Patents by Inventor Stephan T. Melnychuk
Stephan T. Melnychuk has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).
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Publication number: 20100176313Abstract: An apparatus for generating EUV radiation is disclosed which may include a target material, a system generating a laser beam for interaction with the target material and a pair of electrodes. A pulse power electrical circuit may be provided for generating a discharge between said electrodes to produce EUV radiation from said target material.Type: ApplicationFiled: December 14, 2009Publication date: July 15, 2010Applicant: Cymer, Inc.Inventors: Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, I. Roger Oliver, Richard M. Ness, Norbert Bowering, Oleh Khodykin, Curtis L. Rettiq, Gerry M. Blumenstock, Timothy S. Dyer, Rodney D. Simmons, Jerzy R. Hoffman, R. Mark Johnson
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Patent number: 7570741Abstract: Diamond based proton beam target (12) designs for use in contraband detection/indentification systems. Such novel Diamond based proton beam targets (12) are used in Electrostatic and RF Accelerator based devices for generating proton beams (10) that impinge on the targets (12) for generating single or multiple monoenergetic gamma ray (15) beams used in detection/measurement of contraband.Type: GrantFiled: August 6, 2004Date of Patent: August 4, 2009Assignee: Contraband Detection Systems, L.L.C.Inventors: Stephan T. Melnychuk, Raymond J. Meilunas
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Patent number: 7368741Abstract: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.Type: GrantFiled: April 14, 2005Date of Patent: May 6, 2008Assignee: Cymer, Inc.Inventors: Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, I. Roger Oliver, Richard M. Ness, Norbert R. Bowering, Oleh Khodykin, Curtis L. Rettig, Gerry M. Blumenstock, Timothy S. Dyer, Rodney D. Simmons, Jerzy R. Hoffman, R. Mark Johnson
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Patent number: 6972421Abstract: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.Type: GrantFiled: April 8, 2003Date of Patent: December 6, 2005Assignee: Cymer, Inc.Inventors: Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, I. Roger Oliver, Richard M. Ness, Norbert Bowering, Oleh Khodykin, Curtis L. Rettig, Gerry M. Blumenstock, Timothy S. Dyer, Rodney D. Simmons, Jerzy R. Hoffman, R. Mark Johnson
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Patent number: 6815700Abstract: The present invention provides a high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. Preferably the electrodes are configured co-axially. The central electrode is preferably hollow and the active gas is introduced out of the hollow electrode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas. In preferred embodiments the central electrode is pulsed with a high negative electrical pulse so that the central electrode functions as a hollow cathode.Type: GrantFiled: July 3, 2002Date of Patent: November 9, 2004Assignee: Cymer, Inc.Inventors: Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, I. Roger Oliver, Richard M. Ness, Norbert Bowering, Oleh Khodykin
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Publication number: 20040108473Abstract: The present invention provides a reliable, high-repetition rate, production line compatible high energy photon source. A very hot plasma containing an active material is produced in vacuum chamber. The active material is an atomic element having an emission line within a desired extreme ultraviolet (EUV) range. A pulse power source comprising a charging capacitor and a magnetic compression circuit comprising a pulse transformer, provides electrical pulses having sufficient energy and electrical potential sufficient to produce the EUV light at an intermediate focus at rates in excess of 5 Watts. In preferred embodiments designed by Applicants in-band, EUV light energy at the intermediate focus is 45 Watts extendable to 105.8 Watts.Type: ApplicationFiled: April 8, 2003Publication date: June 10, 2004Inventors: Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, I. Roger Oliver, Richard M. Ness, Norbert Bowering, Oleh Khodykin, Curtis L. Rettig, Gerry M. Blumenstock, Timothy S. Dyer, Rodney D. Simmons, Jerzy R. Hoffman, R. Mark Johnson
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Patent number: 6586757Abstract: A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 &pgr; steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater.Type: GrantFiled: June 6, 2001Date of Patent: July 1, 2003Assignee: Cymer, Inc.Inventors: Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, Richard M. Ness, Daniel L. Birx late of, Richard L. Sandstrom, John E. Rauch
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Patent number: 6566668Abstract: A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 &pgr; steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater.Type: GrantFiled: June 6, 2001Date of Patent: May 20, 2003Assignee: Cymer, Inc.Inventors: John E. Rauch, William N. Partlo, Igor V. Fomenkov, Richard M. Ness, Daniel L. Birx, Richard L. Sandstrom, Stephan T. Melnychuk
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Publication number: 20030006383Abstract: The present invention provides a high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. Preferably the electrodes are configured co-axially. The central electrode is preferably hollow and the active gas is introduced out of the hollow electrode. This permits an optimization of the spectral line source and a separate optimization of the buffer gas. In preferred embodiments the central electrode is pulsed with a high negative electrical pulse so that the central electrode functions as a hollow cathode.Type: ApplicationFiled: July 3, 2002Publication date: January 9, 2003Inventors: Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, I. Roger Oliver, Richard M. Ness, Norbert Bowering, Oleh Khodykin
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Publication number: 20020014598Abstract: A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 &pgr; steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater.Type: ApplicationFiled: June 6, 2001Publication date: February 7, 2002Inventors: Stephan T. Melnychuk, William N. Partlo, Igor V. Fomenkov, Richard M. Ness, Daniel L. Birx, Richard L. Sandstrom, John E. Rauch
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Publication number: 20020014599Abstract: A high energy photon source. A pair of plasma pinch electrodes are located in a vacuum chamber. The chamber contains a working gas which includes a noble buffer gas and an active gas chosen to provide a desired spectral line. A pulse power source provides electrical pulses at repetition rates of 1000 Hz or greater and at voltages high enough to create electrical discharges between the electrodes to produce very high temperature, high density plasma pinches in the working gas providing radiation at the spectral line of the source or active gas. A fourth generation unit is described which produces 20 mJ, 13.5 nm pulses into 2 &pgr; steradians at repetition rates of 2000 Hz with xenon as the active gas. This unit includes a pulse power system having a resonant charger charging a charging capacitor bank, and a magnetic compression circuit comprising a pulse transformer for generating the high voltage electrical pulses at repetition rates of 2000 Hz or greater.Type: ApplicationFiled: June 6, 2001Publication date: February 7, 2002Inventors: John E. Rauch, William N. Partlo, Igor V. Fomenkov, Richard M. Ness, Daniel L. Birx, Richard L. Sandstrom, Stephan T. Melnychuk