Patents by Inventor Stephan Six
Stephan Six has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Patent number: 11328831Abstract: Treating a reflective optical element (104) for the EUV wavelength range that has a reflective coating on a substrate. The reflective optical element in a holder (106) is irradiated with at least one radiation pulse of a radiation source (102) having a duration of between 1 ?s and 1 s. At least one radiation source (102) and the reflective optical element move relative to one another. Preferably, this is carried out directly after applying the reflective coating in a coating chamber (100). Reflective optical elements of this type are suitable in particular for use in EUV lithography or in EUV inspection of masks or wafers, for example.Type: GrantFiled: July 31, 2018Date of Patent: May 10, 2022Assignee: CARL ZEISS SMT GMBHInventors: Christian Grasse, Martin Hermann, Stephan Six, Joern Weber, Ralf Winter, Oliver Dier, Vitaliy Shklover, Kerstin Hild, Sebastian Strobel
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Patent number: 11162778Abstract: A method for determining material removal by an ion beam (3) on a test workpiece (7) which is disposed in a machining chamber (5) of a housing (6) of a device (1) for beam machining, wherein the test workpiece (7) has a substrate (8) and a layer (9) applied to the substrate. The method includes a) optically determining a layer thickness (d1) of the layer applied to the substrate, b) removing material of the layer from the test workpiece with the ion beam, c) optically determining the layer thickness (d2) of the layer applied to the substrate, and d) determining the material removal by comparing the layer thickness determined in step a) with the layer thickness determined in step c). Also disclosed is a device (1) for beam machining a workpiece (2) with which the method can be carried out.Type: GrantFiled: September 23, 2019Date of Patent: November 2, 2021Assignee: CARL ZEISS SMT GMBHInventors: Steffen Bezold, Stephan Six
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Publication number: 20200033115Abstract: A method for determining material removal by an ion beam (3) on a test workpiece (7) which is disposed in a machining chamber (5) of a housing (6) of a device (1) for beam machining, wherein the test workpiece (7) has a substrate (8) and a layer (9) applied to the substrate. The method includes a) optically determining a layer thickness (d1) of the layer applied to the substrate, b) removing material of the layer from the test workpiece with the ion beam, c) optically determining the layer thickness (d2) of the layer applied to the substrate, and d) determining the material removal by comparing the layer thickness determined in step a) with the layer thickness determined in step c). Also disclosed is a device (1) for beam machining a workpiece (2) with which the method can be carried out.Type: ApplicationFiled: September 23, 2019Publication date: January 30, 2020Inventors: Steffen BEZOLD, Stephan SIX
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Publication number: 20190146122Abstract: The present disclosure relates to an optical arrangement for use in an optical imaging process. The optical arrangement includes an optical element, an immersion zone and a liquid repelling device. During the optical imaging process, the immersion zone is located adjacent to the optical element and is filled with an immersion liquid. The optical element has a first surface region and a second surface region. During the optical imaging process, the first surface region is wetted by the immersion liquid. At least temporarily during the optical imaging process, the liquid repelling device generates an electrical field in the region of the second surface. The electrical field being is adapted to cause a repellent force on parts of the immersion liquid which are responsive to the electrical field and inadvertently contact the second surface region. The repellent force has a direction to drive away the parts of the immersion liquid from the second surface region.Type: ApplicationFiled: October 15, 2018Publication date: May 16, 2019Inventor: Stephan Six
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Publication number: 20190035512Abstract: Treating a reflective optical element (104) for the EUV wavelength range that has a reflective coating on a substrate. The reflective optical element in a holder (106) is irradiated with at least one radiation pulse of a radiation source (102) having a duration of between 1 ?s and 1 s. At least one radiation source (102) and the reflective optical element move relative to one another. Preferably, this is carried out directly after applying the reflective coating in a coating chamber (100). Reflective optical elements of this type are suitable in particular for use in EUV lithography or in EUV inspection of masks or wafers, for example.Type: ApplicationFiled: July 31, 2018Publication date: January 31, 2019Inventors: Christian Grasse, Martin Hermann, Stephan Six, Joern WEBER, Ralf Winter, Oliver Dier, Vitaliy Shklover, Kerstin Hild, Sebastian Strobel
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Patent number: 10107943Abstract: The present disclosure relates to an optical arrangement for use in an optical imaging process. The optical arrangement includes an optical element, an immersion zone and a liquid repelling device. During the optical imaging process, the immersion zone is located adjacent to the optical element and is filled with an immersion liquid. The optical element has a first surface region and a second surface region. During the optical imaging process, the first surface region is wetted by the immersion liquid. At least temporarily during the optical imaging process, the liquid repelling device generates an electrical field in the region of the second surface. The electrical field being is adapted to cause a repellent force on parts of the immersion liquid which are responsive to the electrical field and inadvertently contact the second surface region. The repellent force has a direction to drive away the parts of the immersion liquid from the second surface region.Type: GrantFiled: May 1, 2017Date of Patent: October 23, 2018Assignee: Carl Zeiss SMT GmbHInventor: Stephan Six
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Publication number: 20170329055Abstract: The present disclosure relates to an optical arrangement for use in an optical imaging process. The optical arrangement includes an optical element, an immersion zone and a liquid repelling device. During the optical imaging process, the immersion zone is located adjacent to the optical element and is filled with an immersion liquid. The optical element has a first surface region and a second surface region. During the optical imaging process, the first surface region is wetted by the immersion liquid. At least temporarily during the optical imaging process, the liquid repelling device generates an electrical field in the region of the second surface. The electrical field being is adapted to cause a repellent force on parts of the immersion liquid which are responsive to the electrical field and inadvertently contact the second surface region. The repellent force has a direction to drive away the parts of the immersion liquid from the second surface region.Type: ApplicationFiled: May 1, 2017Publication date: November 16, 2017Inventor: Stephan Six
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Publication number: 20170322343Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.Type: ApplicationFiled: July 24, 2017Publication date: November 9, 2017Inventors: Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six
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Patent number: 9733395Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.Type: GrantFiled: May 20, 2011Date of Patent: August 15, 2017Assignee: Carl Zeiss SMT GmbHInventors: Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six
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Patent number: 9645513Abstract: An optical arrangement for use in an optical imaging process includes an optical element, an immersion zone and a liquid repelling device. During the optical imaging process, the immersion zone is located adjacent to the optical element and is filled with an immersion liquid. The optical element has a first surface region and a second surface region. During the optical imaging process, the first surface region is wetted by the immersion liquid. At least temporarily during the optical imaging process, the liquid repelling device generates an electrical field in the region of the second surface. The electrical field being is adapted to cause a repellent force on parts of the immersion liquid which are responsive to the electrical field and inadvertently contact the second surface region. The repellent force has a direction to drive away the parts of the immersion liquid from the second surface region.Type: GrantFiled: September 22, 2014Date of Patent: May 9, 2017Assignee: Carl Zeiss SMT GmbHInventor: Stephan Six
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Patent number: 8934079Abstract: An optical arrangement for use in an optical imaging process includes an optical element, an immersion zone and a liquid repelling device. During the optical imaging process, the immersion zone is located adjacent to the optical element and is filled with an immersion liquid. The optical element has a first surface region and a second surface region. During the optical imaging process, the first surface region is wetted by the immersion liquid. At least temporarily during the optical imaging process, the liquid repelling device generates an electrical field in the region of the second surface. The electrical field being is adapted to cause a repellent force on parts of the immersion liquid which are responsive to the electrical field and inadvertently contact the second surface region. The repellent force has a direction to drive away the parts of the immersion liquid from the second surface region.Type: GrantFiled: October 31, 2011Date of Patent: January 13, 2015Assignee: Carl Zeiss SMT GmbHInventor: Stephan Six
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Publication number: 20150009565Abstract: The present disclosure relates to an optical arrangement for use in an optical imaging process. The optical arrangement includes an optical element, an immersion zone and a liquid repelling device. During the optical imaging process, the immersion zone is located adjacent to the optical element and is filled with an immersion liquid. The optical element has a first surface region and a second surface region. During the optical imaging process, the first surface region is wetted by the immersion liquid. At least temporarily during the optical imaging process, the liquid repelling device generates an electrical field in the region of the second surface. The electrical field being is adapted to cause a repellent force on parts of the immersion liquid which are responsive to the electrical field and inadvertently contact the second surface region. The repellent force has a direction to drive away the parts of the immersion liquid from the second surface region.Type: ApplicationFiled: September 22, 2014Publication date: January 8, 2015Inventor: Stephan Six
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Publication number: 20140320955Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.Type: ApplicationFiled: July 15, 2014Publication date: October 30, 2014Inventors: Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six
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Patent number: 8564925Abstract: A wafer chuck (1b) having a substrate (2) and having, applied to the substrate (2), an electrically conductive coating (8) for fixing a wafer (6) by electrostatic attraction and preferably having a reflective coating (10) applied to the substrate (2). The coating (8; 10) has at least a first layer (3; 11) under compressive stress and at least a second layer (7; 12) under tensile stress for compensating for the compressive stress of the first layer (3; 11) in order to keep deformation of the wafer chuck (1b) by the coating (8, 10) as low as possible.Type: GrantFiled: June 17, 2011Date of Patent: October 22, 2013Assignee: Carl Zeiss SMT GmbHInventor: Stephan Six
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Patent number: 8279402Abstract: An optical arrangement for immersion lithography, having at least one component (1) to which a hydrophobic coating (6, 7) is applied, the hydrophobic coating (6, 7) being exposed to UV radiation during operation of a projection lens, and the at least one component (1) being wetted at least in part by an immersion fluid during operation of the projection lens. The hydrophobic coating (6, 7) includes at least one UV-resistant layer (6) that absorbs and/or reflects UV radiation at a wavelength of less than 260 nm.Type: GrantFiled: March 12, 2009Date of Patent: October 2, 2012Assignee: Carl Zeiss SMT GmbHInventors: Stephan Six, Michael Lill, Ruediger Duesing, Bernhard Gellrich, Michael Widmann, Andreas Schubert, Tilmann Von Papen, Thomas Ihl
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Publication number: 20120062865Abstract: An optical arrangement for use in an optical imaging process includes an optical element, an immersion zone and a liquid repelling device. During the optical imaging process, the immersion zone is located adjacent to the optical element and is filled with an immersion liquid. The optical element has a first surface region and a second surface region. During the optical imaging process, the first surface region is wetted by the immersion liquid. At least temporarily during the optical imaging process, the liquid repelling device generates an electrical field in the region of the second surface. The electrical field being is adapted to cause a repellent force on parts of the immersion liquid which are responsive to the electrical field and inadvertently contact the second surface region. The repellent force has a direction to drive away the parts of the immersion liquid from the second surface region.Type: ApplicationFiled: October 31, 2011Publication date: March 15, 2012Applicant: Carl Zeiss SMT GmbHInventor: Stephan Six
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Publication number: 20110310524Abstract: A wafer chuck (1b) having a substrate (2) and having, applied to the substrate (2), an electrically conductive coating (8) for fixing a wafer (6) by electrostatic attraction and preferably having a reflective coating (10) applied to the substrate (2). The coating (8; 10) has at least a first layer (3; 11) under compressive stress and at least a second layer (7; 12) under tensile stress for compensating for the compressive stress of the first layer (3; 11) in order to keep deformation of the wafer chuck (1b) by the coating (8, 10) as low as possible.Type: ApplicationFiled: June 17, 2011Publication date: December 22, 2011Applicant: CARL ZEISS SMT GmbHInventor: Stephan Six
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Publication number: 20110222043Abstract: The disclosure relates to a microlithographic projection exposure apparatus, such as are used for the production of large-scale integrated electrical circuits and other microstructured components. The disclosure relates in particular to coatings of optical elements in order to increase or reduce the reflectivity.Type: ApplicationFiled: May 20, 2011Publication date: September 15, 2011Applicant: CARL ZEISS SMT GMBHInventors: Vladimir Kamenov, Daniel Kraehmer, Toralf Gruner, Karl-Stefan Weissenrieder, Heiko Feldmann, Achim Zirkel, Alexandra Pazidis, Bruno Thome, Stephan Six
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Patent number: 8007711Abstract: In a method for operating a converter (1), in which the converter (1) is mounted in a carrying ring (3) by means of carrying journals (2), a gear mechanism (4) is mounted in a floating manner on the carrying journals (2), the converter (1) is configured, as a result, such that it can tilt about its horizontal axis and the gear mechanism (4) is connected rigidly to a pedestal (6) by a torque support (5), the torque support (5) connects the gear mechanism (4) to the pedestal (6) during the tilting operation of the converter (1), and the torque support (5) is released from the pedestal (6) or from the gear mechanism (4) or from both during operation of the converter (1).Type: GrantFiled: October 2, 2007Date of Patent: August 30, 2011Assignee: SMSDEMAG AktiengesellschaftInventors: Christian Imiela, Stephan Schulze, Stephan Six, Christoph Sundermann, Joerg Hertel, Rolf Best
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Patent number: 7738187Abstract: An optical element (1) made of a material that is transparent to wavelengths in the UV region, which optical element (1) includes an oleophobic coating (6, 7) outside of its optically free diameter whose disperse component of the surface energy is preferably 25 mN/m or less, particularly preferably 20 mN/m or less, in particular 15 mN/m or less. In addition or as an alternative, the optical element (1) within its optically free diameter comprises an oleophilic coating (9b, 9c) that is transparent to wavelengths in the UV region, with the disperse component of the surface energy of this coating preferably being more than 25 mN/m, particularly preferably more than 30 mN/m, in particular more than 40 mN/m. The optical element may be provided in an arrangement in which it dips at least partially into an organic liquid.Type: GrantFiled: June 5, 2008Date of Patent: June 15, 2010Assignee: Carl Zeiss SMT AGInventors: Alexandra Pazidis, Stephan Six, Ruediger Duesing, Gennady Fedosenko