Abstract: A device for waste gas scrubbing in a urea plant may be configured such that a waste gas passes along a transportation direction in the duct. The duct may include a first region for removing urea dust particles from the waste gas and a second region for removing chemical compounds from the waste gas, which can be integrated by an acid-base reaction into an aqueous liquid phase. A cross-sectional area of the duct extending perpendicular to the transportation direction in the second region may be greater than a cross-sectional area extending perpendicular to the transportation direction in the first region. Further, the device may be configured such that the duct extends horizontally at least in sections and/or the transportation direction of the waste gas through the duct extends horizontally in an installed state.

Abstract: A device for waste gas scrubbing in a urea plant may be configured such that a waste gas passes along a transportation direction in the duct. The duct may include a first region for removing urea dust particles from the waste gas and a second region for removing chemical compounds from the waste gas, which can be integrated by an acid-base reaction into an aqueous liquid phase. A cross-sectional area of the duct extending perpendicular to the transportation direction in the second region may be greater than a cross-sectional area extending perpendicular to the transportation direction in the first region. Further, the device may be configured such that the duct extends horizontally at least in sections and/or the transportation direction of the waste gas through the duct extends horizontally in an installed state.