Patents by Inventor Stephan Koelink
Stephan Koelink has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20120069309Abstract: A fluid handling structure successively having, at a boundary from a space configured to contain immersion fluid to a region external to the fluid handling structure: a meniscus pinning feature to resist passage of immersion fluid in a radially outward direction from the space; and a fluid supply opening radially outward of the meniscus pinning feature to supply a fluid soluble in the immersion fluid which on dissolution into the immersion fluid lowers the surface tension of the immersion fluid.Type: ApplicationFiled: August 22, 2011Publication date: March 22, 2012Applicant: ASML NETHERLANDS B.V.Inventors: Paul WILLEMS, Nicolaas Ten Kate, Stephan Koelink, Pieter Jacob Kramer, Anthonie Kuijper, Alexander Nikolov Zdravkov, Rogier Hendrikus Magdalena Cortie
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Patent number: 7271873Abstract: A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.Type: GrantFiled: May 22, 2006Date of Patent: September 18, 2007Assignee: ASML Netherlands B.V.Inventors: Nicolas Alban Lallemant, Martinus Cornelis Maria Verhagen, Marcel Beckers, Ronald Stultiens, Pascal Antonius Smits, Wladimir Fransiscus Gerardus Maria Hertog, David Theodorus Willy Van Der Plas, Stephan Koelink, Henk Krus
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Patent number: 7148951Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation, and a first support for supporting a patterning device. The patterning device serves to pattern the beam of radiation. The apparatus includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and an interferometer measurement system for providing an interferometric measurement beam extending along an axis in an elongated volume of gas extending below the projection system. The apparatus also includes a gas conditioning structure for providing a conditioned gas flow in the volume. The gas conditioning structure includes a plurality of gas guiding vanes disposed at an outlet of the structure for guiding the gas flow to the volume. The gas guiding vanes are shaped continuously and are oriented diverging away from the axis of the volume.Type: GrantFiled: October 25, 2004Date of Patent: December 12, 2006Assignee: ASML Netherlands B.V.Inventors: Nicolas Lallemant, Marcel Beckers, Stephan Koelink, Rob Jansen, Wladimir Fransiscus Gerardus Maria Hertog, David Theodorus Willy Van Der Plas
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Publication number: 20060232754Abstract: A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.Type: ApplicationFiled: May 22, 2006Publication date: October 19, 2006Applicant: ASML Netherlands B.V.Inventors: Nicolas Lallemant, Martinus Verhagen, Marcel Beckers, Ronald Stultiens, Pascal Smits, Wladimir Fransiscus Hertog, David Van Der Plas, Stephan Koelink, Henk Krus
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Patent number: 7072021Abstract: A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.Type: GrantFiled: June 28, 2004Date of Patent: July 4, 2006Assignee: ASML Netherlands B.V.Inventors: Nicolas Alban Lallemant, Martinus Cornelis Maria Verhagen, Marcel Beckers, Ronald Stultiens, Pascal Antonius Smits, Wladimir Franciscus Gerardus Maria Hertog, David Theodorus Willy Van Der Plas, Stephan Koelink, Henk Krus
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Publication number: 20060087631Abstract: A lithographic apparatus includes a radiation system for providing a beam of radiation, and a first support for supporting a patterning device. The patterning device serves to pattern the beam of radiation. The apparatus includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and an interferometer measurement system for providing an interferometric measurement beam extending along an axis in an elongated volume of gas extending below the projection system. The apparatus also includes a gas conditioning structure for providing a conditioned gas flow in the volume. The gas conditioning structure includes a plurality of gas guiding vanes disposed at an outlet of the structure for guiding the gas flow to the volume. The gas guiding vanes are shaped continuously and are oriented diverging away from the axis of the volume.Type: ApplicationFiled: October 25, 2004Publication date: April 27, 2006Applicant: ASML NETHERLANDS B.V.Inventors: Nicolas Lallemant, Marcel Beckers, Stephan Koelink, Rob Jansen, Wladimir Fransiscus Hertog, David Van Der Plas
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Publication number: 20050254025Abstract: A lithographic apparatus is disclosed. The apparatus includes an illuminator for conditioning a beam of radiation, and a first support for supporting a patterning device that serves to pattern the beam of radiation according to a desired pattern. The apparatus also includes a second support for supporting a substrate, a projection system for projecting the patterned beam onto a target portion of the substrate, and at least one gas generator for generating a conditioned gas flow. The gas generator includes a guiding element for guiding the gas flow to a lower volume generally located below a lower surface of the projection system and to a volume between the lower surface and the substrate. The guiding element directs the gas flow in a generally downward direction and then in a direction generally parallel to the lower surface.Type: ApplicationFiled: June 28, 2004Publication date: November 17, 2005Applicant: ASML NETHERLANDS B.V.Inventors: Nicolas Lallemant, Martinus Verhagen, Marcel Beckers, Ronald Stultiens, Pascal Smits, Wladimir Fransiscus Hertog, David Theodorus Van Der Plas, Stephan Koelink, Henk Krus