Patents by Inventor Stephan Ochs

Stephan Ochs has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 7707855
    Abstract: A known method for producing synthetic quartz glass with a predetermined hydroxyl group content comprises the following steps: a porous SiO2 soot body is produced by flame hydrolysis or oxidation of a silicon-containing start compound and by layerwise deposition of SiO2 particles on a rotating support; the soot body is subjected to a dehydration treatment in a reaction gas-containing drying atmosphere at a drying temperature for removing hydroxyl groups; and the SiO2 soot body is vitrified into a body consisting of the synthetic quartz glass. Starting from this, and in order to permit a reproducible and reliable manufacture of synthetic, UV-radiation resistant quartz glass with predetermined hydroxyl group content and low chlorine content, it is suggested according to the invention that the dehydration treatment according to method step (b) comprises a drying phase during which ozone is used as the reaction gas, whereby the ozone content of the drying atmosphere is between 0.5% by vol. and 10% by vol.
    Type: Grant
    Filed: May 9, 2007
    Date of Patent: May 4, 2010
    Assignee: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Stephan Ochs, Bodo Kuehn
  • Patent number: 7501367
    Abstract: To provide an optical component of quartz glass for use in a projection lens system for immersion lithography with an operating wavelength below 250 nm, which is optimized for use with linearly polarized UV laser radiation and particularly with respect to compaction and birefringence induced by anisotropic density change, it is suggested according to the invention that the quartz glass should show the combination of several properties: particularly a glass structure essentially without oxygen defects, a mean content of hydroxyl groups of less than 60 wt ppm, a mean content of fluorine of less than 10 wt ppm, a mean content of chlorine of less than 1 wt ppm. A method for producing such an optical component comprises the following method steps: producing and drying an SiO2 soot body under reducing conditions and treating the dried soot body before or during vitrification with a reagent reacting with oxygen defects of the quartz glass structure.
    Type: Grant
    Filed: April 13, 2006
    Date of Patent: March 10, 2009
    Assignee: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Bodo Kuehn, Stephan Ochs, Steffen Kaiser, Denis Kassube
  • Publication number: 20070261442
    Abstract: A known method for producing synthetic quartz glass with a predetermined hydroxyl group content comprises the following steps: a porous SiO2 soot body is produced by flame hydrolysis or oxidation of a silicon-containing start compound and by layerwise deposition of SiO2 particles on a rotating support; the soot body is subjected to a dehydration treatment in a reaction gas-containing drying atmosphere at a drying temperature for removing hydroxyl groups; and the SiO2 soot body is vitrified into a body consisting of the synthetic quartz glass. Starting from this, and in order to permit a reproducible and reliable manufacture of synthetic, UV-radiation resistant quartz glass with predetermined hydroxyl group content and low chlorine content, it is suggested according to the invention that the dehydration treatment according to method step (b) comprises a drying phase during which ozone is used as the reaction gas, whereby the ozone content of the drying atmosphere is between 0.5% by vol. and 10% by vol.
    Type: Application
    Filed: May 9, 2007
    Publication date: November 15, 2007
    Applicant: Heraeus Quarzglas GmbH & Co. KG
    Inventors: Stephan Ochs, Bodo Kuehn