Abstract: Disclosed herein are methods of producing E-CF3CH?CHCF3 in a liquid phase. Also disclosed are methods of preparing CF3CH2CHClCF3 and CF3CHClCH2CCl3.

Abstract: Disclosed herein are methods of producing E-CF3CH?CHCF3 in a liquid phase. Also disclosed are methods of preparing CF3CH2CHClCF3 and CF3CHClCH2CCl3.

Abstract: Compositions comprising are provided wherein RF is a fluorine containing moiety comprising (CF3)2CFCH2(CF3)CH—, (CF3)2CFCH2((CF3)2CF)CH—, (CF3)2CFCH2((CF3)2CH)CH—, (CF3)2CHCH2((CF3)2CF)CH—, ((CF3)2CFCH2)2CH—, (CF3)2CFCH2CF—, (CF3)2CF—, (CF3)2CH—, CF3—, or CnF2n+1—, n being an integer from 2 to 20; R1 is F or H; R2 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H; and R3 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H, such compositions can produced according to processes, and utilized to prevent combustion utilizing systems.

Abstract: Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups, RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and or RF-foam stabilizers. The RF portion can include at least two groups —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2 groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the Rf-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover.

Abstract: Compositions comprising are provided wherein RF is a fluorine containing moiety comprising (CF3)2CFCH2(CF3)CH—, (CF3)2CFCH2((CF3)2CF)CH—, (CF3)2CFCH2((CF3)2CH)CH—, (CF3)2CHCH2((CF3)2CF)CH—, ((CF3)2CFCH2)2CH—, (CF3)2CFCH2CF—, (CF3)2CF—, (CF3)2CH—, CF3—, or CnF2n+1—, n being an integer from 2 to 20; R1 is F or H; R2 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H; and R3 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H, such compositions can produced according to processes, and utilized to prevent combustion utilizing systems.

Abstract: Compositions comprising are provided wherein RF is a fluorine containing moiety comprising (CF3)2CFCH2(CF3)CH—, (CF3)2CFCH2((CF3)2CF)CH—, (CF3)2CFCH2((CF3)2CH)CH—, (CF3)2CHCH2((CF3)2CF)CH—, ((CF3)2CFCH2)2CH—, (CF3)2CFCH2CF—, (CF3)2CF—, (CF3)2CH—, CF3—, or CnF2n+1—, n being an integer from 2 to 20; R1 is F or H; R2 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H; and R3 comprises (CF3)2CF—, (CF3)2CH—, CF3—, F, or H, such compositions can produced according to processes, and utilized to prevent combustion utilizing systems.

Abstract: Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups, RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and or RF-foam stabilizers. The RF portion can include at least two groups —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2 groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover.

Abstract: RF-compositions including surfactants, foam stabilizers, monomers, polymers, urethanes, intermediates, metal complexes, phosphate esters as well as telomerization methods are provided.

Abstract: RF-compositions including surfactants, foam stabilizers, monomers, polymers, urethanes, intermediates, metal complexes, phosphate esters as well as telomerization methods are provided.

Abstract: Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups. RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and/or RF-foam stabilizers. The RF portion can include at least two —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover.

Abstract: Compositions and methods for making compositions such as RF(R?)nQ are provided. The RF group can include at least two —CF3 groups, the R? group can be a group having at least two carbons, n can be at least 1, and the Q group can include one or more atoms of the periodic table of elements. RF-intermediates (RF(RT)nQg); Surfactants (RF(RT)nQs); Foam stabilizers (RF(RT)IIQFS); Metal complexes (RF(RT)IIQMC); Phosphate ester (RF(RT)HQPE); Polymers (RF(RT)IIQMU); Monomers (RF(RT)IIQM); Urethanes (RF(R?)nQu); and/or Glycols (RF(RT)IIQH) and methods for making the same are provided.

Abstract: Chemical production processes are provided that include reacting a metal comprising olefin to form a conjugated olefin; reacting a heterohalogenated olefin to form a conjugated olefin; reacting a halogenated alkane to form a conjugated olefin; and/or reacting a hydrohalogenated olefin to form a conjugated olefin. Chemical production systems are also provided that can include: a first reactant reservoir configured to house a perhalogenated olefin; a second reactant reservoir configured to house a catalyst mixture; a first reactor coupled to both the first and second reservoirs, the first reactor configured to house a metal-comprising mixture and receive both the perhalogenated olefin form the first reactant reservoir and the reactant mixture from the second reactant reservoir; and a product collection reservoir coupled to the first reactor and configured to house a conjugated olefin.

Abstract: Compositions are provided that can include RF(RT)nQ, and/or RCl(RT)nH. The RF group can have four fluorine atoms, the RT group can include a C-2 group having a pendant —CF3 group, n can be at least 1, the R1 group can include a carbon atom, the RCl group can be —CCl3, and the Q group can include one or more atoms of the periodic table of elements. Telomerization processes are also provided.

Abstract: RF-compositions including surfactants, foam stabilizers, monomers, polymers, urethanes, intermediates, metal complexes, phosphate esters as well as telomerization methods are provided.

Abstract: Telomer compositions are provided that can include at least one taxogen unit and a telogon unit, the taxogen unit being one or more of TFP, PFP, VDF, TFMA, PMVE, VF, TFE, CTFE, BrTFE, HFP, dichlorodifluoroethylene, chlorodifluoroethylene, bromodifluoroethylene, ethylenealkyl ether, ethylene, and propylene; the telogen unit being one or more of RFQ or RClQ, wherein the RF group can be an alkyl group having at least four fluorine atoms, the RCl group can be —CCl3, and the Q group can be H, Br, or I. Chemical production processes are also provided that can include exposing a taxogen to a telogen to form a telomer.

Abstract: Compositions are provided that can include RF(RT)nQ, formula I (I), formula II (II), and/or RCl(RT)nH. The RF group can have four fluorine atoms, the RT group can include a C-2 group having a pendant —CF3 group, n can be at least 1, the R1 group can include a carbon atom, the RCl group can be —CCI3, and the Q group can include one or more atoms of the periodic table of elements. Telomerization processes are also provided.

Abstract: Compositions are provided that can include RF(RT)nQ, and/or RCl(RT)nH. The RF group can have four fluorine atoms, the RT group can include a C-2 group having a pendant —CF3 group, n can be at least 1, the R1 group can include a carbon atom, the RCl group can be —CCl3, and the Q group can include one or more atoms of the periodic table of elements. Telomerization processes are also provided.

Abstract: Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohol's, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups. RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and/or RF-foam stabilizers. The RF portion can include at least two —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover.

Abstract: Production processes and systems are provided that include reacting halogenated compounds, dehalogenating compounds, reacting alcohols, reacting olefins and a saturated compounds, reacting reactants having at least two —CF3 groups with reactants having cyclic groups. RF-compositions such as RF-intermediates, RF-surfactants, RF-monomers, RF-monomer units, RF-metal complexes, RF-phosphate esters, RF-glycols, RF-urethanes, and/or RF-foam stabilizers. The RF portion can include at least two —CF3 groups, at least three —CF3 groups, and/or at least two —CF3 groups and at least two —CH2— groups. Detergents, emulsifiers, paints, adhesives, inks, wetting agents, foamers, and defoamers including the RF-surfactant composition are provided. Acrylics, resins, and polymers are provided that include a RF-monomer unit. Compositions are provided that include a substrate having a RF-composition thereover.

Abstract: Compositions are provided that can include RF(RT)nQ, formula I (I), formula II (II), and/or RCl(RT)nH. The RF group can have four fluorine atoms, the RT group can include a C-2 group having a pendant —CF3 group, n can be at least 1, the R1 group can include a carbon atom, the RCl group can be —CCI3, and the Q group can include one or more atoms of the periodic table of elements. Telomerization processes are also provided.