Patents by Inventor Stephan K. Park

Stephan K. Park has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Integration of an ion implant hard mask structure into a process for fabricating high density memory cells
    Patent number: 6486029
    Abstract: A process for fabricating a memory cell in a two-bit EEPROM device, the process includes forming an ONO layer overlying a semiconductor substrate, depositing a hard mask overlying the ONO layer, and patterning the hard mask. Preferably, the hard mask includes a material selected from the group consisting of tungsten, titanium, titanium nitride, polysilicon, silicon, silicon nitride, silicon oxi-nitride, and silicon rich nitride. In one preferred embodiment, the process further includes implanting the semiconductor substrate with a p-type dopant at an angle substantially normal to the principal surface of the semiconductor substrate and annealing the semiconductor substrate upon implanting the semiconductor substrate with a p-type dopant. In one preferred embodiment, the process further includes implanting the semiconductor substrate with an n-type dopant.
    Type: Grant
    Filed: July 28, 2000
    Date of Patent: November 26, 2002
    Assignee: Advanced Micro Devices, Inc.
    Inventors: David K. Foote, Bharath Rangarajan, Stephan K. Park, Fei Wang, Dawn M. Hopper, Jack Thomas, Mark Chang, Mark Ramsbey