Patents by Inventor Stephan Braye

Stephan Braye has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Cobalt chemistry for smooth topology
    Patent number: 11807951
    Abstract: An electroplated cobalt deposit and a method of electrodepositing cobalt on a surface to produce a level deposit across the surface of the substrate. The cobalt electrolyte contains (1) a source of cobalt ions; (2) boric acid; (3) a pH adjuster; and (4) an organic additive, which contains a suppressor. The electroplated cobalt deposit exhibits a level surface such that the thickness difference across substantially the entire surface of the substrate of less than about 200 nm.
    Type: Grant
    Filed: November 11, 2021
    Date of Patent: November 7, 2023
    Assignee: MacDermid Enthone Inc.
    Inventors: Shaopeng Sun, Kyle Whitten, Stephan Braye, Elie Najjar
  • COBALT CHEMISTRY FOR SMOOTH TOPOLOGY
    Publication number: 20220136123
    Abstract: An electroplated cobalt deposit and a method of electrodepositing cobalt on a surface to produce a level deposit across the surface of the substrate. The cobalt electrolyte contains (1) a source of cobalt ions; (2) boric acid; (3) a pH adjuster; and (4) an organic additive, which contains a suppressor. The electroplated cobalt deposit exhibits a level surface such that the thickness difference across substantially the entire surface of the substrate of less than about 200 nm.
    Type: Application
    Filed: November 11, 2021
    Publication date: May 5, 2022
    Inventors: Shaopeng Sun, Kyle Whitten, Stephan Braye, Elie Najjar
  • Cobalt chemistry for smooth topology
    Patent number: 11230778
    Abstract: An electroplated cobalt deposit and a method of electrodepositing cobalt on a surface to produce a level deposit across the surface of the substrate. The cobalt electrolyte contains (1) a source of cobalt ions; (2) boric acid; (3) a pH adjuster; and (4) an organic additive, which contains a suppressor. The electroplated cobalt deposit exhibits a level surface such that the thickness difference across substantially the entire surface of the substrate of less than about 200 nm.
    Type: Grant
    Filed: December 13, 2019
    Date of Patent: January 25, 2022
    Assignee: MacDermid Enthone Inc.
    Inventors: Shaopeng Sun, Kyle Whitten, Stephan Braye, Elie Najjar
  • COBALT CHEMISTRY FOR SMOOTH TOPOLOGY
    Publication number: 20210180200
    Abstract: An electroplated cobalt deposit and a method of electrodepositing cobalt on a surface to produce a level deposit across the surface of the substrate. The cobalt electrolyte contains (1) a source of cobalt ions; (2) boric acid; (3) a pH adjuster; and (4) an organic additive, which contains a suppressor. The electroplated cobalt deposit exhibits a level surface such that the thickness difference across substantially the entire surface of the substrate of less than about 200 nm.
    Type: Application
    Filed: December 13, 2019
    Publication date: June 17, 2021
    Inventors: Shaopeng Sun, Kyle Whitten, Stephan Braye, Elie Najjar