Abstract: A guided-wave-driven metasurface antenna includes an input for receiving a guided wave; an output for outputting a free-space wave; and a spatial frequency mixer connected between the input and the output for converting the guided wave to the free-space wave. The spatial frequency mixer is implemented by a metasurface of the antenna. The superheterodyne metasurface can be fabricated with high accuracy using lithography step similar to conventional waveguides made by the well-established semiconductor processing technology, making their integration with PICs straightforward.

Abstract: A fluidic apparatus for detection of a chemical substance, a biosensor, and a method of fabricating the fluidic apparatus. The fluidic apparatus includes a fluidic structure arranged to receive a sample containing a target substance, and a trapping structure, in fluid communication with the fluidic structure and arranged to immobilize the target substance in a detection region, wherein the detection region of the trapping structure is arranged to alter a physical characteristic of an incident light signal which represents a concentration of the target substance contained in the sample.

Abstract: A method of fabricating an array of plasmonic structures, a biosensor and a method of fabricating the biosensor. The biosensor includes: an array of plasmonic structures arranged on a base, and defining a detection surface distanced from the base; a separator arranged to separate at least a main portion of a cell from the detection surface; wherein the biosensor is arranged to detect, based on a change of an optical property of the array of plasmonic structures, in response to one or more protrusions extending from the main portion of the cell reaching the detection surface.

Abstract: An antenna and methods of fabricating the antenna and a resonator of the antenna. The antenna includes an antenna feed arranged to emit an electromagnetic signal along a predetermined direction; a resonator disposed adjacent to the antenna feed arranged to improve a directivity of the electromagnetic signal being emitted by the antenna feed; wherein the resonator includes a first reflector and a second reflector sandwiching a resonating cavity therebetween; and wherein the first reflector includes a curved reflector surface.

Abstract: A method of fabricating an array of plasmonic structures, a biosensor and a method of fabricating the biosensor. The biosensor includes: an array of plasmonic structures arranged on a base, and defining a detection surface distanced from the base; a separator arranged to separate at least a main portion of a cell from the detection surface; wherein the biosensor is arranged to detect, based on a change of an optical property of the array of plasmonic structures, in response to one or more protrusions extending from the main portion of the cell reaching the detection surface.

Abstract: An antenna and methods of fabricating the antenna and a resonator of the antenna. The antenna includes an antenna feed arranged to emit an electromagnetic signal along a predetermined direction; a resonator disposed adjacent to the antenna feed arranged to improve a directivity of the electromagnetic signal being emitted by the antenna feed; wherein the resonator includes a first reflector and a second reflector sandwiching a resonating cavity therebetween; and wherein the first reflector includes a curved reflector surface.

Abstract: A fluidic apparatus for detection of a chemical substance, a biosensor, and a method of fabricating the fluidic apparatus. The fluidic apparatus includes a fluidic structure arranged to receive a sample containing a target substance, and a trapping structure, in fluid communication with the fluidic structure and arranged to immobilize the target substance in a detection region, wherein the detection region of the trapping structure is arranged to alter a physical characteristic of an incident light signal which represents a concentration of the target substance contained in the sample.

Abstract: An electromedical apparatus, a method for manufacturing the electromedical apparatus and a method for deploying the electromedical apparatus. The electromedical apparatus includes an electrical component arranged to facilitate an electrical signal transmission between an electrical device and a target; and a mechanical component physically connected to the electrical component; wherein the mechanical component includes a fluidic structure arranged to modify at least one physical property of the mechanical component, so as to facilitate a deployment of the electromedical apparatus on the target.

Abstract: The present invention is directed to micro- and nano-scale imprinting methods and the use of such methods to fabricate supported and/or free-standing 3-D micro- and/or nano-structures of polymeric, ceramic, and/or metallic materials. In some embodiments, a duo-mold approach is employed in the fabrication of these structures. In such methods, surface treatments are employed to impart differential surface energies to different molds and/or different parts of the mold(s). Such surface treatments permit the formation of three-dimensional (3-D) structures through imprinting and the transfer of such structures to a substrate. In some or other embodiments, such surface treatments and variation in glass transition temperature of the polymers used can facilitate separation of the 3-D structures from the molds to form free-standing micro- and/or nano-structures individually and/or in a film.

Abstract: A method of applying a pattern on a topography includes first applying a polymer film to an elastomer member, such as PDMS, to form a pad. The pad is then applied to a substrate having a varying topography under pressure. The polymer film is transferred to the substrate due to the plastic deformation of the polymer film under pressure compared to the elastic deformation of the PDMS member. Thus, upon removal of the pad from the substrate, the PDMS member pulls away from the polymer layer, thereby depositing the polymer layer upon the substrate.

Abstract: A microelectromechanical heating apparatus and fluid preconcentrator device utilizing same wherein heating elements of the apparatus are sized and spaced to substantially uniformly heat a heating chamber within a heater of the apparatus. Tall, thermally-isolated heating elements are fabricated in Si using high aspect ratio etching technology. These tall heating elements have large surface area to provide large adsorbent capacity needed for high efficiency preconcentrators in a micro gas chromatography system (?GC). The tall heating elements are surrounded by air gaps to provide good thermal isolation, which is important for a low power preconcentrator in the ?GC system.

Abstract: Methods of creating patterns on substrates are presented, and articles of manufacture resulting therefrom. One method comprises applying a first surface energy modifier to an applicator to form a coating on the applicator; contacting the coating with a receiving member, the receiving member having a topography, the coating only contacting and remaining on at least some protrusions; exposing the first modified receiving member to a second surface energy modifier, thereby forming a second modified receiving member having surface modified recesses; applying a composition comprising a polymeric material to the second modified receiving member, the composition substantially conforming to the topography of the surface modified protrusions and the surface modified recesses; and contacting the composition-coated, surface modified protrusions with a substrate for a time and under conditions sufficient to transfer the polymeric material on protrusions to the substrate.

Abstract: Methods of creating patterns on substrates are presented, and articles of manufacture resulting therefrom. One method comprises applying a first surface energy modifier to an applicator to form a coating on the applicator; contacting the coating with a receiving member, the receiving member having a topography, the coating only contacting and remaining on at least some protrusions; exposing the first modified receiving member to a second surface energy modifier, thereby forming a second modified receiving member having surface modified recesses; applying a composition comprising a polymeric material to the second modified receiving member, the composition substantially conforming to the topography of the surface modified protrusions and the surface modified recesses; and contacting the composition-coated, surface modified protrusions with a substrate for a time and under conditions sufficient to transfer the polymeric material on protrusions to the substrate.

Abstract: A microelectromechanical heating apparatus and fluid preconcentrator device utilizing same wherein heating elements of the apparatus are sized and spaced to substantially uniformly heat a heating chamber within a heater of the apparatus. Tall, thermally-isolated heating elements are fabricated in Si using high aspect ratio etching technology. These tall heating elements have large surface area to provide large adsorbent capacity needed for high efficiency preconcentrators in a micro gas chromatography system (&mgr;GC). The tall heating elements are surrounded by air gaps to provide good thermal isolation, which is important for a low power preconcentrator in the &mgr;GC system.

Abstract: A monolithic sensor including a doped mechanical structure is movably supported by but electrically isolated from a single crystal semiconductor substrate of the sensor through a relatively simple process. The sensor is preferably made from a single crystal silicon substrate using front-side release etch-diffusion. Thick single crystal Si micromechanical devices are combined with a conventional bipolar complimentary metal oxide semiconductor (BiCMOS) integrated circuit process. This merged process allows the integration of Si mechanical resonators as thick as 15 &mgr;m thick or more with any conventional integrated circuit process with the addition of only a single masking step. The process does not require the use of Si on insulator wafers or any type of wafer bonding. The Si resonators are etched in an inductively coupled plasma source which allows deep trenches to be fabricated with high aspect ratios and smooth sidewall surfaces.

Abstract: A monolithic sensor including a doped mechanical structure is movably supported by but electrically isolated from a single crystal semiconductor substrate of the sensor through a relatively simple process. The sensor is preferably made from a single crystal silicon substrate using front-side release etch-diffusion. Thick single crystal Si micromechanical devices are combined with a conventional bipolar complimentary metal oxide semiconductor (BiCMOS) integrated circuit process. This merged process allows the integration of Si mechanical resonators as thick as 15 .mu.m thick or more with any conventional integrated circuit process with the addition of only a single masking step. The process does not require the use of Si on insulator wafers or any type of wafer bonding. The Si resonators are etched in an inductively coupled plasma source which allows deep trenches to be fabricated with high aspect ratios and smooth sidewall surfaces. Clamped-clamped beam Si resonators 500 .mu.m long, 5 .mu.m wide, and 11 .mu.

Abstract: A planarization process and apparatus which employs plasma-enhanced chemical vapor deposition (PECVD) to form plarnarization films of dielectric or conductive carbonaceous material on step-like substrates.

Abstract: A new anisotropic dry etching system using a hot jet tube to heat and dissociate non-reactive source gas to form a directed flux of reactive specie or radicals for etching materials through openings in a resist or a reusable stencil of SiN.sub.x wherein x is in the range of 1.5 to 0.5. Si and GaAs may be etched using Cl.sub.2, F.sub.3, Br.sub.2 or SF.sub.6 source gasses. Pb or Hg, Cd, Te may be etched using n-butane, dimethyl ether or acetone as a source gas for CH.sub.3 radicals. The tube may be formed of tungsten or where fluorine is used as a source gas, an irridium tube is preferred. Alternatively, a tube formed of rhenium or an alloy of rhenium and tungsten is preferred for some applications.