Patents by Inventor Stephan Waldner

Stephan Waldner has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 11377728
    Abstract: A method of in situ monitoring a thin film deposition process on a substrate, the method including a) defining a desired spectrum, the desired spectrum being a transmission or a reflection spectrum; b1) illuminating the substrate by means of a light source emitting light within the desired spectrum, b2) receiving light reflected from the substrate or transmitted through the substrate, b3) determining a transmission or a reflection spectrum out of the received light; c) defining a spectrum or a combination of spectra in dependency of the spectrum determined in step b3) to be a current spectrum; d) determining a weight spectrum as a function of the current spectrum; e) calculating a real number as a function of the current spectrum, of the desired spectrum and of the weight spectrum; f) exploiting the real number as indication for a deviation of the current spectrum from the desired spectrum.
    Type: Grant
    Filed: July 10, 2017
    Date of Patent: July 5, 2022
    Assignee: EVATEC AG
    Inventor: Stephan Waldner
  • Publication number: 20200181763
    Abstract: A method of in situ monitoring a thin film deposition process on a substrate, the method including a) defining a desired spectrum, the desired spectrum being a transmission or a reflection spectrum; b1) illuminating the substrate by means of a light source emitting light within the desired spectrum, b2) receiving light reflected from the substrate or transmitted through the substrate, b3) determining a transmission or a reflection spectrum out of the received light; c) defining a spectrum or a combination of spectra in dependency of the spectrum determined in step b3) to be a current spectrum; d) determining a weight spectrum as a function of the current spectrum; e) calculating a real number as a function of the current spectrum, of the desired spectrum and of the weight spectrum; f) exploiting the real number as indication for a deviation of the current spectrum from the desired spectrum.
    Type: Application
    Filed: July 10, 2017
    Publication date: June 11, 2020
    Applicant: Evatec AG
    Inventor: Stephan Waldner
  • Patent number: 6629746
    Abstract: A process for the reduction of artefacts during the reproduction of an image based on image data and having a plurality of image points, by a specific image reproducing device is disclosed, whereby the image points have appearance properties, the process including the following steps: device characteristics which describe the appearance properties of image points produced by the specific image reproducing device in answer to image data and describe the dependence of the appearance properties on the position assigned to the image data, are provided or input, reproduction image data are input, and the image data corrected based on the device characteristics and depending on the positions assigned to the image data.
    Type: Grant
    Filed: November 13, 2001
    Date of Patent: October 7, 2003
    Assignee: Gretag Imaging Trading AG
    Inventors: Stephan Waldner, Armin Kündig, Guido Keller
  • Publication number: 20020080375
    Abstract: A process for the reduction of artefacts during the reproduction of an image based on image data and having a plurality of image points, by a specific image reproducing device is disclosed, whereby the image points have appearance properties, the process including the following steps: device characteristics which describe the appearance properties of image points produced by the specific image reproducing device in answer to image data and describe the dependence of the appearance properties on the position assigned to the image data, are provided or input, reproduction image data are input, and the image data corrected based on the device characteristics and depending on the positions assigned to the image data.
    Type: Application
    Filed: November 13, 2001
    Publication date: June 27, 2002
    Inventors: Stephan Waldner, Armin Kundig, Guido Keller
  • Publication number: 20020033851
    Abstract: A remission sensor is provided in an inkjet printing apparatus for various measurement tasks, which sensor is constructed for densiometric and colorimetric measurement tasks and has a high local resolution. In a first application, the borders of the picture carrier are detected and the printing of pixels of the digital image located outside the borders prevented. This permits the manufacture of borderless pictures without the wasting of printing ink. In a second application, the sensor is used for the photoelectric scanning or measurement of co-printed print head test patterns. The functional condition of the print head(s) can be determined by analysis of the measurement data obtained with suitable algorithms, and corresponding measures can be initiated. In this way the production of waste can be prevented. In a further application, the sensor is also used for the measurement of co-printed color test patterns.
    Type: Application
    Filed: September 18, 2001
    Publication date: March 21, 2002
    Inventors: Stephan Waldner, Armin Kundig, Guido Keller, Fortunat Schrammli