Patents by Inventor Steffen Straach
Steffen Straach has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20200255929Abstract: A method is provided for producing a foil made of an electrically conductive material. The foil consists of the same electrically conductive material along the extension of the foil thickness. A flexible substrate is first introduced into a working chamber; a layer made of the electrically conductive material is deposited on at least one surface region of the flexible substrate using a vacuum coating process; and the first layer is then removed from the flexible substrate. Either an ion-etching process is carried out at least on the surface region of the flexible substrate prior to depositing the layer made of the electrically conductive material and/or the layer made of the electrically conductive material is heated during and/or after the layer is deposited.Type: ApplicationFiled: August 8, 2018Publication date: August 13, 2020Applicant: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.Inventors: Nicolas Schiller, Steffen Straach, Matthias Fahland, Cindy Steiner, Sebastian Rethberg
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Publication number: 20200240009Abstract: A device for coating a band-shaped substrate within a vacuum chamber is provided. The device comprises a coating device; a cooling device with at least one convex surface area which at least partially touches the band-shaped substrate at the time of the coating; and a coil system comprising at least a supply roller, a receiving roller, and multiple guide rollers, wherein the band-shaped substrate includes an electrically conductive material at least on the side where the band-shaped substrate touches the cooling device, wherein the cooling device has an electrically conductive base body and an outer edge layer comprising an electrically insulating material; the coil system is designed to be potential-free with respect to the electrical mass of the device, and an electrical voltage of at least 10 V is formed between the electrically conductive base body, the cooling device, and the electrically conductive material of the substrate.Type: ApplicationFiled: January 24, 2020Publication date: July 30, 2020Applicant: Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V.Inventors: Sebastian Rethberg, Steffen Straach, Thomas Kühnel
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Publication number: 20140374241Abstract: A method for depositing a LiPON coating on a substrate is provided, wherein the vaporization material, which is located in a vessel and which includes at least the chemical elements lithium, phosphorus and oxygen, is vaporized within a vacuum chamber. Here the vaporization material is heated by means of a thermal vaporization apparatus, and simultaneously either a nitrogen-containing component is introduced into the vacuum chamber or a nitrogen-containing material is co-vaporized, and wherein the vapor particle mist rising from the vessel is permeated by a plasma before the deposition on the substrate.Type: ApplicationFiled: January 16, 2013Publication date: December 25, 2014Inventors: Steffen Günther, Matthias Fahland, Henry Morgner, Steffen Straach, Björn Meyer
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Publication number: 20130302536Abstract: The invention relates to a method for producing a transparent bather layer system, wherein in a vacuum chamber at least two transparent barrier layers and a transparent intermediate layer disposed between the two barrier layers are deposited on a transparent plastic film, wherein for deposition of the barrier layers aluminium is vaporised and simultaneously at least one first reactive gas is introduced into the vacuum chamber and wherein for deposition of the intermediate layer aluminium is vaporised and simultaneously at least one second reactive gas and a gaseous or vaporous organic component are introduced into the vacuum chamber.Type: ApplicationFiled: February 15, 2012Publication date: November 14, 2013Applicant: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.Inventors: Steffen Guenther, Bjoern Meyer, Steffen Straach, Thomas Kuehnel, Sebastian Bunk, Nicolas Schiller
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Publication number: 20130287969Abstract: The invention relates to a method for producing a transparent barrier layer system, wherein in a vacuum chamber at least two transparent barrier layers and a transparent intermediate layer disposed between the two barrier layers are deposited on a transparent plastic film, wherein for deposition of the barrier layers aluminium is vaporised and simultaneously at least one first reactive gas is introduced into the vacuum chamber and wherein for deposition of the intermediate layer aluminium is vaporised and simultaneously at least one second reactive gas is introduced into the vacuum chamber, and a silicon-containing layer is deposited as intermediate layer by means of a PECVD process.Type: ApplicationFiled: February 15, 2012Publication date: October 31, 2013Applicant: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.Inventors: Steffen Guenther, Bjoern Meyer, Steffen Straach, Thomas Kuehnel, Sebastian Bunk, Nicolas Schiller
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Patent number: 8470140Abstract: The invention relates to a method for producing an ultrabarrier layer system through vacuum coating a substrate with a layer stack that is embodied as an alternating layer system of smoothing layers and transparent ceramic layers, but comprising at least one smoothing layer between two transparent ceramic layers, which are applied by sputtering, in which during the deposition of the smoothing layer a monomer is admitted into an evacuated coating chamber in which a magnetron plasma is operated.Type: GrantFiled: November 23, 2004Date of Patent: June 25, 2013Assignee: Fraunhofer-Gesellschaft zur Foerderung der Angewandten Forschung E.V.Inventors: Christoph Charton, Matthias Fahland, Mario Krug, Nicolas Schiller, Steffen Straach
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Publication number: 20100300731Abstract: A method for producing a flexible circuit board material having a polymer substrate and a copper layer. The method includes depositing a layer of titanium oxide to be between the polymer substrate and the copper layer. The layer of titanium oxide and the copper layer are deposited using vacuum methods.Type: ApplicationFiled: May 7, 2008Publication date: December 2, 2010Applicant: FRAUNHOFER-GESELLSCHAFT ZUR FÖRDERUNG DER ANGEWANDTEN FORSCHUNG E.V.Inventors: Steffen Guenther, Waldemar Schoenberger, Steffen Straach, Nicolas Schiller, Volker Kirchhoff
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Patent number: 7803255Abstract: The invention relates to a device for the plasma activated vapor coating of large-surface moved substrates, comprising at least one vacuum recipient, one pump system, one evaporator, one device for holding and transporting the substrates to be coated and at least one arc discharge plasma source, whereby at least one device for generating a magnetic field is included, which device can generate a magnetic field between the evaporator and the substrate, the field lines of which magnetic field are aligned approximately perpendicular to the movement direction and parallel to the transport plane of the substrate, and at least one arc discharge plasma source is arranged such that the axis of the arc discharge plasma source is aligned approximately perpendicular to the field lines of the magnetic field.Type: GrantFiled: June 13, 2002Date of Patent: September 28, 2010Assignee: Fraunhofer-Gesellschaft zur Förderung der Angewandten Forschung E.V.Inventors: Manfred Neumann, Steffen Straach, Mario Krug, Nicolas Schiller
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Patent number: 7541070Abstract: The invention relates to a method for vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide by reactively vaporizing aluminum and admitting reactive gas in a strip vapor-deposition installation. The invention provides that, before coating with aluminum oxide, a partially enclosed layer made of a metal or of a metal oxide is applied to the substrate by magnetron sputtering.Type: GrantFiled: October 16, 2003Date of Patent: June 2, 2009Assignee: Fraunhofer Gesellschaft zur Foerderung der angewandten Forschung e.V.Inventors: Nicolas Schiller, Steffen Straach, Mathias Räbisch, Matthias Fahland, Christoph Charton
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Publication number: 20070170050Abstract: The invention relates to a method for producing an ultrabarrier layer system through vacuum coating a substrate with a layer stack that is embodied as an alternating layer system of smoothing layers and transparent ceramic layers, but comprising at least one smoothing layer between two transparent ceramic layers, which are applied by sputtering, in which during the deposition of the smoothing layer a monomer is admitted into an evacuated coating chamber in which a magnetron plasma is operated.Type: ApplicationFiled: November 23, 2004Publication date: July 26, 2007Applicant: FRAUNHOFER-GESELLSCHAFT ZUR FOERDERUNG DER ANGEWANDTEN FORSCHUNG E.V.Inventors: Christoph Charton, Matthias Fahland, Mario Krug, Nicolas Schiller, Steffen Straach
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Publication number: 20060257585Abstract: The invention relates to a method for vapor-depositing strip-shaped substrates with a transparent barrier layer made of aluminum oxide by reactively vaporizing aluminum and admitting reactive gas in a strip vapor-deposition installation. The invention provides that, before coating with aluminum oxide, a partially enclosed layer made of a metal or of a metal oxide is applied to the substrate by magnetron sputtering.Type: ApplicationFiled: October 16, 2003Publication date: November 16, 2006Applicant: Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e. V.Inventors: Nicolas Schiller, Steffen Straach, Mathias Rabisch, Matthias Fahland
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Publication number: 20050196548Abstract: Component having corrosion protection and including a base body made of one of a steel material and a light metal material. A corrosion-inhibiting surface layer that is a dense, fine-grained, largely pore-free structure formed by plasma-based vapor deposition. The surface layer having an average thickness of between 1 ?m and 50 ?m and being at least one layer of at least one of aluminum, an aluminum alloy, and an aluminum compound. This Abstract is not intended to define the invention disclosed in the specification, nor intended to limit the scope of the invention in any way.Type: ApplicationFiled: February 25, 2005Publication date: September 8, 2005Applicant: Fraunhofer Gesellschaft Zur Foerderung Der Angewandten Forschung E.V.Inventors: Klaus Goedicke, Fred Fietzke, Steffen Straach, Volker Kirchhoff, Klaus-Dieter Hofmann, Frank Hollstein
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Publication number: 20040168635Abstract: The invention relates to a device for the plasma activated vapor coating of large-surface moved substrates, comprising at least one vacuum recipient, one pump system, one evaporator, one device for holding and transporting the substrates to be coated and at least one arc discharge plasma source, whereby at least one device for generating a magnetic field is included, which device can generate a magnetic field between the evaporator and the substrate, the field lines of which magnetic field are aligned approximately perpendicular to the movement direction and parallel to the transport plane of the substrate, and at least one arc discharge plasma source is arranged such that the axis of the arc discharge plasma source is aligned approximately perpendicular to the field lines of the magnetic field.Type: ApplicationFiled: December 18, 2003Publication date: September 2, 2004Inventors: Manfred Neumann, Steffen Straach, Mario Krug, Nicolas Schiller
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Patent number: 6130002Abstract: Method for producing at least one organically-modified oxide, oxinitride or nitride layer by vacuum coating on a substrate through plasma-enhanced evaporation of evaporation material comprising nitride-forming evaporation material and one of oxide and suboxide evaporation material, wherein the at least one layer is deposited through plasma-enhanced, reactive high-rate evaporation of the evaporation material with use of gaseous monomers and a reactive gas including at least one of oxygen and nitrogen, and wherein the evaporation material, gaseous monomers, and reactive gas pass through a high-density plasma zone immediately in front of the substrate.Type: GrantFiled: July 22, 1998Date of Patent: October 10, 2000Assignee: Fraunhofer-Gesellschaft zur Forderung der angewandten Forschung e.V.Inventors: Manfred Neumann, Siegfried Schiller, Henry Morgner, Nicolas Schiller, Steffen Straach