disclosure, a positioning opening is arranged in the transition region such that the connection element can be positioned in the injection moulding die and the transition region surrounding the positioning opening is sealed flat in the injection moulding die to create the window-shaped recess.Type: ApplicationFiled: July 5, 2010Publication date: August 9, 2012Applicant: ROBERT BOSCH GMBHInventors: Ronald Steinbrink, Sven Kluge, Stefan Ortmann, Steffen Schulze, Daniel Matthie, Jens Liebetrau, Frank Weishaeutel, Jan Beyersdorfer
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Method of inspecting a mask or reticle for detecting a defect, and mask or reticle inspection system
Patent number: 7221788Abstract: A method of inspecting a mask or reticle, the mask or reticle being provided with a pattern to be transferred onto a semiconductor wafer, the pattern having a defect, includes the step of creating a plurality of logical zones and uniquely associating each of said logical zones with a surface area of said pattern. Then, an inspection rule representing a characteristic sensitivity for detecting a defect is associated with each of said logical zones. An image of said pattern is then recorded and compared with a reference image of an ideal pattern for locating a defect within said pattern. One of said logical zones is then identified with said located defect and that inspection rule which is associated with said identified logical zone is retrieved from a memory. The inspection rule is then applied to a characteristic of said defect for determining, whether said defect is to be repaired. A signal can be issued in response to said determination.Type: GrantFiled: July 1, 2003Date of Patent: May 22, 2007Assignee: Infineon Technologies AGInventors: Steffen Schulze, Henning Haffner -
Publication number: 20050153213Abstract: A method for repairing defects in a photolithographic mask for use in patterning semiconductor wafers introduces a pre-selected phase error selected to sum with a phase error of a defect repair material, yielding a desired composite phase error relative to light passing through the substrate alone, e.g., 180°. Substrate phase error may be introduced by modifying its thickness. For example, after any opaque layer material within a repair zone surrounding the defect is removed, the substrate, too, is removed within the repair zone to a pre-selected depth, forming a lacuna. Repair material is then deposited in the lacuna and in the remainder of the repair zone to a level substantially equal to the top surface of the opaque layer, yielding a desired, combined phase error and attenuation matching those of defect free regions of the mask where the opaque layer has not been removed.Type: ApplicationFiled: January 8, 2004Publication date: July 14, 2005Inventors: Steffen Schulze, Enio Carpi
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Method of inspecting a mask or reticle for detecting a defect, and mask or reticle inspection system
Publication number: 20050002554Abstract: A method of inspecting a mask or reticle, the mask or reticle being provided with a pattern to be transferred onto a semiconductor wafer, the pattern having a defect, includes the step of creating a plurality of logical zones and uniquely associating each of said logical zones with a surface area of said pattern. Then, an inspection rule representing a characteristic sensitivity for detecting a defect is associated with each of said logical zones. An image of said pattern is then recorded and compared with a reference image of an ideal pattern for locating a defect within said pattern. One of said logical zones is then identified with said located defect and that inspection rule which is associated with said identified logical zone is retrieved from a memory. The inspection rule is then applied to a characteristic of said defect for determining, whether said defect is to be repaired. A signal can be issued in response to said determination.Type: ApplicationFiled: July 1, 2003Publication date: January 6, 2005Inventors: Steffen Schulze, Henning Haffner -
Patent number: 6396160Abstract: Various fill strategies in the optical kerf are provided. A semiconductor wafer is divided into chip areas by strips of optical kerf regions. The optical kerf regions contain alignment marks used in the lithography processes. Partial fill patterns are provided in the optical kerf regions so that the area factor of the kerf region is similar to that of the chip areas. This results in full planarization by chemical mechanical polishing becoming feasible. Additionally, the fill is patterned so the alignment marks may be read accurately.Type: GrantFiled: September 14, 1999Date of Patent: May 28, 2002Assignee: International Business Machines CorporationInventors: Steffen Schulze, Kathryn H. Varian, Timothy Wiltshire
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Patent number: 6363296Abstract: A method for inspecting photomasks, in accordance with present invention includes the step of providing a design data set for fabricating a photomask, searching the design data set for sub-groundrule features, eliminating the sub-groundrule features from the data set to form an inspection data set and inspecting a photomask fabricated in accordance with the design data set by employing the inspection data set. A system for executing the steps in accordance with the present invention is also provided.Type: GrantFiled: February 24, 1999Date of Patent: March 26, 2002Assignee: Infineon Technologies AGInventor: Steffen Schulze
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Patent number: 6270947Abstract: The non-uniformity edge effect that can affect the quality of chips near the edge of a semiconductor wafer of various steps in the manufacture of integrated circuits is reduced. This is achieved by increasing the field area exposed by a step and repeat printer only when printing squares for chips located near the wafer edge. As a result there is also printed for processing an additional non-functional area outside the functional area to reduce the non-uniformity effect. This increases throughput of the printing apparatus.Type: GrantFiled: April 30, 1999Date of Patent: August 7, 2001Assignees: Infineon Technologies AG, International Business Machines CorporationInventors: Steffen Schulze, Franz Zach
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Publication number: 20010003033Abstract: The non-uniformity edge effect that can affect the quality of chips near the edge of a semiconductor wafer of various steps in the manufacture of integrated circuits is reduced. This is achieved by increasing the field area exposed by a step and repeat printer only when printing squares for chips located near the wafer edge. As a result there is also printed for processing an additional non-functional area outside the functional area to reduce the non-uniformity effect. This increases throughput of the printing apparatus.Type: ApplicationFiled: April 30, 1999Publication date: June 7, 2001Inventors: STEFFEN SCHULZE, FRANZ ZACH