Patents by Inventor Stephan Pindl

Stephan Pindl has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11926521
    Abstract: An infrared emitter with a glass lid for emitting infrared radiation comprises a package enclosing a cavity, wherein a first part is transparent for infrared radiation and a second part comprises a glass material and a heating structure configured for emitting the infrared radiation, wherein the heating structure is arranged in the cavity between the first part and the second part of the package.
    Type: Grant
    Filed: January 15, 2021
    Date of Patent: March 12, 2024
    Assignee: INFINEON TECHNOLOGIES AG
    Inventors: Stephan Pindl, Carsten Ahrens, Stefan Jost, Ulrich Krumbein, Matthias Reinwald
  • Patent number: 11908763
    Abstract: An apparatus includes a semiconductor-based substrate with a functional structure that is formed in or on the semiconductor-based substrate. The apparatus includes a frame structure surrounding the functional structure and includes a coating that covers the functional structure and is delimited by the frame structure.
    Type: Grant
    Filed: September 23, 2021
    Date of Patent: February 20, 2024
    Assignee: INFINEON TECHNOLOGIES AG
    Inventors: Prashanth Makaram, John Cooper, Joerg Ortner, Stephan Pindl, Caterina Travan, Alexander Zoepfl
  • Patent number: 11652022
    Abstract: A power semiconductor device includes: a semiconductor body having a front side and a backside and configured to conduct a load current between the front side and the backside; and a plurality of control cells configured to control the load current. Each control cell is at least partially included in the semiconductor body at the front side and includes a gate electrode that is electrically insulated from the semiconductor body by a gate insulation layer. The gate insulation layer is or includes a first boron nitride layer.
    Type: Grant
    Filed: July 31, 2020
    Date of Patent: May 16, 2023
    Assignee: Infineon Technologies AG
    Inventors: Josef Schaetz, Dethard Peters, Stephan Pindl, Hans-Joachim Schulze
  • Patent number: 11608265
    Abstract: A method for providing a semiconductor layer arrangement on a substrate which comprises providing a semiconductor layer arrangement having a functional layer and a semiconductor substrate layer, attaching the semiconductor layer arrangement to a glass substrate layer such that the functional layer is arranged between the glass substrate layer and the semiconductor substrate layer, and removing the semiconductor substrate layer at least partially such that the glass substrate layer substitutes the semiconductor substrate layer as the substrate of the semiconductor layer arrangement.
    Type: Grant
    Filed: June 24, 2021
    Date of Patent: March 21, 2023
    Assignee: Infineon Technologies AG
    Inventors: Stephan Pindl, Carsten Ahrens, Stefan Jost, Ulrich Krumbein
  • Patent number: 11402556
    Abstract: A method for manufacturing integrated IR (IR=infrared) emitter elements having an optical filter comprises back side etching through a carrier substrate, forming adhesive spacer elements on a conductive layer on the carrier substrate, placing a filter substrate having a filter carrier substrate and a filter layer on the adhesive spacer elements, fixing the adhesive spacer elements to the carrier substrate and the filter substrate by curing, pre-dicing through the filter substrate for exposing the contact pads of the structured conductive layer, and dicing through the frame structure in the carrier substrate for separating the integrated IR emitter elements having the optical filter.
    Type: Grant
    Filed: February 3, 2020
    Date of Patent: August 2, 2022
    Assignee: INFINEON TECHNOLOGIES AG
    Inventors: Stephan Pindl, Matthias Steiert
  • Publication number: 20220013424
    Abstract: An apparatus includes a semiconductor-based substrate with a functional structure that is formed in or on the semiconductor-based substrate. The apparatus includes a frame structure surrounding the functional structure and includes a coating that covers the functional structure and is delimited by the frame structure.
    Type: Application
    Filed: September 23, 2021
    Publication date: January 13, 2022
    Inventors: Prashanth Makaram, John Cooper, Joerg Ortner, Stephan Pindl, Caterina Travan, Alexander Zoepfl
  • Publication number: 20220009771
    Abstract: A method for providing a semiconductor layer arrangement on a substrate which comprises providing a semiconductor layer arrangement having a functional layer and a semiconductor substrate layer, attaching the semiconductor layer arrangement to a glass substrate layer such that the functional layer is arranged between the glass substrate layer and the semiconductor substrate layer, and removing the semiconductor substrate layer at least partially such that the glass substrate layer substitutes the semiconductor substrate layer as the substrate of the semiconductor layer arrangement.
    Type: Application
    Filed: June 24, 2021
    Publication date: January 13, 2022
    Inventors: Stephan Pindl, Carsten Ahrens, Stefan Jost, Ulrich Krumbein
  • Patent number: 11211298
    Abstract: According to an embodiment, a sensor package includes an electrically insulating substrate including a cavity in the electrically insulating substrate, an ambient sensor, an integrated circuit die embedded in the electrically insulating substrate, and a plurality of conductive interconnect structures coupling the ambient sensor to the integrated circuit die. The ambient sensor is supported by the electrically insulating substrate and arranged adjacent the cavity.
    Type: Grant
    Filed: October 16, 2019
    Date of Patent: December 28, 2021
    Assignee: INFINEON TECHNOLOGIES AG
    Inventors: Stephan Pindl, Daniel Lugauer, Dominic Maier, Alfons Dehe
  • Patent number: 11189539
    Abstract: An apparatus includes a semiconductor-based substrate with a functional structure that is formed in or on the semiconductor-based substrate. The apparatus includes a frame structure surrounding the functional structure and includes a coating that covers the functional structure and is delimited by the frame structure.
    Type: Grant
    Filed: June 6, 2019
    Date of Patent: November 30, 2021
    Assignee: INFINEON TECHNOLOGIES AG
    Inventors: Prashanth Makaram, John Cooper, Joerg Ortner, Stephan Pindl, Caterina Travan, Alexander Zoepfl
  • Publication number: 20210246016
    Abstract: An infrared emitter with a glass lid for emitting infrared radiation comprises a package enclosing a cavity, wherein a first part is transparent for infrared radiation and a second part comprises a glass material and a heating structure configured for emitting the infrared radiation, wherein the heating structure is arranged in the cavity between the first part and the second part of the package.
    Type: Application
    Filed: January 15, 2021
    Publication date: August 12, 2021
    Inventors: Stephan Pindl, Carsten Ahrens, Stefan Jost, Ulrich Krumbein, Matthias Reinwald
  • Patent number: 11081551
    Abstract: In accordance with an embodiment, a method for producing a graphene-based sensor includes providing a carrier substrate; forming a carrier structure on the carrier substrate, wherein one or more separating structures are formed on an upper side of the carrier structure; and performing a wet chemical transfer of a graphene layer onto the upper side of the carrier structure that comprises the separating structures, where the separating structures and a tear strength of the graphene layer are matched to one another such that the graphene layer respectively tears at the separating structures during the wet chemical transfer.
    Type: Grant
    Filed: August 22, 2019
    Date of Patent: August 3, 2021
    Assignee: INFINEON TECHNOLOGIES AG
    Inventors: Christoph Glacer, Stephan Pindl, Werner Weber, Sebastian Wittmann
  • Patent number: 10955599
    Abstract: A light emitter device includes an emitter component including a heater structure arranged on a membrane structure. The membrane structure is located above a first cavity. Additionally, the first cavity is located between the membrane structure and at least a portion of a supporting substrate of the emitter component. Further, the heater structure is configured to emit light, if a predefined current flows through the heater structure. Additionally, the light emitter device includes a lid substrate having a recess. The lid substrate is attached to the emitter component so that the recess forms a second cavity between the membrane structure and the lid substrate. Further, a pressure in the second cavity is less than 100 mbar.
    Type: Grant
    Filed: March 31, 2017
    Date of Patent: March 23, 2021
    Assignee: Infineon Technologies AG
    Inventors: Stephan Pindl, Christoph Glacer
  • Publication number: 20210066495
    Abstract: A power semiconductor device includes a semiconductor body having a front side surface, and a first passivation layer arranged above the front side surface. The first passivation layer is a polycrystalline diamond layer.
    Type: Application
    Filed: August 27, 2020
    Publication date: March 4, 2021
    Inventors: Edward Fuergut, Philipp Sebastian Koch, Stephan Pindl, Hans-Joachim Schulze
  • Publication number: 20210035882
    Abstract: A power semiconductor device includes: a semiconductor body having a front side and a backside and configured to conduct a load current between the front side and the backside; and a plurality of control cells configured to control the load current. Each control cell is at least partially included in the semiconductor body at the front side and includes a gate electrode that is electrically insulated from the semiconductor body by a gate insulation layer. The gate insulation layer is or includes a first boron nitride layer.
    Type: Application
    Filed: July 31, 2020
    Publication date: February 4, 2021
    Inventors: Josef Schaetz, Dethard Peters, Stephan Pindl, Hans-Joachim Schulze
  • Publication number: 20210028119
    Abstract: A power semiconductor device is proposed. The power semiconductor device includes a semiconductor substrate. The power semiconductor device further includes an electrically conducting first layer. At least part of the electrically conducting first layer includes pores. The power semiconductor device further includes an electrically conducting second layer. The electrically conducting second layer is arranged between the semiconductor substrate and the electrically conducting first layer. The pores are at least partially filled with a phase change material.
    Type: Application
    Filed: July 24, 2020
    Publication date: January 28, 2021
    Inventors: Fabian Streb, Anton Mauder, Stephan Pindl, Hans-Joachim Schulze
  • Patent number: 10875763
    Abstract: The present disclosure relates to an apparatus having a substrate arrangement with a first circuit arrangement that heats up during operation and a second circuit arrangement that is integrated into a substrate material of the substrate arrangement. Further, the apparatus has a cavity structure that is arranged between the first and the second circuit arrangement, said cavity structure being formed in the substrate material and having a pressure that is lower than an ambient atmospheric pressure.
    Type: Grant
    Filed: July 2, 2019
    Date of Patent: December 29, 2020
    Assignee: INFINEON TECHNOLOGIES AG
    Inventor: Stephan Pindl
  • Patent number: 10829368
    Abstract: A method for manufacturing a MEMS device is disclosed. Moreover a MEMS device and a module including a MEMS device are disclosed. An embodiment includes a method for manufacturing MEMS devices includes forming a MEMS stack over a first main surface of a substrate, forming a polymer layer over a second main surface of the substrate and forming a first opening in the polymer layer and the substrate such that the first opening abuts the MEMS stack.
    Type: Grant
    Filed: July 11, 2019
    Date of Patent: November 10, 2020
    Assignee: Infineon Technologies AG
    Inventors: Alfons Dehe, Stephan Pindl, Bernhard Knott, Carsten Ahrens
  • Publication number: 20200249380
    Abstract: A method for manufacturing integrated IR (IR=infrared) emitter elements having an optical filter comprises back side etching through a carrier substrate, forming adhesive spacer elements on a conductive layer on the carrier substrate, placing a filter substrate having a filter carrier substrate and a filter layer on the adhesive spacer elements, fixing the adhesive spacer elements to the carrier substrate and the filter substrate by curing, pre-dicing through the filter substrate for exposing the contact pads of the structured conductive layer, and dicing through the frame structure in the carrier substrate for separating the integrated IR emitter elements having the optical filter.
    Type: Application
    Filed: February 3, 2020
    Publication date: August 6, 2020
    Inventors: Stephan Pindl, Matthias Steiert
  • Patent number: 10694584
    Abstract: A method for producing an infrared emitter arrangement is provided. The method includes providing a carrier. The carrier includes at least one infrared emitter structure at a first side of the carrier and at least one cutout at a second side of the carrier, said second side being situated opposite the first side of the carrier, wherein the at least one cutout extends from the second side of the carrier in the direction of the at least one infrared emitter structure. The method further includes securing an infrared filter layer structure at the second side of the carrier in such a way that the at least one cutout separates the at least one infrared emitter structure from the infrared filter layer structure.
    Type: Grant
    Filed: November 21, 2017
    Date of Patent: June 23, 2020
    Assignee: Infineon Technologies AG
    Inventors: Stephan Pindl, Daniel Porwol, Johann Strasser
  • Publication number: 20200066845
    Abstract: In accordance with an embodiment, a method for producing a graphene-based sensor includes providing a carrier substrate; forming a carrier structure on the carrier substrate, wherein one or more separating structures are formed on an upper side of the carrier structure; and performing a wet chemical transfer of a graphene layer onto the upper side of the carrier structure that comprises the separating structures, where the separating structures and a tear strength of the graphene layer are matched to one another such that the graphene layer respectively tears at the separating structures during the wet chemical transfer.
    Type: Application
    Filed: August 22, 2019
    Publication date: February 27, 2020
    Inventors: Christoph Glacer, Stephan Pindl, Werner Weber, Sebastian Wittmann