Abstract: A composite material includes: a substrate and a polymer layer which are interconnected by an adhesion promoter layer. The adhesion promoter layer is obtainable by plasma-enhanced chemical vapor deposition (PE-CVD) at least partially using a mixture of precursor compounds containing an unsaturated hydrocarbon and an organosilicon compound. In an embodiment, the substrate includes a metal substrate or a polymer substrate.

Abstract: A method includes using a sealing element to dynamically seal a sealing body in the presence of a lubricant. The sealing element has an elastomeric base body and a plasma coating. The coating includes the elements carbon, oxygen, silicon, and hydrogen. The coating has the following properties at least at the surface: the amount ratio C:Si (at %/at %) is >5, the amount ratio O:Si (at %/at %) is >3, and the surface energy is <50 mN/m. In an embodiment, the coating includes the element fluorine.

Abstract: A method includes using a sealing element to dynamically seal a sealing body in the presence of a lubricant. The sealing element has an elastomeric base body and a plasma coating. The coating includes the elements carbon, oxygen, silicon, and hydrogen. The coating has the following properties at least at the surface: the amount ratio C:Si (at %/at %) is >5, the amount ratio O:Si (at %/at %) is >3, and the surface energy is <50 mN/m. In an embodiment, the coating includes the element fluorine.

Abstract: A composite material includes: a substrate and a polymer layer which are interconnected by an adhesion promoter layer. The adhesion promoter layer is obtainable by plasma-enhanced chemical vapor deposition (PE-CVD) at least partially using a mixture of precursor compounds containing an unsaturated hydrocarbon and an organosilicon compound. In an embodiment, the substrate includes a metal substrate or a polymer substrate.

Abstract: A plasma-treated planar textile structure containing synthetic fibers and a method for manufacturing the structure, wherein the structure has a high initial wettability, expressed by a height of rise of at least 80 mm after immersion for 30 minutes in an aqueous potassium hydroxide solution, and, upon storage for three months in air at 25° C., has a high initial wettability, expressed by a height of rise of at least 75 mm after immersion for 30 minutes in an aqueous potassium hydroxide solution. The plasma-treated planar textile structures preferably have a high hydrophilic stability when stored in alkaline media. The plasma-treated planar textile structures can be used, in particular, as separators for electrochemical energy storage devices.