Patents by Inventor Stephane Alves

Stephane Alves has filed for patents to protect the following inventions. This listing includes patent applications that are pending as well as patents that have already been granted by the United States Patent and Trademark Office (USPTO).

  • Patent number: 8004049
    Abstract: A device includes an array of cells, the source regions of the individual cells comprising a plurality of source region branches each extending towards a source region branch of an adjacent cell, the base regions of the individual cells comprising a corresponding plurality of base region branches merging together to form a single base region surrounding the source regions. The junctions between the merged base region and the drain region define rounded current conduction path areas for the on-state of the device between adjacent cells. Floating voltage regions of opposite conductivity type to the drain region are buried in the substrate beneath the merged base region. The features of the floating voltage regions define rings of the opposite conductivity type to the drain region that surround the current conduction paths of respective cells. The floating voltage regions include respective islands situated within the current conduction paths.
    Type: Grant
    Filed: August 31, 2004
    Date of Patent: August 23, 2011
    Assignee: Freescale Semiconductor, Inc.
    Inventors: Jean-Michel Reynes, Stephane Alves, Ivana Deram, Blandino Lopes, Joel Margheritta, Frederico Morancho
  • Patent number: 7800135
    Abstract: A semiconductor power switch having an array of basic cells in which peripheral regions in the active drain region extend beside the perimeter of the base-drain junction, the peripheral regions being of higher dopant density than the rest of the second drain layer. Intermediate regions in the centre of the active drain region are provided of lighter dopant density than the rest of the second drain layer. This provides an improved compromise between the on-state resistance and the breakdown voltage by enlarging the current conduction path at in its active drain region. On the outer side of each edge cell of the array, the gate electrode extends over and beyond at least part of the perimeters of the base-source junction and the base-drain junction towards the adjacent edge of the die. Moreover, on the outer side of each edge cell, the second drain layer includes a region of reduced dopant density that extends beyond the gate electrode right to the adjacent edge of the die.
    Type: Grant
    Filed: July 25, 2005
    Date of Patent: September 21, 2010
    Inventors: Jean-Michel Reynes, Stephane Alves, Alain Deram, Blandino Lopes, Joel Margheritta
  • Publication number: 20090014792
    Abstract: A power semiconductor device comprising an array of cells distributed over a surface of a substrate, the source regions of the individual cells of the array comprising a plurality of source region branches each extending laterally outwards towards at least one source region branch of an adjacent cell and presenting juxtaposed ends, the base regions of the individual cells of the array comprising a corresponding plurality of base region branches merging together adjacent and between the juxtaposed ends of the source region branches to form a single base region surrounding the source regions of the individual cells of the array in the substrate. The junctions between the merged base region and the drain region are solely concave laterally and define rounded current conduction path areas for the on-state of the device between adjacent cells that are depleted in the off-state of the device to block flow of current from the source regions to the drain electrode.
    Type: Application
    Filed: August 31, 2004
    Publication date: January 15, 2009
    Applicant: Freescale Semiconductor , Inc.
    Inventors: Jean-Michel Reynes, Stephane Alves, Ivana Deram, Blandino Lopes, Joel Margheritta, Frederic Morancho
  • Publication number: 20080217657
    Abstract: A semiconductor power switch having an array of basic cells in which peripheral regions in the active drain region extend beside the perimeter of the base-drain junction, the peripheral regions being of higher dopant density than the rest of the second drain layer. Intermediate regions in the centre of the active drain region are provided of lighter dopant density than the rest of the second drain layer. This provides an improved compromise between the on-state resistance and the breakdown voltage by enlarging the current conduction path at in its active drain region. On the outer side of each edge cell of the array, the gate electrode extends over and beyond at least part of the perimeters of the base-source junction and the base-drain junction towards the adjacent edge of the die.
    Type: Application
    Filed: July 25, 2005
    Publication date: September 11, 2008
    Applicant: Freescale Semiconductor, Inc.
    Inventors: Jean-Michel Reynes, Stephane Alves, Alain Deram, Balandino Lopes, Joel Margheritta