Patents by Inventor Stephan Ilg

Stephan Ilg has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 9306922
    Abstract: A centralized authorization client, in a secure system, that references service provider specific on-behalf authorization protocol implementation records for generating access request messages for accessing user resources hosted by multiple service providers, is disclosed. The service provider-specific authorization implementation records include parameters for requesting user resources associated with a requesting user provided by a specific service provider. Applications running in the secure system can send access request messages through the authorization client to obtain authorization or access to user resources in multiple external service providers so the resources can be displayed, or otherwise manipulated, from application within the secure system. Once authorization is obtained for accessing the resources, the authorization client can store authorization tokens for use in persistent authorized access to multiple external service providers for resources owned by particular users.
    Type: Grant
    Filed: March 12, 2013
    Date of Patent: April 5, 2016
    Assignee: SAP SE
    Inventors: Klaus Herter, Stephan Ilg, Simon Dieterich, Johannes Woda
  • Publication number: 20140282880
    Abstract: A centralized authorization client, in a secure system, that references service provider specific on-behalf authorization protocol implementation records for generating access request messages for accessing user resources hosted by multiple service providers, is disclosed. The service provider-specific authorization implementation records include parameters for requesting user resources associated with a requesting user provided by a specific service provider. Applications running in the secure system can send access request messages through the authorization client to obtain authorization or access to user resources in multiple external service providers so the resources can be displayed, or otherwise manipulated, from application within the secure system. Once authorization is obtained for accessing the resources, the authorization client can store authorization tokens for use in persistent authorized access to multiple external service providers for resources owned by particular users.
    Type: Application
    Filed: March 12, 2013
    Publication date: September 18, 2014
    Applicant: SAP AG
    Inventors: Klaus Herter, Stephan Ilg, Simon Dieterich, Johannes Woda
  • Patent number: 8623459
    Abstract: The present invention provides a process for imparting decreased adhesion of biological material to the surface of a substrate comprises the following steps (i) oxidizing the surface of the substrate (ii) applying a composition comprising one or more ethylenically unsaturated compounds to the oxidized surface of the substrate and (iii) curing the composition in order to form a coating layer.
    Type: Grant
    Filed: April 11, 2008
    Date of Patent: January 7, 2014
    Assignee: BASF SE
    Inventors: Andreas Mühlebach, Erich Nyfeler, Stephan Ilg, Pascal Hayoz, Jens Möller
  • Patent number: 8414982
    Abstract: The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate, wherein in a first step a) a low-temperature plasma, a corona discharge or a flame is caused to act on the inorganic or organic substrate, in a second step b) one or more defined photoinitiators or mixtures of defined photoinitiators with monomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied, preferably at normal pressure, to the inorganic or organic substrate, in a third step c) using suitable methods those afore-mentioned substances are dried and/or irradiated with electromagnetic waves and, optionally, in a fourth step d) on the substrate so pretreated is applied a further coating.
    Type: Grant
    Filed: December 12, 2005
    Date of Patent: April 9, 2013
    Assignee: BASF SE
    Inventors: Pascal Hayoz, Stephan Ilg
  • Publication number: 20110319535
    Abstract: The invention relates to the use of highly sterically hindered nitroxyl radicals or of quinone methides or of mixtures thereof as in-can stabilizers for UV-curable resins.
    Type: Application
    Filed: September 7, 2011
    Publication date: December 29, 2011
    Inventors: PETER NESVADBA, André Fuchs, Stephan Ilg, Edith Pighetti
  • Patent number: 8067643
    Abstract: Compounds of the formula (I), L, L?, L?, L1, L?1, L?1, L2, L?2, L?2, L3, L?3, L?3, L4, L?4, L?4, L5, L?5, L?5, L6, L?6, L?6, L7, L?7, L?7, L8, L?8 and L?8 independently of one another are hydrogen or an organic substituent; and/or one or more of the pairs L3 and L5, L?3 and L?5 or L?3 and L?5 together denote a single bond, provided that the respective X, X? or X? is not a single bond; and/or L3 and L5, L?3 and L?5 or L?3 and L?5 together denote an organic linking group; and/or one or more of the pairs L1 and L3, L1 and L, L5 and L7, L?1 and L?3, L?1 and L?, L?5 and L?7, L?1 and L?3, L?1 and L?, or L?5 and L?7, together denote an organic linking group; provided that at least one of L, L?, L?, L1, L?1, L?1, L2, L?2, L?2, L3, L?3, L?3, L4, L?4, L?4, L5, L?5, L?5, L6, L?6, L?6, L7, L?7, L?7, L8, L?8 and L?8 is other than hydrogen; X, X? and X? independently of one another are a single bond, CRaRb O, S, NRc or NCORc; Ra, Rb and Rc independently of one another are hydrogen or an organic substituent; and Y is an ino
    Type: Grant
    Filed: April 4, 2007
    Date of Patent: November 29, 2011
    Assignee: BASF SE
    Inventors: Pascal Hayoz, Stephan Ilg
  • Patent number: 8012672
    Abstract: Compounds of the formula (I), wherein L1, L2, L3 and L4 independently of one another are hydrogen or an organic substituent; R is for example C1-C20alkyl, C5-C12cycloalkyl, C2-C20alkenyl, substituted C1-C20alkyl; X is O, S, NRa or NCORa; Ra is for example hydrogen or C1-C20alkyl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
    Type: Grant
    Filed: September 24, 2007
    Date of Patent: September 6, 2011
    Assignee: BASF SE
    Inventors: Pascal Hayoz, Jean-Luc Birbaum, Stephan Ilg
  • Patent number: 7901867
    Abstract: Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example independently of one another are phenyl substituted by C1-C20alkyl, halogen or OR3; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OH or OR3; or are —Ar4-A-Ar3; Ar3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OR3 or benzoyl; Ar4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C1-C20alkylene; X is CO, C(O)O, OC(O), O, S or NR3; L is C1-C20alkylene or C2-C20alkylene interrupted by one or more O; R3 is C1-C20alkyl or C1-C20hydroxyalkyl; and Y is an anion, are suitable as photolatent ac
    Type: Grant
    Filed: June 21, 2006
    Date of Patent: March 8, 2011
    Assignee: BASF SE
    Inventors: Jean-Pierre Wolf, Attila Latika, Jean-Luc Birbaum, Stephan Ilg, Pascal Hayoz
  • Publication number: 20100178512
    Abstract: A process for modifying the surface of an inorganic or organic substrate with strongly adherent nanoparticles is described, providing to the surface modified substrate durable effects like hydrophobicity, hydrophilicity, electrical conductivity, magnetic properties, flame retardance, color, adhesion, roughness, scratch resistance, UV-absorbance, antimicrobial properties, antifouling properties, antiprotein properties, antistatic properties, antifog properties, release properties. In this process, an optional first step a) a low-temperature plasma, ozonization, high energy irradiation, corona discharge or a flame is caused to act on the inorganic or organic substrate, and in a second step b) one or more defined nanoparticles or mixtures of defined nanoparticles with monomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied, preferably at normal pressure, to the inorganic or organic substrate.
    Type: Application
    Filed: November 26, 2007
    Publication date: July 15, 2010
    Applicant: CIBA CORPORATION
    Inventors: Thomas Giesenberg, Pascal Hayoz, Thomas Vogel, Andreas Muhlebach, Markus Frey, Stephan Ilg, Rachel Kohli Steck, Laurent Michau, Francois Rime
  • Patent number: 7723398
    Abstract: The invention relates to a radiation curable coating or an ink composition comprising a photoinitiator and a stabilizer blend of a sterically hindered nitroxyl radical and a quinone methide.
    Type: Grant
    Filed: April 12, 2006
    Date of Patent: May 25, 2010
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Stephan Ilg, Edith Pighetti, Peter Nesvadba, André Fuchs
  • Publication number: 20100112364
    Abstract: The present invention provides a process for imparting decreased adhesion of biological material to the surface of a substrate comprises the following steps (i) oxidizing the surface of the substrate (ii) applying a composition comprising one or more ethylenically unsaturated compounds to the oxidized surface of the substrate and (iii) curing the composition in order to form a coating layer.
    Type: Application
    Filed: April 11, 2008
    Publication date: May 6, 2010
    Applicant: CIBA CORPORATION
    Inventors: Andreas Muehlebach, Erich Nyfeler, Stephan Ilg, Pascal Hayoz, Jens Moeller
  • Publication number: 20100087563
    Abstract: Compounds of the formula (I), wherein L1, L2, L3 and L4 independently of one another are hydrogen or an organic substituent; R is for example C1-C20alkyl, C5-C12cycloalkyl, C2-C20alkenyl, substituted C1-C20alkyl; X is O, S, NRa or NCORa; Ra is for example hydrogen or C1-C20alkyl; and Y is an inorganic or organic anion; are suitable as photolatent acid generators.
    Type: Application
    Filed: September 24, 2007
    Publication date: April 8, 2010
    Inventors: Pascal Hayoz, Jean-Luc Birbaum, Stephan Ilg
  • Publication number: 20090208872
    Abstract: Compounds of the formula (I), (II), (III), (IV) and wherein, R is hydrogen, C1-C20alkyl; C2-C20alkyl interrupted by one or more O; is -L-X—R2 or -L-R2; R1 has for example one of the meanings as given for R; R2 is a monovalent sensitizer or photoinitiator moiety; Ar1 and Ar2 for example independently of one another are phenyl substituted by C1-C20alkyl, halogen or OR3; or are unsubstituted naphthyl, anthryl, phenanthryl or biphenylyl; or are naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OH or OR3; or are —Ar4-A-Ar3; Ar3 is unsubstituted phenyl naphthyl, anthryl, phenanthryl or biphenylyl; or is phenyl, naphthyl, anthryl, phenanthryl or biphenylyl substituted by C1-C20alkyl, OR3 or benzoyl; Ar4 is phenylene, naphthylene, anthrylene or phenanthrylene; A is a direct bond, S, O or C1-C20alkylene; X is CO, C(O)O, OC(O), O, S or NR3; L is C1-C20alkylene or C2-C20alkylene interrupted by one or more O; R3 is C1-C20alkyl or C1-C20hydroxyalkyl; and Y is an anion, are suitable as photolatent ac
    Type: Application
    Filed: June 21, 2006
    Publication date: August 20, 2009
    Inventors: Jean-Pierre Wolf, Attila Latika, Jean-Luc Birbaum, Stephan Ilg, Pascal Hayoz
  • Publication number: 20090197987
    Abstract: Compounds of the formula (I), L, L?, L?, L1, L?1, L?1, L2, L?2, L?2, L3, L?3, L?3, L4, L?4, L?4, L5, L?5, L?5, L6, L?6, L?6, L7, L?7, L?7, L8, L?8 and L?8 independently of one another are hydrogen or an organic substituent; and/or one or more of the pairs L3 and L5, L?3 and L?5 or L?3 and L?5 together denote a single bond, provided that the respective X, X? or X? is not a single bond; and/or L3 and L5, L?3 and L?5 or L?3 and L?5 together denote an organic linking group; and/or one or more of the pairs L1 and L3, L1 and L, L5 and L7, L?1 and L?3, L?1 and L?, L?5 and L?7, L?1 and L?3, L?1 and L?, or L?5 and L?7, together denote an organic linking group; provided that at least one of L, L?, L?, L1, L?1, L?1, L2, L?2, L?2, L3, L?3, L?3, L4, L?4, L?4, L5, L?5, L?5, L6, L?6, L?6, L7, L?7, L?7, L8, L?8 and L?8 is other than hydrogen; X, X? and X? independently of one another are a single bond, CRaRb O, S, NRc or NCORc; Ra, Rb and Rc independently of one another are hydrogen or an organic substituent; and Y is an ino
    Type: Application
    Filed: April 4, 2007
    Publication date: August 6, 2009
    Inventors: Pascal Hayoz, Stephan Ilg
  • Publication number: 20090176906
    Abstract: The invention relates to a radiation curable coating or an ink composition comprising a photoinitiator and a stabilizer blend of a sterically hindered nitroxyl radical and a quinone methide.
    Type: Application
    Filed: April 12, 2006
    Publication date: July 9, 2009
    Inventors: Stephan Ilg, Edith Pighetti, Peter Nesvadba, André Fuchs
  • Publication number: 20090092768
    Abstract: The invention relates to a process for the production of strongly adherent coatings on an inorganic or organic substrate, wherein in a first step a) a low-temperature plasma, a corona discharge or a flame is caused to act on the inorganic or organic substrate, in a second step b) one or more defined photoinitiators or mixtures of defined photoinitiators with monomers, containing at least one ethylenically unsaturated group, or solutions, suspensions or emulsions of the afore-mentioned substances, are applied, preferably at normal pressure, to the inorganic or organic substrate, in a third step c) using suitable methods those afore-mentioned substances are dried and/or irradiated with electromagnetic waves and, optionally, in a fourth step d) on the substrate so pretreated is applied a further coating.
    Type: Application
    Filed: December 12, 2005
    Publication date: April 9, 2009
    Inventors: Pascal Hayoz, Stephan Ilg
  • Publication number: 20090076878
    Abstract: A system may include reception of an indication of a user interface event, determination of an instruction to assign a person to a task based on the user interface event, calling of a service of a user interface controller object to assign the person to the task based on the determined instruction, calling of a service of a business object associated with the task to assign the person to the task, update of the business object to assign the person to the task, synchronization of the user interface controller object with the updated business object, and generation of a user interface to present a Gantt chart representing the updated business object.
    Type: Application
    Filed: September 19, 2007
    Publication date: March 19, 2009
    Inventors: Matthias Woerner, Stephan Ilg, Georg V. Heryschek
  • Patent number: 7462650
    Abstract: The Invention relates to novel ketones of formulae (I) and (II) wherein R1, R2, R3 and R4 are, for example, C1-C8alkyl, R5 is, for example, hydrogen, A is CI, Br, -0-R7, —NR8R9 or —S—R16, A? is —O—, —NH— or —NR8—, X and Y are each independently of the other —O—R10 or —N(R11)(R12), n is an integer from 1 to 10, R6 is, for example, an n-valent radical of linear or branched C2-C20alkyl the carbon chain of which may be interrupted by cyclohexanediyl, phenylene, —CH(OH)—, —C(C2H5)(CH2—CH2—OH)—, —C(CH3)(CH2—CH2—OH)—, —C(CH2—CH2—OH)2—, —N(CH3)—, —N(C2H5)—, —N(CH2—CH2—OH)—, —CO—O—, —O—CO—, —P(CH2—CH2—OH)—, —P(O)(CH2—CH2—OH)—, -0-P(O—CH2—CH2—OH)—O—, -0-P(O)(0-CH2—CH2—OH)—O—, —O-cyclohexanediyl-C(CH3)2-Cyclohexanediyl-O—, —O-phenylene-C(CH3)2-phenylene-O—, —O-phenylene-CH2-phenylene-O—, —Si(CH3)2—, -0-Si(CH3)2—O—, —O—Si(CH3)(0-CH3)—O—, —Si(CH3)(R17)—O—Si(CH3)(R18)—, 5-(2-hydroxyethyl)-[1,3,5]triazinane-2,4,6-trione-1,3-diyl and/or by from one to nine oxygen atoms.
    Type: Grant
    Filed: May 4, 2004
    Date of Patent: December 9, 2008
    Assignee: Ciba Specialty Chemicals Corporation
    Inventors: Reinhard H. Sommerlade, Rinaldo Hüsler, Stephan Ilg, André Fuchs, Souâd Boulmaâz, Jean-Luc Birbaum
  • Publication number: 20080299324
    Abstract: Printed images with excellent image quality, adhesion and durability are prepared by applying an ink to a printable surface which contains one or more components containing reactive groups followed by exposing the surface with the applied ink to ultra-violet light, high intensity visible light, or electron beam radiation. The surfaces of typically non-adherent substrates, such as polyolefins and PET are rendered adherent using this method without plasma, corona or flame treatment. The reactive groups include ethylenically unsaturated groups such as vinyl, vinyl ether, allyl, methacrylate, acrylate etc, epoxides, hydroxyl, amines, acidic groups, basic groups and free radical generating groups. The images exhibit good resolution, edge acuity and permanence.
    Type: Application
    Filed: May 27, 2008
    Publication date: December 4, 2008
    Inventors: Andrew S. Naisby, Sebastien Villeneuve, Stephan Ilg, Amalia Di Matteo
  • Publication number: 20070225397
    Abstract: The invention relates to the use of highly sterically hindered nitroxyl radicals as in-can stabilizers for UV-curable resins. The present invention further relates to the use of quinone methides as in-can stabilizers for UV-curable resins.
    Type: Application
    Filed: August 24, 2005
    Publication date: September 27, 2007
    Inventors: Peter Nasvadba, Andre Fuchs, Stephan Ilg, Edith Pighetti